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rdfs:label "Caliber Spm System"^^xsd:string
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skos:notation "E10235"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."^^xsd:string
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foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."^^xsd:string
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rdfs:label "Clean Rooms - Nanofabrication"^^xsd:string
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rdfs:comment "The Southampton Nanofabrication Centre is a state-of-the-art facility for microfabrication and high-spec nanofabrication, as well as a wide range of characterisation capabilities housed in the new Mountbatten Complex at the University of Southampton. One of the premiere cleanrooms in Europe, the Centre has a uniquely broad range of technologies, combining traditional and novel top down fabrication with state-of-the-art bottom up fabrication. This allows us to develop and produce a wide range of devices in diverse fields such as electronics, nanotechnology and bionanotechnology and incorporate them into an equally comprehensive array of nano and microsystems for analysis and use. The characterisation capability is similarly extensive catalogue of microscopes and test gear, from nanometre resolution scanning microscopes to electrical, magnetic and RF analysis. A detailed equiment list can be found at http://www.southampton-nanofab.com/machineDatabase/"^^xsd:string
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http://id.southampton.ac.uk/equipment/E10238
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Cryoview 2000-Low Temperature"^^xsd:string
dcterms:description "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."^^xsd:string
skos:notation "E10238"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10238#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."^^xsd:string
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http://id.southampton.ac.uk/equipment/E10239
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rdf:type oo:Equipment
rdfs:label "Opt System 100 Oxide Etcher"^^xsd:string
dcterms:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor␣␣␣Substrate electrode: 170 or 240 mm␣␣␣Shower head gas inlet optimised for RIE␣␣␣High conductance vacuum layout␣␣␣Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string
skos:notation "E10239"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor␣␣␣Substrate electrode: 170 or 240 mm␣␣␣Shower head gas inlet optimised for RIE␣␣␣High conductance vacuum layout␣␣␣Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10239#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
dc:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor␣␣␣Substrate electrode: 170 or 240 mm␣␣␣Shower head gas inlet optimised for RIE␣␣␣High conductance vacuum layout␣␣␣Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string
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http://id.southampton.ac.uk/equipment/E10240
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Opt System 100 Metal Etcher"^^xsd:string
dcterms:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string
skos:notation "E10240"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10240#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
dc:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
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http://id.southampton.ac.uk/equipment/E10241
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Plasmalab 80 Plus Rie Etcher"^^xsd:string
dcterms:description "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string
skos:notation "E10241"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10241#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
dc:description "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
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oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10243
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Ionfab 300 Plus"^^xsd:string
dcterms:description "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string
skos:notation "E10243"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10243#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10243#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10244
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "EVG620 Top Side Mask Aligner"^^xsd:string
dcterms:description "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.␣␣Exposure can be performed in hard, soft and proximity modes."^^xsd:string
skos:notation "E10244"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.␣␣Exposure can be performed in hard, soft and proximity modes."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10244#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.␣␣Exposure can be performed in hard, soft and proximity modes."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10244#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10245
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "EVG620 Double Side Mask Aligner"^^xsd:string
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
skos:notation "E10245"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10245#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10245#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10246
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Evg620 Double Side Mask Aligner"^^xsd:string
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
skos:notation "E10246"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10246#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10246#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10248
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Zetasizer Nano-Xs"^^xsd:string
dcterms:description "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."^^xsd:string
skos:notation "E10248"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10248#secondary_contact
dc:description "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10248#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10088
 
http://id.southampton.ac.uk/equipment/E10249
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Nvision 40 Fib"^^xsd:string
dcterms:description "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string
skos:notation "E10249"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10249#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/fib.php
dc:description "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10249#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10250
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Nanofab 1000 Agile"^^xsd:string
dcterms:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires.␣␣␣␣␣CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size.␣␣␣␣Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require␣␣germane for growth.␣␣␣␣␣SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows.␣␣␣␣All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"^^xsd:string
skos:notation "E10250"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires.␣␣␣␣␣CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size.␣␣␣␣Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require␣␣germane for growth.␣␣␣␣␣SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows.␣␣␣␣All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10250#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/pecvd.php
dc:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires.␣␣␣␣␣CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size.␣␣␣␣Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require␣␣germane for growth.␣␣␣␣␣SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows.␣␣␣␣All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10250#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10009
 
