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http://id.southampton.ac.uk/org/F7FP040000
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rdfs:label "ORC - Enterprise"
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http://id.southampton.ac.uk/org/F7FP060000
rdf:type http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization
rdfs:label "Comms, Signal Processing & Control"
is http://vocab.deri.ie/rooms#occupant of http://id.southampton.ac.uk/building/53
 
http://id.southampton.ac.uk/org/F7EH010000
rdf:type http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization
rdfs:label "ORC Research"
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http://id.southampton.ac.uk/org/F7EH040000
rdf:type http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization
rdfs:label "Technical Support Staff"
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http://id.southampton.ac.uk/org/F7FP070000
rdf:type http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization
rdfs:label "Electronic & Software Systems"
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http://id.southampton.ac.uk/building/53#residential
rdf:type http://id.southampton.ac.uk/ns/PlaceFeature-ResidentialUse
rdfs:label "Building 53 is non-residential"
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http://id.southampton.ac.uk/building/53#architect
rdfs:label "Jestico + Whiles"
is http://id.southampton.ac.uk/ns/buildingArchitect of http://id.southampton.ac.uk/building/53
 
http://id.southampton.ac.uk/facility/F10015
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/facility/F10015#secondary_contact
rdf:type oo:Facility
dcterms:description "The clean room provides a range of characterisation equipment for device and material characterisation. Plan view imaging of a sample surface can be performed using field emission scanning electron microscopy (FESEM), helium ion microscopy and scanning probe microscopy. Cross-section imaging can be achieved by first making a cross-sectional cut using the focussed ion beam (FIB) system and then imaging in-situ using field emission scanning electron microscopy."
skos:notation "F10015"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The clean room provides a range of characterisation equipment for device and material characterisation. Plan view imaging of a sample surface can be performed using field emission scanning electron microscopy (FESEM), helium ion microscopy and scanning probe microscopy. Cross-section imaging can be achieved by first making a cross-sectional cut using the focussed ion beam (FIB) system and then imaging in-situ using field emission scanning electron microscopy."
rdfs:comment "The clean room provides a range of characterisation equipment for device and material characterisation. Plan view imaging of a sample surface can be performed using field emission scanning electron microscopy (FESEM), helium ion microscopy and scanning probe microscopy. Cross-section imaging can be achieved by first making a cross-sectional cut using the focussed ion beam (FIB) system and then imaging in-situ using field emission scanning electron microscopy."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/facility/F10015#primary_contact
rdfs:label "ECS - Characterisation (Measurement)"
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http://id.southampton.ac.uk/facility/F10007
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
dcterms:description "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."
skos:notation "F10007"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."
rdfs:comment "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10007#primary_contact
rdfs:label "Clean Rooms - Novel Glass"
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http://id.southampton.ac.uk/facility/F10008
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
dcterms:description "Our Soft Glass facilities offer a wide range of specialized glass making and fibre drawing equipment including: [nl]
A 5m Fibre Drawing Tower with cane and fibre drawing capabilities up to 1100oC; High Temperature (1700oC & 1800oC) Elevator Hearth Furnaces and High Temperature (1200oC)Chamber Furnaces for Glass Melting & Processing; Specialised (1500oC) Glass Rolling Furnace; High and Low temperature ovens; L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (<1ppm); Testometric Precision Glass Extrusion equipment; Hydraulic Glass Extrusion equipment; Fibre Characterisation Laboratory; Access to a variety of analytical equipment, including: SEM facilities; Optical Microscope Facilities, Thermogravimetric and Thermomechanical analyzers."
skos:notation "F10008"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Our Soft Glass facilities offer a wide range of specialized glass making and fibre drawing equipment including: [nl]
A 5m Fibre Drawing Tower with cane and fibre drawing capabilities up to 1100oC; High Temperature (1700oC & 1800oC) Elevator Hearth Furnaces and High Temperature (1200oC)Chamber Furnaces for Glass Melting & Processing; Specialised (1500oC) Glass Rolling Furnace; High and Low temperature ovens; L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (<1ppm); Testometric Precision Glass Extrusion equipment; Hydraulic Glass Extrusion equipment; Fibre Characterisation Laboratory; Access to a variety of analytical equipment, including: SEM facilities; Optical Microscope Facilities, Thermogravimetric and Thermomechanical analyzers."
rdfs:comment "Our Soft Glass facilities offer a wide range of specialized glass making and fibre drawing equipment including: [nl]
A 5m Fibre Drawing Tower with cane and fibre drawing capabilities up to 1100oC; High Temperature (1700oC & 1800oC) Elevator Hearth Furnaces and High Temperature (1200oC)Chamber Furnaces for Glass Melting & Processing; Specialised (1500oC) Glass Rolling Furnace; High and Low temperature ovens; L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (<1ppm); Testometric Precision Glass Extrusion equipment; Hydraulic Glass Extrusion equipment; Fibre Characterisation Laboratory; Access to a variety of analytical equipment, including: SEM facilities; Optical Microscope Facilities, Thermogravimetric and Thermomechanical analyzers."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10008#primary_contact
rdfs:label "Clean Rooms - Compound Glass"
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http://id.southampton.ac.uk/facility/F10014
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dcterms:description "The Southampton Nanofabrication Centre is a state-of-the-art facility for microfabrication and high-spec nanofabrication, as well as a wide range of characterisation capabilities housed in the new Mountbatten Complex at the University of Southampton. One of the premiere cleanrooms in Europe, the Centre has a uniquely broad range of technologies, combining traditional and novel top down fabrication with state-of-the-art bottom up fabrication. This allows us to develop and produce a wide range of devices in diverse fields such as electronics, nanotechnology and bionanotechnology and incorporate them into an equally comprehensive array of nano and microsystems for analysis and use. The characterisation capability is similarly extensive catalogue of microscopes and test gear, from nanometre resolution scanning microscopes to electrical, magnetic and RF analysis. A detailed equiment list can be found at http://www.southampton-nanofab.com/machineDatabase/"
skos:notation "F10014"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Southampton Nanofabrication Centre is a state-of-the-art facility for microfabrication and high-spec nanofabrication, as well as a wide range of characterisation capabilities housed in the new Mountbatten Complex at the University of Southampton. One of the premiere cleanrooms in Europe, the Centre has a uniquely broad range of technologies, combining traditional and novel top down fabrication with state-of-the-art bottom up fabrication. This allows us to develop and produce a wide range of devices in diverse fields such as electronics, nanotechnology and bionanotechnology and incorporate them into an equally comprehensive array of nano and microsystems for analysis and use. The characterisation capability is similarly extensive catalogue of microscopes and test gear, from nanometre resolution scanning microscopes to electrical, magnetic and RF analysis. A detailed equiment list can be found at http://www.southampton-nanofab.com/machineDatabase/"
rdfs:comment "The Southampton Nanofabrication Centre is a state-of-the-art facility for microfabrication and high-spec nanofabrication, as well as a wide range of characterisation capabilities housed in the new Mountbatten Complex at the University of Southampton. One of the premiere cleanrooms in Europe, the Centre has a uniquely broad range of technologies, combining traditional and novel top down fabrication with state-of-the-art bottom up fabrication. This allows us to develop and produce a wide range of devices in diverse fields such as electronics, nanotechnology and bionanotechnology and incorporate them into an equally comprehensive array of nano and microsystems for analysis and use. The characterisation capability is similarly extensive catalogue of microscopes and test gear, from nanometre resolution scanning microscopes to electrical, magnetic and RF analysis. A detailed equiment list can be found at http://www.southampton-nanofab.com/machineDatabase/"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/facility/F10014#primary_contact
rdfs:label "Clean Rooms - Nanofabrication"
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http://id.southampton.ac.uk/facility/F10010
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
dcterms:description "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."
skos:notation "F10010"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."
rdfs:comment "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10010#primary_contact
rdfs:label "Clean Rooms - Integrated Photonics"
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is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10494, http://id.southampton.ac.uk/equipment/E10373, http://id.southampton.ac.uk/equipment/E10362, http://id.southampton.ac.uk/equipment/E10321, http://id.southampton.ac.uk/equipment/E10332, http://id.southampton.ac.uk/equipment/E10305, http://id.southampton.ac.uk/equipment/E10323, http://id.southampton.ac.uk/equipment/E10329, http://id.southampton.ac.uk/equipment/E10320, http://id.southampton.ac.uk/equipment/E10319, http://id.southampton.ac.uk/equipment/E10316, http://id.southampton.ac.uk/equipment/E10348, http://id.southampton.ac.uk/equipment/E10322, http://id.southampton.ac.uk/equipment/E10388, http://id.southampton.ac.uk/equipment/E10387, http://id.southampton.ac.uk/equipment/E10840, http://id.southampton.ac.uk/equipment/E11274, http://id.southampton.ac.uk/equipment/E11272, http://id.southampton.ac.uk/equipment/E11273
 
