Nanomaterials Rapid Prototyping Facility
The NanoMaterials Rapid Prototyping Facility is a semi-cleanroom environment, equipped for the fabrication and analysis of NanoMaterials. The facility is designed to allow prototype Nano-devices to be quickly built and tested and is a collaboration between physicists, chemists, engineers, material scientists and industrialists to combine the successes of their disciplines to create entirely new ways of building on the nano-scale.
F10041
The NanoMaterials Rapid Prototyping Facility is a semi-cleanroom environment, equipped for the fabrication and analysis of NanoMaterials. The facility is designed to allow prototype Nano-devices to be quickly built and tested and is a collaboration between physicists, chemists, engineers, material scientists and industrialists to combine the successes of their disciplines to create entirely new ways of building on the nano-scale.
The NanoMaterials Rapid Prototyping Facility is a semi-cleanroom environment, equipped for the fabrication and analysis of NanoMaterials. The facility is designed to allow prototype Nano-devices to be quickly built and tested and is a collaboration between physicists, chemists, engineers, material scientists and industrialists to combine the successes of their disciplines to create entirely new ways of building on the nano-scale.
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School of Physics & Astronomy
WF
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Physical Sciences and Engineering
F7
SMITH, DAVID
Nanoscope 3 / Multimode Afm Microscope
Multitasking controller for atomic force microscopes (AFM). Local ID: PH/01785
E10001
Multitasking controller for atomic force microscopes (AFM). Local ID: PH/01785
Multitasking controller for atomic force microscopes (AFM). Local ID: PH/01785
Atomic Force Microscope
Explorer atomic force microscope (AFM) capable of imaging in non-contact (NC) and contact mode. Local ID: PH/01717
E10002
Explorer atomic force microscope (AFM) capable of imaging in non-contact (NC) and contact mode. Local ID: PH/01717
Explorer atomic force microscope (AFM) capable of imaging in non-contact (NC) and contact mode. Local ID: PH/01717
Zeiss Confocal Microscope
A Zeiss confocal microscope system which is also capable of UV writing of samples. (HeNe - 633nm, GeNe - 543nm, UV - 351nm, Arlon - 458nm, and other lines)
E10004
A Zeiss confocal microscope system which is also capable of UV writing of samples. (HeNe - 633nm, GeNe - 543nm, UV - 351nm, Arlon - 458nm, and other lines)
A Zeiss confocal microscope system which is also capable of UV writing of samples. (HeNe - 633nm, GeNe - 543nm, UV - 351nm, Arlon - 458nm, and other lines)
Fa 6" Probe Station Package R32/6 (S/N 2930)
A manual 8inch wafer prober with a Leica GZ4 stereomicroscope. Local ID: PH/01713
E10007
A manual 8inch wafer prober with a Leica GZ4 stereomicroscope. Local ID: PH/01713
A manual 8inch wafer prober with a Leica GZ4 stereomicroscope. Local ID: PH/01713
Kurt J Lesker Sputter System in the Nanomaterials Rapid Prototyping Facility
Lesker sputter deposition system capable depositing thin multi-layers of metallic and dielectric layers. Local ID: PH/01917
E10009
Lesker sputter deposition system capable depositing thin multi-layers of metallic and dielectric layers. Local ID: PH/01917
Lesker sputter deposition system capable depositing thin multi-layers of metallic and dielectric layers. Local ID: PH/01917
E-Beam Lithography Conversion Kit
E-Beam Lithography Conversion Kit. Raith nanolithography system capable of writing sub 100nm dimensions with up to 16bit resolution. Local ID: PH/02287
E10010
E-Beam Lithography Conversion Kit. Raith nanolithography system capable of writing sub 100nm dimensions with up to 16bit resolution. Local ID: PH/02287
E-Beam Lithography Conversion Kit. Raith nanolithography system capable of writing sub 100nm dimensions with up to 16bit resolution. Local ID: PH/02287