http://id.southampton.ac.uk/facility/F10009
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
rdfs:label "Clean Rooms - FHD"^^xsd:string
dcterms:description "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."^^xsd:string
skos:notation "F10009"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."^^xsd:string
dc:description "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10009#primary_contact
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10250
 
http://id.southampton.ac.uk/equipment/E10251
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Atomic layer deposition system"^^xsd:string
dcterms:description "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.␣␣␣␣␣Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.␣␣␣␣␣ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string
skos:notation "E10251"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.␣␣␣␣␣Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.␣␣␣␣␣ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10251#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/ald.php
dc:description "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.␣␣␣␣␣Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.␣␣␣␣␣ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10251#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10253
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Opt System 100 Pecvd"^^xsd:string
dcterms:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.␣␣␣␣␣The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.␣␣␣␣␣Amorphous silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.␣␣␣␣␣Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.␣␣␣␣␣Microcrystalline silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.␣␣␣␣␣Amorphous and polycrystalline germanium use GeH4 as a source of␣␣Ge and CF4 & O2 for cleaning."^^xsd:string
skos:notation "E10253"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.␣␣␣␣␣The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.␣␣␣␣␣Amorphous silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.␣␣␣␣␣Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.␣␣␣␣␣Microcrystalline silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.␣␣␣␣␣Amorphous and polycrystalline germanium use GeH4 as a source of␣␣Ge and CF4 & O2 for cleaning."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10253#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.␣␣␣␣␣The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.␣␣␣␣␣Amorphous silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.␣␣␣␣␣Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.␣␣␣␣␣Microcrystalline silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.␣␣␣␣␣Amorphous and polycrystalline germanium use GeH4 as a source of␣␣Ge and CF4 & O2 for cleaning."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10253#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10258
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "He Ion Microscope: Orion-Bu"^^xsd:string
dcterms:description "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string
skos:notation "E10258"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10258#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
dc:description "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10258#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10260
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Helios Sputtering System Type Xl 6""^^xsd:string
dcterms:description "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string
skos:notation "E10260"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10260#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10260#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10261
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Field Emmission Scanning Electron Microscope (FEG-SEM)"^^xsd:string
dcterms:description "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string
skos:notation "E10261"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10261#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
dc:description "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10261#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10263
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Evaporator Gun"^^xsd:string
dcterms:description " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string
skos:notation "E10263"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10263#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10263#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10264
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Imoxs Sem"^^xsd:string
dcterms:description "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string
skos:notation "E10264"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10264#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
dc:description "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10264#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10265
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Fluoresence System"^^xsd:string
dcterms:description "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string
skos:notation "E10265"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10265#secondary_contact
dc:description "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10265#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10267
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Auto 306 Resistance Evaporation System"^^xsd:string
dcterms:description "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string
skos:notation "E10267"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10267#secondary_contact
dc:description "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10267#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10268
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Optiwet St30"^^xsd:string
dcterms:description "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string
skos:notation "E10268"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10268#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10268#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10272
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Nikon L200D microscope"^^xsd:string
dcterms:description "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string
skos:notation "E10272"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10272#secondary_contact
dc:description "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10272#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10273
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Nikon LV100D Bioelectronics microscope"^^xsd:string
dcterms:description "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string
skos:notation "E10273"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10273#secondary_contact
dc:description "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10273#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10274
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "DC Device Multi Probe Station"^^xsd:string
dcterms:description "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string
skos:notation "E10274"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10274#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
dc:description "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10274#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10275
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Summit 12000B-Ap Probe Station Platform"^^xsd:string
dcterms:description "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string
skos:notation "E10275"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10275#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
dc:description "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10275#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10276
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Theta probe PARXPS system"^^xsd:string
dcterms:description "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string
skos:notation "E10276"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10276#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
dc:description "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10276#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10277
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Polytec MSA-400 Micro System Analyzer"^^xsd:string
dcterms:description "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string
skos:notation "E10277"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10277#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/memsTester.php
dc:description "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10277#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10278
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "12 Tesla Cryogen Free Magnet System (Q6003A)"^^xsd:string
dcterms:description "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"^^xsd:string
skos:notation "E10278"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10278#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/
dc:description "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10278#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10096
 