http://id.southampton.ac.uk/facility/F10005
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
dcterms:description "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."
skos:notation "F10005"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."
rdfs:comment "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10005#primary_contact
rdfs:label "Clean Rooms - Silica"
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10306, http://id.southampton.ac.uk/equipment/E10365, http://id.southampton.ac.uk/equipment/E10299, http://id.southampton.ac.uk/equipment/E10384, http://id.southampton.ac.uk/equipment/E10336, http://id.southampton.ac.uk/equipment/E10368, http://id.southampton.ac.uk/equipment/E10390
 
http://id.southampton.ac.uk/facility/F10011
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
dcterms:description "Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials. [nl]
Specification: 0.9 nm electron beam and 5 nm ion beam resoultion - Gas injection for bea-induced deposition of gold and platinum - Nabity pattern generator - Electron - beam lithography capability - Kleidiek nanomanipulator for TEM sample lift-out (other tool options available inc. microfluidic injection and four-point electrical probe) - 5-axis motorized stage for samples up to 150mm dia. (larger without full rotation) and 20mm thick - Ability to accept complex CAD pattern files."
skos:notation "F10011"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials. [nl]
Specification: 0.9 nm electron beam and 5 nm ion beam resoultion - Gas injection for bea-induced deposition of gold and platinum - Nabity pattern generator - Electron - beam lithography capability - Kleidiek nanomanipulator for TEM sample lift-out (other tool options available inc. microfluidic injection and four-point electrical probe) - 5-axis motorized stage for samples up to 150mm dia. (larger without full rotation) and 20mm thick - Ability to accept complex CAD pattern files."
rdfs:comment "Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials. [nl]
Specification: 0.9 nm electron beam and 5 nm ion beam resoultion - Gas injection for bea-induced deposition of gold and platinum - Nabity pattern generator - Electron - beam lithography capability - Kleidiek nanomanipulator for TEM sample lift-out (other tool options available inc. microfluidic injection and four-point electrical probe) - 5-axis motorized stage for samples up to 150mm dia. (larger without full rotation) and 20mm thick - Ability to accept complex CAD pattern files."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10011#primary_contact
rdfs:label "Clean Rooms - Focused ion beam (FIB)"
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10741
 
http://id.southampton.ac.uk/facility/F10012
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
dcterms:description "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."
skos:notation "F10012"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."
rdfs:comment "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10012#primary_contact
rdfs:label "Scanning Electron Microscope (SEM)"
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10333
 
http://id.southampton.ac.uk/facility/F10009
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
dcterms:description "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."
skos:notation "F10009"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."
rdfs:comment "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10009#primary_contact
rdfs:label "Clean Rooms - FHD"
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10250
 
http://id.southampton.ac.uk/facility/F10006
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
dcterms:description "The FAST LAB facility consists of three sections (one `clean` lab dedicated to optical bio-science) and the other two supplied with femtosecond laser systems and optical tables with a total floor space of 72 square metres. The £1.1M installation and recent £300K upgrade provides the ORC and its collaborators with one of the most comprehensive and flexible commercial ultrafast laser system in the world. The FAST Lab can be hired on a daily basis in order to assist your particular line of research. Whether you are a member of the ORC, a member of another department within this or another university, or even a scientist from industry or other research establishment, you are welcome to make use of the FAST Lab facility. Moreover, we are keen to establish collaborations with other experimentalists"
skos:notation "F10006"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The FAST LAB facility consists of three sections (one `clean` lab dedicated to optical bio-science) and the other two supplied with femtosecond laser systems and optical tables with a total floor space of 72 square metres. The £1.1M installation and recent £300K upgrade provides the ORC and its collaborators with one of the most comprehensive and flexible commercial ultrafast laser system in the world. The FAST Lab can be hired on a daily basis in order to assist your particular line of research. Whether you are a member of the ORC, a member of another department within this or another university, or even a scientist from industry or other research establishment, you are welcome to make use of the FAST Lab facility. Moreover, we are keen to establish collaborations with other experimentalists"
rdfs:comment "The FAST LAB facility consists of three sections (one `clean` lab dedicated to optical bio-science) and the other two supplied with femtosecond laser systems and optical tables with a total floor space of 72 square metres. The £1.1M installation and recent £300K upgrade provides the ORC and its collaborators with one of the most comprehensive and flexible commercial ultrafast laser system in the world. The FAST Lab can be hired on a daily basis in order to assist your particular line of research. Whether you are a member of the ORC, a member of another department within this or another university, or even a scientist from industry or other research establishment, you are welcome to make use of the FAST Lab facility. Moreover, we are keen to establish collaborations with other experimentalists"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10006#primary_contact
rdfs:label "FAST Lab - Laser Laboratory"
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "false"^^xsd:boolean
 
http://id.southampton.ac.uk/equipment/E10264
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10264#secondary_contact
rdf:type oo:Equipment
dcterms:description "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"
skos:notation "E10264"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"
rdfs:comment "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10264#primary_contact
rdfs:label "Imoxs Sem"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
 
http://id.southampton.ac.uk/equipment/E10260
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10260#secondary_contact
rdf:type oo:Equipment
dcterms:description "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."
skos:notation "E10260"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."
rdfs:comment "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10260#primary_contact
rdfs:label "Helios Sputtering System Type Xl 6""
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10260-200629-P1010245.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10260-200629-P1010244.jpg
 
http://id.southampton.ac.uk/equipment/E10265
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10265#secondary_contact
rdf:type oo:Equipment
dcterms:description "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."
skos:notation "E10265"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."
rdfs:comment "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10265#primary_contact
rdfs:label "Fluoresence System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10265-200781-P1010272.jpg
 
http://id.southampton.ac.uk/equipment/E10494
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10494#secondary_contact
rdf:type oo:Equipment
skos:notation "E10494"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10494#primary_contact
rdfs:label "Nano 38 Sputting Machine Lesker Sputter System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10691
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10691#secondary_contact
rdf:type oo:Equipment
skos:notation "E10691"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10691#primary_contact
rdfs:label "Plasmalab 80 Plus Rie Etcher"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10691-200645-P1000880.jpg
 
http://id.southampton.ac.uk/equipment/E10436
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10436#secondary_contact
rdf:type oo:Equipment
skos:notation "E10436"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10436#primary_contact
rdfs:label "Plasma System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10436-200854-P1000886.jpg
 
http://id.southampton.ac.uk/equipment/E10422
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10422#secondary_contact
rdf:type oo:Equipment
skos:notation "E10422"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10422#primary_contact
rdfs:label "Tunable Laser"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10268
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10268#secondary_contact
rdf:type oo:Equipment
dcterms:description "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."
skos:notation "E10268"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."
rdfs:comment "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10268#primary_contact
rdfs:label "Optiwet St30"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10268-200649-P1000831.jpg
 
http://id.southampton.ac.uk/equipment/E10267
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10267#secondary_contact
rdf:type oo:Equipment
dcterms:description "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."
skos:notation "E10267"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."
rdfs:comment "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10267#primary_contact
rdfs:label "Auto 306 Resistance Evaporation System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10435
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10435#secondary_contact
rdf:type oo:Equipment
skos:notation "E10435"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10435#primary_contact
rdfs:label "Impedance Analyser"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10359
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10359#secondary_contact
rdf:type oo:Equipment
skos:notation "E10359"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10359#primary_contact
rdfs:label "Pressurization system"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10093
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10359-200885-P1010175.jpg
 
http://id.southampton.ac.uk/equipment/E10258
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10258#secondary_contact
rdf:type oo:Equipment
dcterms:description "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."
skos:notation "E10258"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."
rdfs:comment "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10258#primary_contact
rdfs:label "He Ion Microscope: Orion-Bu"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
 
http://id.southampton.ac.uk/equipment/E10467
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10467#secondary_contact
rdf:type oo:Equipment
skos:notation "E10467"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10467#primary_contact
rdfs:label "Spectrograph"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10373
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10373#secondary_contact
rdf:type oo:Equipment
skos:notation "E10373"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10373#primary_contact
rdfs:label "Three Zone, Bench Top 1700C Tube Furnace"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10712
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10712#secondary_contact
rdf:type oo:Equipment
dcterms:description "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."
skos:notation "E10712"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."
rdfs:comment "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10712#primary_contact
rdfs:label "Theta Probe Angle-Resolved X-ray Photoelectron Spectrometer (ARXPS) System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10451
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10451#secondary_contact
rdf:type oo:Equipment
skos:notation "E10451"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10451#primary_contact
rdfs:label "550 Degree Table"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10362
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10362#secondary_contact
rdf:type oo:Equipment
skos:notation "E10362"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10362#primary_contact
rdfs:label "MJB4 Mask Aligner"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10362-200571-P1000643.jpg
 