http://id.southampton.ac.uk/equipment/E10279
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Cascade Microtech M150 Mulitpurpose Probing System"^^xsd:string
dcterms:description "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string
skos:notation "E10279"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10279#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
dc:description "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10279#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10280
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "ENA Series Network Analyzer"^^xsd:string
dcterms:description "10MHz-67GHz. For use with Cascade probe station."^^xsd:string
skos:notation "E10280"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "10MHz-67GHz. For use with Cascade probe station."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10280#secondary_contact
dc:description "10MHz-67GHz. For use with Cascade probe station."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10280#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10282
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Jetfirst 200 Rta / Jetfirst 200 Rta No Pump"^^xsd:string
dcterms:description "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string
skos:notation "E10282"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10282#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
dc:description "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10282#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10283
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Benchtop Furnace"^^xsd:string
dcterms:description "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
skos:notation "E10283"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10283#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
dc:description "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10283#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10284
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Tempress Clean Furnace Stack"^^xsd:string
dcterms:description "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
skos:notation "E10284"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10284#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
dc:description "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10284#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10287
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "5430 Fine Wire Bonder SN 30280"^^xsd:string
dcterms:description "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string
skos:notation "E10287"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10287#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10287#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10288
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Precision Scriber"^^xsd:string
dcterms:description "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."^^xsd:string
skos:notation "E10288"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10288#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php
dc:description "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10288#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10289
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Vanadium Fibre Laser"^^xsd:string
dcterms:description "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string
skos:notation "E10289"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10289#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php
dc:description "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10289#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10290
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Woollam Md2000D Ellipsometer"^^xsd:string
dcterms:description "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string
skos:notation "E10290"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10290#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/ellipsometry.php
dc:description "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10290#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10291
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Long Scan Profilers"^^xsd:string
dcterms:description "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
skos:notation "E10291"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10291#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/
dc:description "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10291#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10292
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Ambios Xp100 Stylus Surface Profiler"^^xsd:string
dcterms:description "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."^^xsd:string
skos:notation "E10292"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10292#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/
dc:description "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10292#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10088
 
http://id.southampton.ac.uk/equipment/E10293
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Measurement system"^^xsd:string
dcterms:description "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."^^xsd:string
skos:notation "E10293"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10293#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/
dc:description "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10293#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10297
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "All band tunable laser, 1440nm to 1640nm"^^xsd:string
dcterms:description "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣?Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
?Variable sweep speed up to 80nm/s[nl]
?Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
?Built-in high performance 60dB attenuator[nl]
?Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm[nl]
"^^xsd:string
skos:notation "E10297"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣?Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
?Variable sweep speed up to 80nm/s[nl]
?Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
?Built-in high performance 60dB attenuator[nl]
?Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10297#secondary_contact
foaf:page http://www.home.agilent.com/agilent/product.jspx?nid=-536900355.536883260.00&cc=GB&lc=eng
dc:description "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣?Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
?Variable sweep speed up to 80nm/s[nl]
?Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
?Built-in high performance 60dB attenuator[nl]
?Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10297#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10298
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "CW Tunable Laser System, comprising verdi- V6 WTR Riser Chiller etc"^^xsd:string
skos:notation "E10298"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10298#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10298#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10299
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (AQ6315A)"^^xsd:string
dcterms:description "?Optical fiber loss wavelength characteristics.[nl]
?Optical filter loss evaluation.[nl]
?Fiber grating characteristics evaluation.[nl]
?Color analysis.[nl]
?Parameter evaluation for LED, FP-LD and FB-LD.[nl]
?WDM device characteristics.[nl]
?evaluation."^^xsd:string
skos:notation "E10299"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "?Optical fiber loss wavelength characteristics.[nl]
?Optical filter loss evaluation.[nl]
?Fiber grating characteristics evaluation.[nl]
?Color analysis.[nl]
?Parameter evaluation for LED, FP-LD and FB-LD.[nl]
?WDM device characteristics.[nl]
?evaluation."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10299#secondary_contact
dc:description "?Optical fiber loss wavelength characteristics.[nl]
?Optical filter loss evaluation.[nl]
?Fiber grating characteristics evaluation.[nl]
?Color analysis.[nl]
?Parameter evaluation for LED, FP-LD and FB-LD.[nl]
?WDM device characteristics.[nl]
?evaluation."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10299#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/facility/F10005
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
rdfs:label "Clean Rooms - Silica"^^xsd:string
dcterms:description "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."^^xsd:string
skos:notation "F10005"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."^^xsd:string
dc:description "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10005#primary_contact
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10299, http://id.southampton.ac.uk/equipment/E10306, http://id.southampton.ac.uk/equipment/E10336, http://id.southampton.ac.uk/equipment/E10365, http://id.southampton.ac.uk/equipment/E10368, http://id.southampton.ac.uk/equipment/E10384, http://id.southampton.ac.uk/equipment/E10390
 
http://id.southampton.ac.uk/equipment/E10300
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (AQ6370)"^^xsd:string
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
skos:notation "E10300"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10300#secondary_contact
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10300#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10304
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Auto 306 Resistance Evaporation System"^^xsd:string
dcterms:description "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others).[nl]
"^^xsd:string
skos:notation "E10304"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others).[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10304#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others).[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10304#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10305
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Auto 500 Electron Beam Deposition System"^^xsd:string
dcterms:description "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"^^xsd:string
skos:notation "E10305"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10305#secondary_contact
dc:description "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10305#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/facility/F10010
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
rdfs:label "Clean Rooms - Integrated Photonics"^^xsd:string
dcterms:description "The Integrated Photonics Cleanroom is a 200m? Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."^^xsd:string
skos:notation "F10010"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The Integrated Photonics Cleanroom is a 200m? Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."^^xsd:string
dc:description "The Integrated Photonics Cleanroom is a 200m? Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10010#primary_contact
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10305, http://id.southampton.ac.uk/equipment/E10316, http://id.southampton.ac.uk/equipment/E10319, http://id.southampton.ac.uk/equipment/E10320, http://id.southampton.ac.uk/equipment/E10321, http://id.southampton.ac.uk/equipment/E10322, http://id.southampton.ac.uk/equipment/E10323, http://id.southampton.ac.uk/equipment/E10329, http://id.southampton.ac.uk/equipment/E10332, http://id.southampton.ac.uk/equipment/E10348, http://id.southampton.ac.uk/equipment/E10362, http://id.southampton.ac.uk/equipment/E10373, http://id.southampton.ac.uk/equipment/E10387, http://id.southampton.ac.uk/equipment/E10388, http://id.southampton.ac.uk/equipment/E10494, http://id.southampton.ac.uk/equipment/E10840, http://id.southampton.ac.uk/equipment/E11272, http://id.southampton.ac.uk/equipment/E11273, http://id.southampton.ac.uk/equipment/E11274
 
http://id.southampton.ac.uk/equipment/E10306
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (AQ6370)"^^xsd:string
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
skos:notation "E10306"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10306#secondary_contact
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10306#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10307
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (AQ6370)"^^xsd:string
skos:notation "E10307"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10307#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10307#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10308
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (AQ6370)"^^xsd:string
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
skos:notation "E10308"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10308#secondary_contact
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10308#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10314
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Platinum Liner & Buffer Plate"^^xsd:string
skos:notation "E10314"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10314#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10314#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10315
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Glove Box 1: 2-Port Box / Glove Box 2: 4-Port Box"^^xsd:string
skos:notation "E10315"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10315#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10315#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/facility/F10007
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
rdfs:label "Clean Rooms - Novel Glass"^^xsd:string
dcterms:description "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."^^xsd:string
skos:notation "F10007"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."^^xsd:string
dc:description "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10007#primary_contact
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10315, http://id.southampton.ac.uk/equipment/E10335, http://id.southampton.ac.uk/equipment/E10350, http://id.southampton.ac.uk/equipment/E10351, http://id.southampton.ac.uk/equipment/E10352, http://id.southampton.ac.uk/equipment/E10353, http://id.southampton.ac.uk/equipment/E10355, http://id.southampton.ac.uk/equipment/E10363, http://id.southampton.ac.uk/equipment/E10460, http://id.southampton.ac.uk/equipment/E10838
 