http://id.southampton.ac.uk/equipment/E10261
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10261#secondary_contact
rdf:type oo:Equipment
dcterms:description "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"
skos:notation "E10261"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"
rdfs:comment "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10261#primary_contact
rdfs:label "Field Emmission Scanning Electron Microscope (FEG-SEM)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10261-200628-P1010270.jpg
 
http://id.southampton.ac.uk/equipment/E10263
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10263#secondary_contact
rdf:type oo:Equipment
dcterms:description " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"
skos:notation "E10263"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"
rdfs:comment " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10263#primary_contact
rdfs:label "Evaporator Gun"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
 
http://id.southampton.ac.uk/equipment/E10335
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10335#secondary_contact
rdf:type oo:Equipment
skos:notation "E10335"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10335#primary_contact
rdfs:label "Soft Glass Fiber Drawing Tower"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:page http://www.cimp.soton.ac.uk/silica.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10335-200567-P1000711.jpg
 
http://id.southampton.ac.uk/equipment/E10398
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10398#secondary_contact
rdf:type oo:Equipment
skos:notation "E10398"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10398#primary_contact
rdfs:label "Nikon Microscope system"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10272
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10272#secondary_contact
rdf:type oo:Equipment
dcterms:description "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"
skos:notation "E10272"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"
rdfs:comment "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10272#primary_contact
rdfs:label "Nikon L200D microscope"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10272-200636-P1000825.jpg
 
http://id.southampton.ac.uk/equipment/E10703
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10703#secondary_contact
rdf:type oo:Equipment
skos:notation "E10703"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10703#primary_contact
rdfs:label "Additional Parts For Evg620Tb"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10703-200793-evg501.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10703-200793-evg620.jpg
 
http://id.southampton.ac.uk/equipment/E10434
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10434#secondary_contact
rdf:type oo:Equipment
skos:notation "E10434"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10434#primary_contact
rdfs:label "Radio Frequency Test Kit"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10241
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10241#secondary_contact
rdf:type oo:Equipment
dcterms:description "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."
skos:notation "E10241"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."
rdfs:comment "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10241#primary_contact
rdfs:label "Plasmalab 80 Plus Rie Etcher"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
 
http://id.southampton.ac.uk/equipment/E10240
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10240#secondary_contact
rdf:type oo:Equipment
dcterms:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."
skos:notation "E10240"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."
rdfs:comment "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10240#primary_contact
rdfs:label "Opt System 100 Metal Etcher"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10240-200640-P1000881.jpg
 
http://id.southampton.ac.uk/equipment/E10250
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10250#secondary_contact
rdf:type oo:Equipment
dcterms:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires.     CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size.    Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require  germane for growth.     SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows.    All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"
skos:notation "E10250"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires.     CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size.    Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require  germane for growth.     SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows.    All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"
rdfs:comment "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires.     CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size.    Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require  germane for growth.     SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows.    All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10250#primary_contact
rdfs:label "Nanofab 1000 Agile"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10009
foaf:page http://www.southampton-nanofab.com/fabrication/pecvd.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10250-200639-P1010240.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10250-200639-P1000873.jpg
 
http://id.southampton.ac.uk/equipment/E10244
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10244#secondary_contact
rdf:type oo:Equipment
dcterms:description "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.  Exposure can be performed in hard, soft and proximity modes."
skos:notation "E10244"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.  Exposure can be performed in hard, soft and proximity modes."
rdfs:comment "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.  Exposure can be performed in hard, soft and proximity modes."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10244#primary_contact
rdfs:label "EVG620 Top Side Mask Aligner"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10244-200660-P1000830.jpg
 
http://id.southampton.ac.uk/equipment/E10284
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10284#secondary_contact
rdf:type oo:Equipment
dcterms:description "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."
skos:notation "E10284"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."
rdfs:comment "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10284#primary_contact
rdfs:label "Tempress Clean Furnace Stack"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
 
http://id.southampton.ac.uk/equipment/E10276
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10276#secondary_contact
rdf:type oo:Equipment
dcterms:description "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."
skos:notation "E10276"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."
rdfs:comment "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10276#primary_contact
rdfs:label "Theta probe PARXPS system"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
 
http://id.southampton.ac.uk/equipment/E10438
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10438#secondary_contact
rdf:type oo:Equipment
dcterms:description "Gis System For Orion Microscope"
skos:notation "E10438"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Gis System For Orion Microscope"
rdfs:comment "Gis System For Orion Microscope"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10438#primary_contact
rdfs:label "Gis System For Orion Microscope"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
 
http://id.southampton.ac.uk/equipment/E10243
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10243#secondary_contact
rdf:type oo:Equipment
dcterms:description "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."
skos:notation "E10243"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."
rdfs:comment "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10243#primary_contact
rdfs:label "Ionfab 300 Plus"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10243-200638-P1000883.jpg
 
http://id.southampton.ac.uk/equipment/E10238
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10238#secondary_contact
rdf:type oo:Equipment
dcterms:description "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."
skos:notation "E10238"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."
rdfs:comment "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10238#primary_contact
rdfs:label "Cryoview 2000-Low Temperature"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10013
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10238-200633-P1010268.jpg
 
http://id.southampton.ac.uk/equipment/E10249
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10249#secondary_contact
rdf:type oo:Equipment
dcterms:description "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."
skos:notation "E10249"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."
rdfs:comment "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10249#primary_contact
rdfs:label "Nvision 40 Fib"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/fib.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10249-200622-P1000853.jpg
 
http://id.southampton.ac.uk/equipment/E10396
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10396#secondary_contact
rdf:type oo:Equipment
skos:notation "E10396"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10396#primary_contact
rdfs:label "MM_Wave System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10248
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10248#secondary_contact
rdf:type oo:Equipment
dcterms:description "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."
skos:notation "E10248"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."
rdfs:comment "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10248#primary_contact
rdfs:label "Zetasizer Nano-Xs"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10088
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10248-200771-P1000846.jpg
 
http://id.southampton.ac.uk/equipment/E10235
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10235#secondary_contact
rdf:type oo:Equipment
dcterms:description "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."
skos:notation "E10235"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."
rdfs:comment "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10235#primary_contact
rdfs:label "Caliber Spm System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10235-200778-P1010259.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10235-200778-P1010261.jpg
 
http://id.southampton.ac.uk/equipment/E10690
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10690#secondary_contact
rdf:type oo:Equipment
skos:notation "E10690"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10690#primary_contact
rdfs:label "Opt System 100 Pecvd Liquid Source"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10690-200643-P1000870.jpg
 
http://id.southampton.ac.uk/equipment/E10251
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10251#secondary_contact
rdf:type oo:Equipment
dcterms:description "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.     Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.     ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."
skos:notation "E10251"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.     Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.     ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."
rdfs:comment "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.     Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.     ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10251#primary_contact
rdfs:label "Atomic layer deposition system"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/ald.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10251-200637-P1000872.jpg
 
http://id.southampton.ac.uk/equipment/E10273
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10273#secondary_contact
rdf:type oo:Equipment
dcterms:description "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"
skos:notation "E10273"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"
rdfs:comment "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10273#primary_contact
rdfs:label "Nikon LV100D Bioelectronics microscope"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10273-200635-P1010293.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10273-200635-P1010294.jpg
 
http://id.southampton.ac.uk/equipment/E10239
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10239#secondary_contact
rdf:type oo:Equipment
dcterms:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor   Substrate electrode: 170 or 240 mm   Shower head gas inlet optimised for RIE   High conductance vacuum layout   Gases: CHF3, Ar, O2, SF6, CF4, N2"
skos:notation "E10239"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor   Substrate electrode: 170 or 240 mm   Shower head gas inlet optimised for RIE   High conductance vacuum layout   Gases: CHF3, Ar, O2, SF6, CF4, N2"
rdfs:comment "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor   Substrate electrode: 170 or 240 mm   Shower head gas inlet optimised for RIE   High conductance vacuum layout   Gases: CHF3, Ar, O2, SF6, CF4, N2"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10239#primary_contact
rdfs:label "Opt System 100 Oxide Etcher"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10239-200641-P1000882.jpg
 
http://id.southampton.ac.uk/equipment/E10274
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10274#secondary_contact
rdf:type oo:Equipment
dcterms:description "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"
skos:notation "E10274"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"
rdfs:comment "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10274#primary_contact
rdfs:label "DC Device Multi Probe Station"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
 
http://id.southampton.ac.uk/equipment/E10253
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10253#secondary_contact
rdf:type oo:Equipment
dcterms:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning."
skos:notation "E10253"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning."
rdfs:comment "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10253#primary_contact
rdfs:label "Opt System 100 Pecvd"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10253-200642-P1000871.jpg
 
http://id.southampton.ac.uk/equipment/E10245
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10245#secondary_contact
rdf:type oo:Equipment
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
skos:notation "E10245"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10245#primary_contact
rdfs:label "EVG620 Double Side Mask Aligner"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
 
http://id.southampton.ac.uk/equipment/E10246
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10246#secondary_contact
rdf:type oo:Equipment
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
skos:notation "E10246"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10246#primary_contact
rdfs:label "Evg620 Double Side Mask Aligner"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10246-200526-P1000829.jpg
 
http://id.southampton.ac.uk/equipment/E10275
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10275#secondary_contact
rdf:type oo:Equipment
dcterms:description "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"
skos:notation "E10275"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"
rdfs:comment "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10275#primary_contact
rdfs:label "Summit 12000B-Ap Probe Station Platform"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
 
http://id.southampton.ac.uk/equipment/E10710
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10710#secondary_contact
rdf:type oo:Equipment
skos:notation "E10710"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10710#primary_contact
rdfs:label "Furnaces - Final 10%"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10397
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10397#secondary_contact
rdf:type oo:Equipment
skos:notation "E10397"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10397#primary_contact
rdfs:label "MAX-XP Benchtop Ultra Centrifuge"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10097
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10397-200547-DSCF0607.jpg
 
http://id.southampton.ac.uk/equipment/E10613
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10613#secondary_contact
rdf:type oo:Equipment
skos:notation "E10613"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10613#primary_contact
rdfs:label "EVG501 Semi-Automated Lamination Machine"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10613-200662-P1010308.jpg
 
http://id.southampton.ac.uk/equipment/E10306
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10306#secondary_contact
rdf:type oo:Equipment
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                                - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
skos:notation "E10306"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                                - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                                - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10306#primary_contact
rdfs:label "Optical Spectrum Analyser (AQ6370)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10365
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10365#secondary_contact
rdf:type oo:Equipment
skos:notation "E10365"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10365#primary_contact
rdfs:label "Fibre Rewinder & Proof Tester"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
foaf:page http://www.orc.soton.ac.uk/silicafibrefacilities.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10365-200557-P1000895.jpg
 
http://id.southampton.ac.uk/equipment/E10299
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10299#secondary_contact
rdf:type oo:Equipment
dcterms:description "¿Optical fiber loss wavelength characteristics.[nl]
 ¿Optical filter loss evaluation.[nl]
 ¿Fiber grating characteristics evaluation.[nl]
 ¿Color analysis.[nl]
 ¿Parameter evaluation for LED, FP-LD and FB-LD.[nl]
 ¿WDM device characteristics.[nl]
 ¿evaluation."
skos:notation "E10299"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "¿Optical fiber loss wavelength characteristics.[nl]
 ¿Optical filter loss evaluation.[nl]
 ¿Fiber grating characteristics evaluation.[nl]
 ¿Color analysis.[nl]
 ¿Parameter evaluation for LED, FP-LD and FB-LD.[nl]
 ¿WDM device characteristics.[nl]
 ¿evaluation."
rdfs:comment "¿Optical fiber loss wavelength characteristics.[nl]
 ¿Optical filter loss evaluation.[nl]
 ¿Fiber grating characteristics evaluation.[nl]
 ¿Color analysis.[nl]
 ¿Parameter evaluation for LED, FP-LD and FB-LD.[nl]
 ¿WDM device characteristics.[nl]
 ¿evaluation."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10299#primary_contact
rdfs:label "Optical Spectrum Analyser (AQ6315A)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10333
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10333#secondary_contact
rdf:type oo:Equipment
dcterms:description " The EVO®50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP® or EP, the EVO®50 series is able to image to perfection."
skos:notation "E10333"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description " The EVO®50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP® or EP, the EVO®50 series is able to image to perfection."
rdfs:comment " The EVO®50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP® or EP, the EVO®50 series is able to image to perfection."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10333#primary_contact
rdfs:label "Evo 50 HV SEM"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10012
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10333-200548-P1000614.jpg
 
http://id.southampton.ac.uk/equipment/E10304
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10304#secondary_contact
rdf:type oo:Equipment
dcterms:description "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."
skos:notation "E10304"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."
rdfs:comment "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10304#primary_contact
rdfs:label "Auto 306 Resistance Evaporation System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10304-200460-P1010202.jpg
 
http://id.southampton.ac.uk/equipment/E10321
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10321#secondary_contact
rdf:type oo:Equipment
dcterms:description "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."
skos:notation "E10321"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."
rdfs:comment "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10321#primary_contact
rdfs:label "MRF High Temperature Vacuum Furnace"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10289
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10289#secondary_contact
rdf:type oo:Equipment
dcterms:description "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"
skos:notation "E10289"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"
rdfs:comment "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10289#primary_contact
rdfs:label "Vanadium Fibre Laser"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10289-200844-P1000874.jpg
 
http://id.southampton.ac.uk/equipment/E10332
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10332#secondary_contact
rdf:type oo:Equipment
dcterms:description "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"
skos:notation "E10332"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"
rdfs:comment "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10332#primary_contact
rdfs:label "Ionfab 300 Plus / Load Locked Ion Beam Etch System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10332-200545-P1000626.jpg
 
http://id.southampton.ac.uk/equipment/E10384
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10384#secondary_contact
rdf:type oo:Equipment
skos:notation "E10384"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10384#primary_contact
rdfs:label "OVD Deposition Lathe & Furnace"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
foaf:page http://www.orc.soton.ac.uk/silicafibrefacilities.html
 
http://id.southampton.ac.uk/equipment/E10293
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10293#secondary_contact
rdf:type oo:Equipment
dcterms:description "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."
skos:notation "E10293"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."
rdfs:comment "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10293#primary_contact
rdfs:label "Measurement system"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10293-200901-P1010242.jpg
 
http://id.southampton.ac.uk/equipment/E10330
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10330#secondary_contact
rdf:type oo:Equipment
dcterms:description "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."
skos:notation "E10330"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."
rdfs:comment "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10330#primary_contact
rdfs:label "Modified Material Testing Machine (M500-100CT)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10305
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10305#secondary_contact
rdf:type oo:Equipment
dcterms:description "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"
skos:notation "E10305"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"
rdfs:comment "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10305#primary_contact
rdfs:label "Auto 500 Electron Beam Deposition System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10305-200461-P1000632.jpg
 
http://id.southampton.ac.uk/equipment/E10300
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10300#secondary_contact
rdf:type oo:Equipment
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                                 - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
skos:notation "E10300"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                                 - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                                 - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10300#primary_contact
rdfs:label "Optical Spectrum Analyser (AQ6370)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10382
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10382#secondary_contact
rdf:type oo:Equipment
dcterms:description "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"
skos:notation "E10382"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"
rdfs:comment "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10382#primary_contact
rdfs:label "Newport Spectra Physics Mai Tai HP Ti:Sapphire Laser"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:page http://www.orc.soton.ac.uk/pld.html
 
http://id.southampton.ac.uk/equipment/E10336
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10336#secondary_contact
rdf:type oo:Equipment
dcterms:description " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"
skos:notation "E10336"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"
rdfs:comment " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10336#primary_contact
rdfs:label "Dual Sided Drawing Tower"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
foaf:page http://www.cimp.soton.ac.uk/silica.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10336-200671-P1010152.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10336-200671-P1010151.jpg
 
http://id.southampton.ac.uk/equipment/E10323
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10323#secondary_contact
rdf:type oo:Equipment
dcterms:description "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."
skos:notation "E10323"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."
rdfs:comment "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10323#primary_contact
rdfs:label "Plasmalab System 400 / Magnetron Sputtering System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10323-200480-P1000624.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10323-200480-P1000625.jpg
 
http://id.southampton.ac.uk/equipment/E10314
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10314#secondary_contact
rdf:type oo:Equipment
skos:notation "E10314"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10314#primary_contact
rdfs:label "Platinum Liner & Buffer Plate"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10283
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10283#secondary_contact
rdf:type oo:Equipment
dcterms:description "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."
skos:notation "E10283"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."
rdfs:comment "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10283#primary_contact
rdfs:label "Benchtop Furnace"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10283-200762-P1000823.jpg
 
http://id.southampton.ac.uk/equipment/E10277
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10277#secondary_contact
rdf:type oo:Equipment
dcterms:description "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"
skos:notation "E10277"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"
rdfs:comment "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10277#primary_contact
rdfs:label "Polytec MSA-400 Micro System Analyzer"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/memsTester.php
 
http://id.southampton.ac.uk/equipment/E10288
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10288#secondary_contact
rdf:type oo:Equipment
dcterms:description "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."
skos:notation "E10288"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."
rdfs:comment "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10288#primary_contact
rdfs:label "Precision Scriber"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php
 
http://id.southampton.ac.uk/equipment/E10329
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10329#secondary_contact
rdf:type oo:Equipment
dcterms:description "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"
skos:notation "E10329"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"
rdfs:comment "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10329#primary_contact
rdfs:label "MA6 Mask Aligner"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10329-200488-P1000639.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10329-200488-P1000637.jpg
 