http://id.southampton.ac.uk/equipment/E10316
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "600C Environmental Oven"^^xsd:string
skos:notation "E10316"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10316#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10316#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10319
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "P-16+ Stylus Surface Profiler"^^xsd:string
dcterms:description "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"^^xsd:string
skos:notation "E10319"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10319#secondary_contact
dc:description "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10319#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10320
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "KLA Tencor Alpha Step IQ Stylus Profier"^^xsd:string
dcterms:description "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8? (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."^^xsd:string
skos:notation "E10320"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8? (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10320#secondary_contact
dc:description "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8? (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10320#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10321
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "MRF High Temperature Vacuum Furnace"^^xsd:string
dcterms:description "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen.[cr][nl]
"^^xsd:string
skos:notation "E10321"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen.[cr][nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10321#secondary_contact
dc:description "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen.[cr][nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10321#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10322
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Plasmalab 80 Plus / Compact Modular Plasma System"^^xsd:string
dcterms:description "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."^^xsd:string
skos:notation "E10322"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10322#secondary_contact
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
dc:description "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10322#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10323
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Plasmalab System 400 / Magnetron Sputtering System"^^xsd:string
dcterms:description "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films. [nl]
[nl]
"^^xsd:string
skos:notation "E10323"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films. [nl]
[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10323#secondary_contact
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
dc:description "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films. [nl]
[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10323#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10329
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "MA6 Mask Aligner"^^xsd:string
dcterms:description "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer [nl]
[nl]
"^^xsd:string
skos:notation "E10329"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer [nl]
[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10329#secondary_contact
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
dc:description "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer [nl]
[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10329#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10330
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Modified Material Testing Machine (M500-100CT)"^^xsd:string
dcterms:description "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest? software running under the Windows? operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string
skos:notation "E10330"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest? software running under the Windows? operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10330#secondary_contact
dc:description "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest? software running under the Windows? operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10330#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10331
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Fibre Tapering & Bundling System (obsolete 1718)"^^xsd:string
dcterms:description "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss.[nl]
"^^xsd:string
skos:notation "E10331"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss.[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10331#secondary_contact
dc:description "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss.[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10331#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10332
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Ionfab 300 Plus / Load Locked Ion Beam Etch System"^^xsd:string
dcterms:description "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"^^xsd:string
skos:notation "E10332"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10332#secondary_contact
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
dc:description "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10332#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10333
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Evo 50 HV SEM"^^xsd:string
dcterms:description " The EVO?50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP? or EP, the EVO?50 series is able to image to perfection.[nl]
"^^xsd:string
skos:notation "E10333"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment " The EVO?50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP? or EP, the EVO?50 series is able to image to perfection.[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10333#secondary_contact
dc:description " The EVO?50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP? or EP, the EVO?50 series is able to image to perfection.[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10333#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10012
 
http://id.southampton.ac.uk/facility/F10012
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Facility
rdfs:label "Scanning Electron Microscope (SEM)"^^xsd:string
dcterms:description "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."^^xsd:string
skos:notation "F10012"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."^^xsd:string
dc:description "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/facility/F10012#primary_contact
http://id.southampton.ac.uk/ns/facilityIsRCUKCosted "true"^^xsd:boolean
is oo:relatedFacility of http://id.southampton.ac.uk/equipment/E10333
 