http://id.southampton.ac.uk/equipment/E10320
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10320#secondary_contact
rdf:type oo:Equipment
dcterms:description "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."
skos:notation "E10320"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."
rdfs:comment "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10320#primary_contact
rdfs:label "KLA Tencor Alpha Step IQ Stylus Profier"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10320-200477-P1000646.jpg
 
http://id.southampton.ac.uk/equipment/E10319
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10319#secondary_contact
rdf:type oo:Equipment
dcterms:description "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"
skos:notation "E10319"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"
rdfs:comment "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10319#primary_contact
rdfs:label "P-16+ Stylus Surface Profiler"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10319-200476-P1000636.jpg
 
http://id.southampton.ac.uk/equipment/E10297
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10297#secondary_contact
rdf:type oo:Equipment
dcterms:description "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range.                                                                             ¿Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
 ¿Variable sweep speed up to 80nm/s[nl]
 ¿Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
 ¿Built-in high performance 60dB attenuator[nl]
 ¿Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm"
skos:notation "E10297"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range.                                                                             ¿Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
 ¿Variable sweep speed up to 80nm/s[nl]
 ¿Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
 ¿Built-in high performance 60dB attenuator[nl]
 ¿Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm"
rdfs:comment "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range.                                                                             ¿Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
 ¿Variable sweep speed up to 80nm/s[nl]
 ¿Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
 ¿Built-in high performance 60dB attenuator[nl]
 ¿Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10297#primary_contact
rdfs:label "All band tunable laser, 1440nm to 1640nm"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:page http://www.home.agilent.com/agilent/product.jspx?nid=-536900355.536883260.00&cc=GB&lc=eng
 
http://id.southampton.ac.uk/equipment/E10466
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10466#secondary_contact
rdf:type oo:Equipment
skos:notation "E10466"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10466#primary_contact
rdfs:label "Spin Coater"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10466-200767-P1010234.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10466-200767-P1000832.jpg
 
http://id.southampton.ac.uk/equipment/E10352
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10352#secondary_contact
rdf:type oo:Equipment
skos:notation "E10352"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10352#primary_contact
rdfs:label "Special Furnace System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
 
http://id.southampton.ac.uk/equipment/E10282
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10282#secondary_contact
rdf:type oo:Equipment
dcterms:description "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"
skos:notation "E10282"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"
rdfs:comment "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10282#primary_contact
rdfs:label "Jetfirst 200 Rta / Jetfirst 200 Rta No Pump"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10282-200655-P1000893.jpg
 
http://id.southampton.ac.uk/equipment/E10291
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10291#secondary_contact
rdf:type oo:Equipment
dcterms:description "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."
skos:notation "E10291"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."
rdfs:comment "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10291#primary_contact
rdfs:label "Long Scan Profilers"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10291-200838-P1000843.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10291-200838-P1010305.jpg
 
http://id.southampton.ac.uk/equipment/E10350
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10350#secondary_contact
rdf:type oo:Equipment
skos:notation "E10350"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10350#primary_contact
rdfs:label "Laser Guages For Tower"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10368
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10368#secondary_contact
rdf:type oo:Equipment
skos:notation "E10368"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10368#primary_contact
rdfs:label "Gantry Platform For 6M Silca Tower"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
foaf:page http://www.orc.soton.ac.uk/silicafibrefacilities.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10368-200570-P1010120.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10368-200570-P1010121.jpg
 
http://id.southampton.ac.uk/equipment/E10315
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10315#secondary_contact
rdf:type oo:Equipment
skos:notation "E10315"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10315#primary_contact
rdfs:label "Glove Box 1: 2-Port Box / Glove Box 2: 4-Port Box"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10315-200471-P1000703.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10315-200471-P1000701.jpg
 
http://id.southampton.ac.uk/equipment/E10290
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10290#secondary_contact
rdf:type oo:Equipment
dcterms:description "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"
skos:notation "E10290"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"
rdfs:comment "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10290#primary_contact
rdfs:label "Woollam Md2000D Ellipsometer"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/ellipsometry.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10290-200631-P1000842.jpg
 
http://id.southampton.ac.uk/equipment/E10307
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10307#secondary_contact
rdf:type oo:Equipment
skos:notation "E10307"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10307#primary_contact
rdfs:label "Optical Spectrum Analyser (AQ6370)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10292
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10292#secondary_contact
rdf:type oo:Equipment
dcterms:description "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."
skos:notation "E10292"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."
rdfs:comment "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10292#primary_contact
rdfs:label "Ambios Xp100 Stylus Surface Profiler"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10088
foaf:page http://www.southampton-nanofab.com/characterisation/
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10292-200632-P1000847.jpg
 
http://id.southampton.ac.uk/equipment/E10363
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10363#secondary_contact
rdf:type oo:Equipment
skos:notation "E10363"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10363#primary_contact
rdfs:label "Elevator Hearth Furnace (EHF 1818)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
 
http://id.southampton.ac.uk/equipment/E10353
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10353#secondary_contact
rdf:type oo:Equipment
skos:notation "E10353"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10353#primary_contact
rdfs:label "Quartz Tube Washer - Model 6600"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10353-200681-P1000698.jpg
 
http://id.southampton.ac.uk/equipment/E10383
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10383#secondary_contact
rdf:type oo:Equipment
dcterms:description "Hands-Free fully-automated fs OPO for gap-free operation at wavelengths from 345-2500 nm"
skos:notation "E10383"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Hands-Free fully-automated fs OPO for gap-free operation at wavelengths from 345-2500 nm"
rdfs:comment "Hands-Free fully-automated fs OPO for gap-free operation at wavelengths from 345-2500 nm"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10383#primary_contact
rdfs:label "Newport Spectra Physics Inspire HF100 Tuneable OPO"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10689
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10689#secondary_contact
rdf:type oo:Equipment
skos:notation "E10689"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10689#primary_contact
rdfs:label "E-Beam Writer"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10689-200627-P1000848.jpg
 
http://id.southampton.ac.uk/equipment/E10351
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10351#secondary_contact
rdf:type oo:Equipment
skos:notation "E10351"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10351#primary_contact
rdfs:label "Soft Glass Drawing Tower"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10351-200676-P1000712.jpg
 
http://id.southampton.ac.uk/equipment/E10298
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10298#secondary_contact
rdf:type oo:Equipment
skos:notation "E10298"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10298#primary_contact
rdfs:label "CW Tunable Laser System, comprising verdi- V6 WTR Riser Chiller etc"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10355
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10355#secondary_contact
rdf:type oo:Equipment
skos:notation "E10355"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10355#primary_contact
rdfs:label "Glassworking Lathe"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10355-200686-P1000705.jpg
 
http://id.southampton.ac.uk/equipment/E10316
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10316#secondary_contact
rdf:type oo:Equipment
skos:notation "E10316"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10316#primary_contact
rdfs:label "600C Environmental Oven"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10316-200472-P1000622.jpg
 
http://id.southampton.ac.uk/equipment/E10308
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10308#secondary_contact
rdf:type oo:Equipment
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                             - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
skos:notation "E10308"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                             - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                             - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10308#primary_contact
rdfs:label "Optical Spectrum Analyser (AQ6370)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10279
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10279#secondary_contact
rdf:type oo:Equipment
dcterms:description "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"
skos:notation "E10279"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"
rdfs:comment "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10279#primary_contact
rdfs:label "Cascade Microtech M150 Mulitpurpose Probing System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
 
http://id.southampton.ac.uk/equipment/E10448
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10448#secondary_contact
rdf:type oo:Equipment
skos:notation "E10448"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10448#primary_contact
rdfs:label "Quartz System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010304.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010306.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010184.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010206.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010297.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010198.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010222.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010197.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010204.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010303.jpg
 
http://id.southampton.ac.uk/equipment/E10287
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10287#secondary_contact
rdf:type oo:Equipment
dcterms:description "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."
skos:notation "E10287"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."
rdfs:comment "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10287#primary_contact
rdfs:label "5430 Fine Wire Bonder SN 30280"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10287-200857-P1000869.jpg
 
http://id.southampton.ac.uk/equipment/E10348
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10348#secondary_contact
rdf:type oo:Equipment
dcterms:description "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."
skos:notation "E10348"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."
rdfs:comment "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10348#primary_contact
rdfs:label "Planar Air Bearing System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10348-200678-DSC_0104.jpg
 
http://id.southampton.ac.uk/equipment/E10278
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10278#secondary_contact
rdf:type oo:Equipment
dcterms:description "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"
skos:notation "E10278"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"
rdfs:comment "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10278#primary_contact
rdfs:label "12 Tesla Cryogen Free Magnet System (Q6003A)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10096
foaf:page http://www.southampton-nanofab.com/fabrication/
 
http://id.southampton.ac.uk/equipment/E10322
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10322#secondary_contact
rdf:type oo:Equipment
dcterms:description "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."
skos:notation "E10322"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."
rdfs:comment "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10322#primary_contact
rdfs:label "Plasmalab 80 Plus / Compact Modular Plasma System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10322-200479-P1000628.jpg
 
http://id.southampton.ac.uk/equipment/E10331
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10331#secondary_contact
rdf:type oo:Equipment
dcterms:description "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."
skos:notation "E10331"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."
rdfs:comment "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10331#primary_contact
rdfs:label "Fibre Tapering & Bundling System (obsolete 1718)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10280
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10280#secondary_contact
rdf:type oo:Equipment
dcterms:description "10MHz-67GHz. For use with Cascade probe station."
skos:notation "E10280"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "10MHz-67GHz. For use with Cascade probe station."
rdfs:comment "10MHz-67GHz. For use with Cascade probe station."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10280#primary_contact
rdfs:label "ENA Series Network Analyzer"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10280-200920-P1010316.jpg
 
http://id.southampton.ac.uk/equipment/E10478
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10478#secondary_contact
rdf:type oo:Equipment
skos:notation "E10478"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10478#primary_contact
rdfs:label "Analysers/Generator - 3 Items Each Over £25K"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10475
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10475#secondary_contact
rdf:type oo:Equipment
dcterms:description "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."
skos:notation "E10475"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."
rdfs:comment "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10475#primary_contact
rdfs:label "Gatan X-ray Ultramicroscope (XuM) (accessory for the EVO SEM LS25 microscope)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10446
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10446#secondary_contact
rdf:type oo:Equipment
skos:notation "E10446"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10446#primary_contact
rdfs:label "Quantum Efficiency System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10446-200834-P1010313.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10446-200834-P1010312.jpg
 
http://id.southampton.ac.uk/equipment/E10458
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10458#secondary_contact
rdf:type oo:Equipment
skos:notation "E10458"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10458#primary_contact
rdfs:label "Ccd Camera"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10459
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10459#secondary_contact
rdf:type oo:Equipment
skos:notation "E10459"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10459#primary_contact
rdfs:label "Semiconductor Analyser"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10459-200869-P1010315.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10459-200869-P1010314.jpg
 
http://id.southampton.ac.uk/equipment/E10674
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10674#secondary_contact
rdf:type oo:Equipment
dcterms:description "UV-NIR variable-angle spectroscopic ellipsometer"
skos:notation "E10674"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "UV-NIR variable-angle spectroscopic ellipsometer"
rdfs:comment "UV-NIR variable-angle spectroscopic ellipsometer"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10674#primary_contact
rdfs:label "Horiba UVISEL-2 Spectroscopic Ellipsometer"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10674-200958-P1010324.jpg
 
http://id.southampton.ac.uk/equipment/E10449
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10449#secondary_contact
rdf:type oo:Equipment
skos:notation "E10449"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10449#primary_contact
rdfs:label "Software Expansion Pack For E-Beam"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/ebeamLithography.php
 
http://id.southampton.ac.uk/equipment/E10454
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10454#secondary_contact
rdf:type oo:Equipment
skos:notation "E10454"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10454#primary_contact
rdfs:label "Orion Variable Accelerating Voltage Package"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
 
http://id.southampton.ac.uk/equipment/E10465
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10465#secondary_contact
rdf:type oo:Equipment
skos:notation "E10465"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10465#primary_contact
rdfs:label "Cryogenic Probe Station"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/magnetoResistance.php
 
http://id.southampton.ac.uk/equipment/E10474
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10474#secondary_contact
rdf:type oo:Equipment
skos:notation "E10474"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10474#primary_contact
rdfs:label "Clear View: O-Orion-Clearview"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
 
http://id.southampton.ac.uk/equipment/E10488
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10488#secondary_contact
rdf:type oo:Equipment
skos:notation "E10488"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10488#primary_contact
rdfs:label "Biolight 1000"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10612
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10612#secondary_contact
rdf:type oo:Equipment
skos:notation "E10612"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10612#primary_contact
rdfs:label "Cryostat (5k to 600k)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10456
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10456#secondary_contact
rdf:type oo:Equipment
skos:notation "E10456"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10456#primary_contact
rdfs:label "Gas Cabinet"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10456-200848-P1010250.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10456-200848-P1010251.jpg
 
http://id.southampton.ac.uk/equipment/E10961
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10961#secondary_contact
rdf:type oo:Equipment
skos:notation "E10961"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10961#primary_contact
rdfs:label "FLIR SC660 Camera with lens and microlens"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10450
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10450#secondary_contact
rdf:type oo:Equipment
dcterms:description "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m²) depends on the size of the desired output beam, the lamp¿s power input and the layout of the simulator¿s optic. The spectral characteristics are always the same."
skos:notation "E10450"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m²) depends on the size of the desired output beam, the lamp¿s power input and the layout of the simulator¿s optic. The spectral characteristics are always the same."
rdfs:comment "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m²) depends on the size of the desired output beam, the lamp¿s power input and the layout of the simulator¿s optic. The spectral characteristics are always the same."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10450#primary_contact
rdfs:label "Solar Simulator"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10450-200849-P1010257.jpg
 
http://id.southampton.ac.uk/equipment/E10471
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10471#secondary_contact
rdf:type oo:Equipment
skos:notation "E10471"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10471#primary_contact
rdfs:label "Dry Bed Absorber System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10471-200758-P1010229.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10471-200758-P1010227.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10471-200758-P1010228.jpg
 
http://id.southampton.ac.uk/equipment/E10476
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10476#secondary_contact
rdf:type oo:Equipment
skos:notation "E10476"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10476#primary_contact
rdfs:label "Monocl3"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10497
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10497#secondary_contact
rdf:type oo:Equipment
dcterms:description "Supplier Name: Emerson & Cuming Microwave Products"
skos:notation "E10497"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Supplier Name: Emerson & Cuming Microwave Products"
rdfs:comment "Supplier Name: Emerson & Cuming Microwave Products"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10497#primary_contact
rdfs:label "Anechoic Chamber Project"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10442
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10442#secondary_contact
rdf:type oo:Equipment
skos:notation "E10442"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10442#primary_contact
rdfs:label "Tube Furnace Pumps"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10442-200798-P1010235.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10442-200798-P1000821.jpg
 
http://id.southampton.ac.uk/equipment/E10390
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10390#secondary_contact
rdf:type oo:Equipment
skos:notation "E10390"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10390#primary_contact
rdfs:label "Backscatter Reflectometer (obsolete 1718)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10464
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10464#secondary_contact
rdf:type oo:Equipment
skos:notation "E10464"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10464#primary_contact
rdfs:label "Laser Lithography System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/ebeamLithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10464-200850-P1010301.jpg
 
http://id.southampton.ac.uk/equipment/E10468
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10468#secondary_contact
rdf:type oo:Equipment
skos:notation "E10468"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10468#primary_contact
rdfs:label "2 Sawatec Hotplates"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10468-200780-P1000835.jpg
 
http://id.southampton.ac.uk/equipment/E10473
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10473#secondary_contact
rdf:type oo:Equipment
skos:notation "E10473"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10473#primary_contact
rdfs:label "Elemental Analysis: O-Orion-Rbs"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
 
http://id.southampton.ac.uk/equipment/E10388
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10388#secondary_contact
rdf:type oo:Equipment
skos:notation "E10388"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/~~
oo:primaryContact http://id.southampton.ac.uk/equipment/E10388#primary_contact
rdfs:label "ZeMetrics ZeScope Optical Profiling System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10388-200875-P1000647.jpg
 
http://id.southampton.ac.uk/equipment/E10460
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10460#secondary_contact
rdf:type oo:Equipment
skos:notation "E10460"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10460#primary_contact
rdfs:label "High Vacuum furnace"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10460-200872-P1010247.jpg
 
http://id.southampton.ac.uk/equipment/E10477
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10477#secondary_contact
rdf:type oo:Equipment
skos:notation "E10477"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10477#primary_contact
rdfs:label "Pattern Generator"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/nanofabrication.php
 
http://id.southampton.ac.uk/equipment/E10452
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10452#secondary_contact
rdf:type oo:Equipment
skos:notation "E10452"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10452#primary_contact
rdfs:label "Etching System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10452-200858-P1000889.jpg
 
http://id.southampton.ac.uk/equipment/E10443
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10443#secondary_contact
rdf:type oo:Equipment
skos:notation "E10443"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10443#primary_contact
rdfs:label "4 Tube Furnace"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10443-200799-P1010239.jpg
 
http://id.southampton.ac.uk/equipment/E10453
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10453#secondary_contact
rdf:type oo:Equipment
skos:notation "E10453"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10453#primary_contact
rdfs:label "Orion Performance Upgrade Package"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
 
http://id.southampton.ac.uk/equipment/E10455
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10455#secondary_contact
rdf:type oo:Equipment
skos:notation "E10455"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10455#primary_contact
rdfs:label "Orion Liquid Nitrogen Cooling Dewar System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
 
http://id.southampton.ac.uk/equipment/E10469
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10469#secondary_contact
rdf:type oo:Equipment
dcterms:description "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."
skos:notation "E10469"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."
rdfs:comment "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10469#primary_contact
rdfs:label "Vitesse Duo"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10469-200757-P1010320.jpg
 