http://id.southampton.ac.uk/equipment/E10335
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Soft Glass Fiber Drawing Tower"^^xsd:string
skos:notation "E10335"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10335#secondary_contact
foaf:page http://www.cimp.soton.ac.uk/silica.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10335#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10336
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Dual Sided Drawing Tower"^^xsd:string
dcterms:description " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"^^xsd:string
skos:notation "E10336"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10336#secondary_contact
foaf:page http://www.cimp.soton.ac.uk/silica.html
dc:description " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10336#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10348
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Planar Air Bearing System"^^xsd:string
dcterms:description "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."^^xsd:string
skos:notation "E10348"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10348#secondary_contact
dc:description "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10348#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10350
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Laser Guages For Tower"^^xsd:string
skos:notation "E10350"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10350#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10350#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10351
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Soft Glass Drawing Tower"^^xsd:string
skos:notation "E10351"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10351#secondary_contact
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10351#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10352
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Special Furnace System"^^xsd:string
skos:notation "E10352"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10352#secondary_contact
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10352#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10353
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Quartz Tube Washer - Model 6600"^^xsd:string
skos:notation "E10353"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10353#secondary_contact
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10353#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10355
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Glassworking Lathe"^^xsd:string
skos:notation "E10355"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10355#secondary_contact
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10355#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10359
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Pressurization system"^^xsd:string
skos:notation "E10359"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10359#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10359#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10093
 
http://id.southampton.ac.uk/equipment/E10362
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "MJB4 Mask Aligner"^^xsd:string
skos:notation "E10362"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10362#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10362#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10363
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Elevator Hearth Furnace (EHF 1818)"^^xsd:string
skos:notation "E10363"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10363#secondary_contact
foaf:page http://www.orc.soton.ac.uk/novelglasscleanrooms.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10363#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10365
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Fibre Rewinder & Proof Tester"^^xsd:string
skos:notation "E10365"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10365#secondary_contact
foaf:page http://www.orc.soton.ac.uk/silicafibrefacilities.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10365#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10368
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Gantry Platform For 6M Silca Tower"^^xsd:string
skos:notation "E10368"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10368#secondary_contact
foaf:page http://www.orc.soton.ac.uk/silicafibrefacilities.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10368#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10373
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Three Zone, Bench Top 1700C Tube Furnace"^^xsd:string
skos:notation "E10373"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10373#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10373#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10382
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Newport Spectra Physics Mai Tai HP Ti:Sapphire Laser"^^xsd:string
dcterms:description "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"^^xsd:string
skos:notation "E10382"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10382#secondary_contact
foaf:page http://www.orc.soton.ac.uk/pld.html
dc:description "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10382#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10383
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Newport Spectra Physics Inspire HF100 Tuneable OPO"^^xsd:string
dcterms:description "Hands-Free fully-automated fs OPO for gap-free operation at wavelengths from 345-2500 nm"^^xsd:string
skos:notation "E10383"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Hands-Free fully-automated fs OPO for gap-free operation at wavelengths from 345-2500 nm"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10383#secondary_contact
dc:description "Hands-Free fully-automated fs OPO for gap-free operation at wavelengths from 345-2500 nm"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10383#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10384
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "OVD Deposition Lathe & Furnace"^^xsd:string
skos:notation "E10384"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10384#secondary_contact
foaf:page http://www.orc.soton.ac.uk/silicafibrefacilities.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10384#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10387
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Nanolink DPN 5000 System"^^xsd:string
skos:notation "E10387"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10387#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10387#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10388
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "ZeMetrics ZeScope Optical Profiling System"^^xsd:string
skos:notation "E10388"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10388#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/~~
oo:primaryContact http://id.southampton.ac.uk/equipment/E10388#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10390
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Backscatter Reflectometer (obsolete 1718)"^^xsd:string
skos:notation "E10390"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10390#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10390#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10005
 
http://id.southampton.ac.uk/equipment/E10396
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "MM_Wave System"^^xsd:string
skos:notation "E10396"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10396#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10396#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10397
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "MAX-XP Benchtop Ultra Centrifuge"^^xsd:string
skos:notation "E10397"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10397#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10397#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10097
 