http://id.southampton.ac.uk/equipment/E10387
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10387#secondary_contact
rdf:type oo:Equipment
skos:notation "E10387"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10387#primary_contact
rdfs:label "Nanolink DPN 5000 System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10387-200808-P1000640.jpg
 
http://id.southampton.ac.uk/equipment/E10789
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10789#secondary_contact
rdf:type oo:Equipment
skos:notation "E10789"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10789#primary_contact
rdfs:label "Prober Shuttle"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10788
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10788#secondary_contact
rdf:type oo:Equipment
skos:notation "E10788"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10788#primary_contact
rdfs:label "Savannah ALT S200 System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10788-201018-P1010241.jpg
 
http://id.southampton.ac.uk/equipment/E10614
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10614#secondary_contact
rdf:type oo:Equipment
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."
skos:notation "E10614"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10614#primary_contact
rdfs:label "EVG620 Double Side Mask Aligner"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10614-200788-P1010290.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10614-200788-P1010291.jpg
 
http://id.southampton.ac.uk/equipment/E10772
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10772#secondary_contact
rdf:type oo:Equipment
skos:notation "E10772"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10772#primary_contact
rdfs:label "10-50 PNA Network Analyser"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10077
 
http://id.southampton.ac.uk/equipment/E10974
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10974#secondary_contact
rdf:type oo:Equipment
skos:notation "E10974"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10974#primary_contact
rdfs:label "FLIR A6540 Thermal Imaging Camera plus FLIR Microscope Lens"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10838
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10838#secondary_contact
rdf:type oo:Equipment
skos:notation "E10838"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10838#primary_contact
rdfs:label "Glove Box with Gas Purification"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10838-200560-P1010199.jpg
 
http://id.southampton.ac.uk/equipment/E10840
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10840#secondary_contact
rdf:type oo:Equipment
skos:notation "E10840"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10840#primary_contact
rdfs:label "PVA Tepla 300 Plasma System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10840-200575-P1010208.jpg
 
http://id.southampton.ac.uk/equipment/E10969
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10969#secondary_contact
rdf:type oo:Equipment
skos:notation "E10969"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10969#primary_contact
rdfs:label "M Squared - Firefly-IR Widely Tunable, Pulsed Mid-Infrared Laser Tuning Range A"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10786
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10786#secondary_contact
rdf:type oo:Equipment
skos:notation "E10786"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10786#primary_contact
rdfs:label "SWIR Camera"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10786-201021-SWIR_CCD.jpg
 
http://id.southampton.ac.uk/equipment/E10738
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10738#secondary_contact
rdf:type oo:Equipment
dcterms:description "Supercontinuum (<460 to >2400 nm) laser source; 20 MHz rep. rate; 2 W average power"
skos:notation "E10738"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Supercontinuum (<460 to >2400 nm) laser source; 20 MHz rep. rate; 2 W average power"
rdfs:comment "Supercontinuum (<460 to >2400 nm) laser source; 20 MHz rep. rate; 2 W average power"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10738#primary_contact
rdfs:label "Fianium WhiteLase Supercontinuum Laser"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10738-200987-P1010325.jpg
 
http://id.southampton.ac.uk/equipment/E10615
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10615#secondary_contact
rdf:type oo:Equipment
dcterms:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."
skos:notation "E10615"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."
rdfs:comment "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10615#primary_contact
rdfs:label "EVG150 Automated Resist Processing System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
 
http://id.southampton.ac.uk/equipment/E10852
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10852#secondary_contact
rdf:type oo:Equipment
skos:notation "E10852"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10852#primary_contact
rdfs:label "Additional Gas Supply to PO 60155802"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10762
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10762#secondary_contact
rdf:type oo:Equipment
skos:notation "E10762"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10762#primary_contact
rdfs:label "Tunable laser source family"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10077
 
http://id.southampton.ac.uk/equipment/E10722
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10722#secondary_contact
rdf:type oo:Equipment
skos:notation "E10722"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10722#primary_contact
rdfs:label "Super Continuum System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10093
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10722-200952-P1010167.jpg
 
http://id.southampton.ac.uk/equipment/E10839
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10839#secondary_contact
rdf:type oo:Equipment
skos:notation "E10839"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10839#primary_contact
rdfs:label "Plasma System 300 (S/N 1314)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10741
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10741#secondary_contact
rdf:type oo:Equipment
dcterms:description "Gas injection system for chemically-assisted focused ion beam milling of insulating materials"
skos:notation "E10741"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Gas injection system for chemically-assisted focused ion beam milling of insulating materials"
rdfs:comment "Gas injection system for chemically-assisted focused ion beam milling of insulating materials"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10741#primary_contact
rdfs:label "XF2 Insulator Enhanced Etch Gas Injector"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10011
foaf:page http://www.zeplerinstitute.ac.uk/facilities/fib
 
http://id.southampton.ac.uk/equipment/E10845
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10845#secondary_contact
rdf:type oo:Equipment
skos:notation "E10845"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10845#primary_contact
rdfs:label "000000-0239-518"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10708
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10708#secondary_contact
rdf:type oo:Equipment
skos:notation "E10708"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10708#primary_contact
rdfs:label "DC Sputter (Enhancement To Helios Sputter Tool)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10708-200846-P1010246.jpg
 
http://id.southampton.ac.uk/equipment/E10761
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10761#secondary_contact
rdf:type oo:Equipment
skos:notation "E10761"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10761#primary_contact
rdfs:label "Thermal imaging camera"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10093
 
http://id.southampton.ac.uk/equipment/E10721
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10721#secondary_contact
rdf:type oo:Equipment
skos:notation "E10721"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10721#primary_contact
rdfs:label "Chameleon Laser System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10617
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10617#secondary_contact
rdf:type oo:Equipment
dcterms:description "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."
skos:notation "E10617"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."
rdfs:comment "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10617#primary_contact
rdfs:label "3 Stacis "Quiet Island" Support Systems"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010289.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010274.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010276.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010288.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010275.jpg
 
http://id.southampton.ac.uk/equipment/E10757
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10757#secondary_contact
rdf:type oo:Equipment
skos:notation "E10757"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10757#primary_contact
rdfs:label "Orion 8 Sputter System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10864
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10864#secondary_contact
rdf:type oo:Equipment
skos:notation "E10864"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10864#primary_contact
rdfs:label "Fibre Coating System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10740
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10740#secondary_contact
rdf:type oo:Equipment
skos:notation "E10740"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10740#primary_contact
rdfs:label "Optical time domain reflectometer"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10093
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10740-200989-P1010170.jpg
 
http://id.southampton.ac.uk/equipment/E10846
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10846#secondary_contact
rdf:type oo:Equipment
skos:notation "E10846"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10846#primary_contact
rdfs:label "000000-0239-518"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10978
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10978#secondary_contact
rdf:type oo:Equipment
dcterms:description "Fully-automated SLM-based measurement and compression of femtosecond laser pulses; Arbitrary phase and amplitude modulation"
skos:notation "E10978"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Fully-automated SLM-based measurement and compression of femtosecond laser pulses; Arbitrary phase and amplitude modulation"
rdfs:comment "Fully-automated SLM-based measurement and compression of femtosecond laser pulses; Arbitrary phase and amplitude modulation"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10978#primary_contact
rdfs:label "Biophotonics Solutions MIIPS Box640 Pulse Shaper"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10609
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10609#secondary_contact
rdf:type oo:Equipment
dcterms:description "The TwinSNOM combines conventional microscopy, SNOM, shear-force AFM and optionally even laser scanning confocal microscopy or Needle-Sensor AFM in a single instrument."
skos:notation "E10609"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The TwinSNOM combines conventional microscopy, SNOM, shear-force AFM and optionally even laser scanning confocal microscopy or Needle-Sensor AFM in a single instrument."
rdfs:comment "The TwinSNOM combines conventional microscopy, SNOM, shear-force AFM and optionally even laser scanning confocal microscopy or Needle-Sensor AFM in a single instrument."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10609#primary_contact
rdfs:label "Omicron Twin SNOM System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11274
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11274#secondary_contact
rdf:type oo:Equipment
dcterms:description "Vertical Furnace"
skos:notation "E11274"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Vertical Furnace"
rdfs:comment "Vertical Furnace"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11274#primary_contact
rdfs:label "Vertical Furnace"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E11075
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11075#secondary_contact
rdf:type oo:Equipment
dcterms:description "Digital lock-in amplifier covering the frequency range from DC to 600 MHz;"
skos:notation "E11075"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Digital lock-in amplifier covering the frequency range from DC to 600 MHz;"
rdfs:comment "Digital lock-in amplifier covering the frequency range from DC to 600 MHz;"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11075#primary_contact
rdfs:label "Zurich Instruments UHF Lock-In Amplifier"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10472
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10472#secondary_contact
rdf:type oo:Equipment
dcterms:description "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."
skos:notation "E10472"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."
rdfs:comment "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10472#primary_contact
rdfs:label "Zeiss EVO Scanning Electron Microscope"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
 