http://id.southampton.ac.uk/equipment/E10398
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Nikon Microscope system"^^xsd:string
skos:notation "E10398"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10398#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10398#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10422
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Tunable Laser"^^xsd:string
skos:notation "E10422"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10422#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10422#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10434
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Radio Frequency Test Kit"^^xsd:string
skos:notation "E10434"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10434#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10434#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10435
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Impedance Analyser"^^xsd:string
skos:notation "E10435"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10435#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10435#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10436
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Plasma System"^^xsd:string
skos:notation "E10436"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10436#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10436#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10438
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Gis System For Orion Microscope"^^xsd:string
dcterms:description "Gis System For Orion Microscope"^^xsd:string
skos:notation "E10438"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Gis System For Orion Microscope"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10438#secondary_contact
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
dc:description "Gis System For Orion Microscope"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10438#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10442
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Tube Furnace Pumps"^^xsd:string
skos:notation "E10442"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10442#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10442#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10443
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "4 Tube Furnace"^^xsd:string
skos:notation "E10443"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10443#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10443#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10446
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Quantum Efficiency System"^^xsd:string
skos:notation "E10446"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10446#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10446#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10448
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Quartz System"^^xsd:string
skos:notation "E10448"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10448#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10448#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10449
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Software Expansion Pack For E-Beam"^^xsd:string
skos:notation "E10449"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10449#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/ebeamLithography.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10449#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10450
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Solar Simulator"^^xsd:string
dcterms:description "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m?) depends on the size of the desired output beam, the lamp?s power input and the layout of the simulator?s optic. The spectral characteristics are always the same."^^xsd:string
skos:notation "E10450"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m?) depends on the size of the desired output beam, the lamp?s power input and the layout of the simulator?s optic. The spectral characteristics are always the same."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10450#secondary_contact
dc:description "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m?) depends on the size of the desired output beam, the lamp?s power input and the layout of the simulator?s optic. The spectral characteristics are always the same."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10450#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10451
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "550 Degree Table"^^xsd:string
skos:notation "E10451"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10451#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10451#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10452
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Etching System"^^xsd:string
skos:notation "E10452"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10452#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10452#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10453
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Orion Performance Upgrade Package"^^xsd:string
skos:notation "E10453"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10453#secondary_contact
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10453#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10454
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Orion Variable Accelerating Voltage Package"^^xsd:string
skos:notation "E10454"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10454#secondary_contact
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10454#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10455
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Orion Liquid Nitrogen Cooling Dewar System"^^xsd:string
skos:notation "E10455"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10455#secondary_contact
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10455#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10456
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Gas Cabinet"^^xsd:string
skos:notation "E10456"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10456#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10456#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10458
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Ccd Camera"^^xsd:string
skos:notation "E10458"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10458#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10458#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10459
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Semiconductor Analyser"^^xsd:string
skos:notation "E10459"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10459#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10459#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10460
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "High Vacuum furnace"^^xsd:string
skos:notation "E10460"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10460#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10460#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10007
 