http://id.southampton.ac.uk/equipment/E11046
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11046#secondary_contact
rdf:type oo:Equipment
dcterms:description "PO60489087 Subproject 514689104"
skos:notation "E11046"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "PO60489087 Subproject 514689104"
rdfs:comment "PO60489087 Subproject 514689104"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11046#primary_contact
rdfs:label "DMOptics Yokogawa AQ6370D-10-L1 Optical Spectrum Analyzer"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11272
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11272#secondary_contact
rdf:type oo:Equipment
dcterms:description "Flame Hydrolysis Deposition Chamber"
skos:notation "E11272"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Flame Hydrolysis Deposition Chamber"
rdfs:comment "Flame Hydrolysis Deposition Chamber"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11272#primary_contact
rdfs:label "Flame Hydrolysis Deposition Chamber - 1 of 2"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E11273
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11273#secondary_contact
rdf:type oo:Equipment
dcterms:description "Flame Hydrolysis Deposition Chamber - 2 of 2"
skos:notation "E11273"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Flame Hydrolysis Deposition Chamber - 2 of 2"
rdfs:comment "Flame Hydrolysis Deposition Chamber - 2 of 2"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11273#primary_contact
rdfs:label "Flame Hydrolysis Deposition Chamber - 2 of 2"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10885
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10885#secondary_contact
rdf:type oo:Equipment
skos:notation "E10885"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10885#primary_contact
rdfs:label "TGA-200 Complete System plus accessories"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10885-201037-P1010168.jpg
 
http://id.southampton.ac.uk/equipment/E11042
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11042#secondary_contact
rdf:type oo:Equipment
skos:notation "E11042"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11042#primary_contact
rdfs:label "DISCO DAD3430 Semi Automatic Dicing Saw"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11047
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11047#secondary_contact
rdf:type oo:Equipment
skos:notation "E11047"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11047#primary_contact
rdfs:label "DMOptics Yokogawa AQ6373 Optical Spectrum Analyzer"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10903
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10903#secondary_contact
rdf:type oo:Equipment
skos:notation "E10903"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10903#primary_contact
rdfs:label "Broadband Tunable Laser System with MCT detectors"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11165
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11165#secondary_contact
rdf:type oo:Equipment
dcterms:description "subproject code 514689104 PO60500186"
skos:notation "E11165"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "subproject code 514689104 PO60500186"
rdfs:comment "subproject code 514689104 PO60500186"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11165#primary_contact
rdfs:label "SLM213 Solid-State Laser System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11069
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11069#secondary_contact
rdf:type oo:Equipment
skos:notation "E11069"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11069#primary_contact
rdfs:label "LAZERMaster LZM-100 Glass Processing and Splicing System Serial No. 201 (and optional extras)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10514
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10514#secondary_contact
rdf:type oo:Equipment
dcterms:description "Scanning electron microscope (LaB6 source; 0-50 keV) equipped for VI-NIR spectroscopic analysis and angle-resolved mapping of electron-induced light emission (cf. cathodoluminescence)"
skos:notation "E10514"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Scanning electron microscope (LaB6 source; 0-50 keV) equipped for VI-NIR spectroscopic analysis and angle-resolved mapping of electron-induced light emission (cf. cathodoluminescence)"
rdfs:comment "Scanning electron microscope (LaB6 source; 0-50 keV) equipped for VI-NIR spectroscopic analysis and angle-resolved mapping of electron-induced light emission (cf. cathodoluminescence)"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10514#primary_contact
rdfs:label "CamScan CS3200 Scanning Electron Microscope + parts"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11381
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11381#secondary_contact
rdf:type oo:Equipment
dcterms:description "Refurbished prober S12K with eVUE and thermal refurbished unit"
skos:notation "E11381"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Refurbished prober S12K with eVUE and thermal refurbished unit"
rdfs:comment "Refurbished prober S12K with eVUE and thermal refurbished unit"
oo:organizationPart http://id.southampton.ac.uk/org/A3, http://id.southampton.ac.uk/org/PN
oo:primaryContact http://id.southampton.ac.uk/equipment/E11381#primary_contact
rdfs:label "Refurbished prober S12K with eVUE and thermal refurbished unit"
 
http://id.southampton.ac.uk/equipment/E10916
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10916#secondary_contact
rdf:type oo:Equipment
skos:notation "E10916"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10916#primary_contact
rdfs:label "Laser tune QCL system with TEC MCT detector including upgrade and standard accessories"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11213
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11213#secondary_contact
rdf:type oo:Equipment
skos:notation "E11213"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11213#primary_contact
rdfs:label "Firestar ti100 100w 9.3um laser system"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11067
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11067#secondary_contact
rdf:type oo:Equipment
skos:notation "E11067"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11067#primary_contact
rdfs:label "Fujikura FSM-100PPLUS Speciality Splicer Serial No. 1724"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11007
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11007#secondary_contact
rdf:type oo:Equipment
dcterms:description "Hands-free femtosecond oscillator generating sub-10 fs pulses: >100 nm bandwidth at 800 nm; >500 mW average output power"
skos:notation "E11007"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Hands-free femtosecond oscillator generating sub-10 fs pulses: >100 nm bandwidth at 800 nm; >500 mW average output power"
rdfs:comment "Hands-free femtosecond oscillator generating sub-10 fs pulses: >100 nm bandwidth at 800 nm; >500 mW average output power"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11007#primary_contact
rdfs:label "Femtolasers Integral Element PRO-500 Utrashort Pulse Oscillator"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E11043
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11043#secondary_contact
rdf:type oo:Equipment
skos:notation "E11043"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11043#primary_contact
rdfs:label "DISCO DCS1440 Automatic Cleaning System"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10758
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10758#secondary_contact
rdf:type oo:Equipment
dcterms:description "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."
skos:notation "E10758"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."
rdfs:comment "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10758#primary_contact
rdfs:label "Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD)"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E11263
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E11263#secondary_contact
rdf:type oo:Equipment
dcterms:description "Tuneable Laser Source[cr][nl]
Model: TLS-550[cr][nl]
Serial number: 16110034[cr][nl]
Wavelength Band: 1260 ? 1360nm"
skos:notation "E11263"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Tuneable Laser Source[cr][nl]
Model: TLS-550[cr][nl]
Serial number: 16110034[cr][nl]
Wavelength Band: 1260 ? 1360nm"
rdfs:comment "Tuneable Laser Source[cr][nl]
Model: TLS-550[cr][nl]
Serial number: 16110034[cr][nl]
Wavelength Band: 1260 ? 1360nm"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11263#primary_contact
rdfs:label "Tuneable Laser Source O-band model TSL-550"
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/point-of-service/shower16
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53, http://id.southampton.ac.uk/room/53-2083, http://id.southampton.ac.uk/floor/53-2
rdf:type http://purl.org/goodrelations/v1#LocationOfSalesOrServiceProvisioning
skos:notation "shower16"
rdfs:label "Shower"
oo:mapIcon https://data.southampton.ac.uk/map-icons/shower.png
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http://www.semanticdesktop.org/ontologies/2007/03/22/nfo#height "220"^^xsd:integer
http://www.semanticdesktop.org/ontologies/2007/03/22/nfo#width "220"^^xsd:integer
http://www.semanticdesktop.org/ontologies/2007/03/22/nfo#fileSize "12148"^^xsd:integer
http://www.semanticdesktop.org/ontologies/2007/03/22/nfo#aspectRatio "1"^^xsd:float
dcterms:date "2010"^^xsd:date
 
http://id.southampton.ac.uk/building-portal/53-A
http://purl.org/openorg/portals/connectsBuilding http://id.southampton.ac.uk/building/53
rdf:type http://purl.org/openorg/portals/BuildingEntrance, http://purl.org/openorg/portals/FloorEntrance
rdfs:comment "Faculty of Physical Sciences and Engineering Student office"
rdfs:label "Salisbury road entrance"
geo:lat "50.93743"^^xsd:float
geo:long "-1.39805"^^xsd:float
http://purl.org/openorg/portals/connectsFloor http://id.southampton.ac.uk/floor/53-1
 
http://id.southampton.ac.uk/building-portal/53-B
http://purl.org/openorg/portals/connectsBuilding http://id.southampton.ac.uk/building/53
rdf:type http://purl.org/openorg/portals/BuildingEntrance, http://purl.org/openorg/portals/FloorEntrance
rdfs:comment "Card access rather than pushbutton"
rdfs:label "Banks entrance"
geo:lat "50.93755"^^xsd:float
geo:long "-1.39799"^^xsd:float
http://purl.org/openorg/portals/connectsFloor http://id.southampton.ac.uk/floor/53-1