http://id.southampton.ac.uk/equipment/E10464
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Laser Lithography System"^^xsd:string
skos:notation "E10464"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10464#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/ebeamLithography.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10464#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10465
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Cryogenic Probe Station"^^xsd:string
skos:notation "E10465"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10465#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/magnetoResistance.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10465#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10466
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Spin Coater"^^xsd:string
skos:notation "E10466"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10466#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10466#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10467
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Spectrograph"^^xsd:string
skos:notation "E10467"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10467#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10467#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10468
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "2 Sawatec Hotplates"^^xsd:string
skos:notation "E10468"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10468#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10468#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10469
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Vitesse Duo"^^xsd:string
dcterms:description "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."^^xsd:string
skos:notation "E10469"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10469#secondary_contact
dc:description "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10469#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10471
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Dry Bed Absorber System"^^xsd:string
skos:notation "E10471"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10471#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10471#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10472
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Zeiss EVO Scanning Electron Microscope"^^xsd:string
dcterms:description "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."^^xsd:string
skos:notation "E10472"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10472#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
dc:description "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10472#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10473
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Elemental Analysis: O-Orion-Rbs"^^xsd:string
skos:notation "E10473"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10473#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10473#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10474
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Clear View: O-Orion-Clearview"^^xsd:string
skos:notation "E10474"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10474#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10474#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10475
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Gatan X-ray Ultramicroscope (XuM) (accessory for the EVO SEM LS25 microscope)"^^xsd:string
dcterms:description "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."^^xsd:string
skos:notation "E10475"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10475#secondary_contact
dc:description "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10475#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10476
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Monocl3"^^xsd:string
skos:notation "E10476"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10476#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10476#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10477
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Pattern Generator"^^xsd:string
skos:notation "E10477"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10477#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/nanofabrication.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10477#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10478
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Analysers/Generator - 3 Items Each Over #25K"^^xsd:string
skos:notation "E10478"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10478#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10478#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10488
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Biolight 1000"^^xsd:string
skos:notation "E10488"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10488#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10488#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10494
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Nano 38 Sputting Machine Lesker Sputter System"^^xsd:string
skos:notation "E10494"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10494#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10494#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10497
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Anechoic Chamber Project"^^xsd:string
dcterms:description "Supplier Name: Emerson & Cuming Microwave Products"^^xsd:string
skos:notation "E10497"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Supplier Name: Emerson & Cuming Microwave Products"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10497#secondary_contact
dc:description "Supplier Name: Emerson & Cuming Microwave Products"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10497#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10514
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "CamScan CS3200 Scanning Electron Microscope + parts"^^xsd:string
dcterms:description "Scanning electron microscope (LaB6 source; 0-50 keV) equipped for VI-NIR spectroscopic analysis and angle-resolved mapping of electron-induced light emission (cf. cathodoluminescence)"^^xsd:string
skos:notation "E10514"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Scanning electron microscope (LaB6 source; 0-50 keV) equipped for VI-NIR spectroscopic analysis and angle-resolved mapping of electron-induced light emission (cf. cathodoluminescence)"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10514#secondary_contact
dc:description "Scanning electron microscope (LaB6 source; 0-50 keV) equipped for VI-NIR spectroscopic analysis and angle-resolved mapping of electron-induced light emission (cf. cathodoluminescence)"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10514#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10609
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Omicron Twin SNOM System"^^xsd:string
dcterms:description "The TwinSNOM combines conventional microscopy, SNOM, shear-force AFM and optionally even laser scanning confocal microscopy or Needle-Sensor AFM in a single instrument."^^xsd:string
skos:notation "E10609"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The TwinSNOM combines conventional microscopy, SNOM, shear-force AFM and optionally even laser scanning confocal microscopy or Needle-Sensor AFM in a single instrument."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10609#secondary_contact
dc:description "The TwinSNOM combines conventional microscopy, SNOM, shear-force AFM and optionally even laser scanning confocal microscopy or Needle-Sensor AFM in a single instrument."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10609#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10612
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "Cryostat (5k to 600k)"^^xsd:string
skos:notation "E10612"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10612#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10612#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10000
 
http://id.southampton.ac.uk/equipment/E10613
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "EVG501 Semi-Automated Lamination Machine"^^xsd:string
skos:notation "E10613"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:contact http://id.southampton.ac.uk/equipment/E10613#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10613#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10614
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "EVG620 Double Side Mask Aligner"^^xsd:string
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."^^xsd:string
skos:notation "E10614"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10614#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10614#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10615
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "EVG150 Automated Resist Processing System"^^xsd:string
dcterms:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."^^xsd:string
skos:notation "E10615"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10615#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10615#primary_contact
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/equipment/E10617
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdf:type oo:Equipment
rdfs:label "3 Stacis "Quiet Island" Support Systems"^^xsd:string
dcterms:description "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."^^xsd:string
skos:notation "E10617"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
rdfs:comment "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10617#secondary_contact
dc:description "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart