→ rdf:type → http://vocab.deri.ie/rooms#Building, http://id.southampton.ac.uk/ns/UoSBuilding

→ rdfs:label → "New Mountbatten"^^xsd:string

→ geo:lat → "50.93739"^^xsd:float

→ geo:long → "-1.39862"^^xsd:float

→ skos:notation → "53"^^http://id.southampton.ac.uk/ns/building-code-scheme

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/site/1

→ http://id.southampton.ac.uk/ns/disabledGoPage → https://www.accessable.co.uk/university-of-southampton/access-guides/building-53-mountbatten

→ http://id.southampton.ac.uk/ns/electricityTimeSeries → "elec/b53/ekw"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ http://vocab.deri.ie/rooms#occupant → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH, http://id.southampton.ac.uk/org/F7FP060000, http://id.southampton.ac.uk/org/F7EH010000, http://id.southampton.ac.uk/org/F7EH020000, http://id.southampton.ac.uk/org/F7EH040000, http://id.southampton.ac.uk/org/F7FP040000, http://id.southampton.ac.uk/org/F7FP070000

→ http://id.southampton.ac.uk/ns/ombielName → "Bldg 53 (Mountbatten)"^^xsd:string

→ http://id.southampton.ac.uk/ns/buildingDate → "2008"^^xsd:string

→ dcterms:spatial → "POLYGON((-1.39913396019065 50.9372142159638,-1.39907008997395 50.9373032056671,-1.39891522041897 50.937259276929,-1.39890569827696 50.9372705987727,-1.39892932396893 50.9372784674524,-1.39859712697686 50.9377277159088,-1.39838674153732 50.93774396259,-1.3984577982763 50.937687410529,-1.39842294364327 50.9376771643524,-1.39822064304129 50.9376180648148,-1.39809892132029 50.937582514482,-1.39802930188577 50.9375621919069,-1.39799786085083 50.9375543798841,-1.3979582451468 50.9375445865492,-1.39795617902165 50.9375199050719,-1.39795384340191 50.9374888833799,-1.39795249592898 50.9374689004178,-1.39794872300479 50.9374351048503,-1.39794863317326 50.9374339726701,-1.39794486024907 50.9373881759563,-1.39794521957518 50.9373882891745,-1.39807691259583 50.93743340658,-1.39810988076676 50.9374439924643,-1.3983446105505 50.9371126021949,-1.39848726301762 50.9371526816356,-1.39856272150148 50.9370497091047,-1.39867465158588 50.9370818632785,-1.3986993552562 50.9370889960675,-1.39913396019065 50.9372142159638))"^^xsd:string

→ oo:lacksFeature → http://id.southampton.ac.uk/building/53#residential

→ http://id.southampton.ac.uk/ns/buildingArchitect → http://id.southampton.ac.uk/building/53#architect

→ http://id.southampton.ac.uk/ns/buildingFeature → "Clean rooms"^^xsd:string

http://id.southampton.ac.uk/site/1

→ rdf:type → http://id.southampton.ac.uk/ns/UoSSite, http://vocab.deri.ie/rooms#Site, http://www.w3.org/ns/org#Site

→ rdfs:label → "Highfield Campus"^^xsd:string

← is http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within of ← http://id.southampton.ac.uk/building/53, http://id.southampton.ac.uk/point-of-service/sculpture-erica

http://id.southampton.ac.uk/

→ rdf:type → http://purl.org/vocab/aiiso/schema#Institution, http://www.w3.org/ns/org#FormalOrganization, http://www.w3.org/ns/org#Organization, foaf:Organization

→ rdfs:label → "University of Southampton"^^xsd:string

http://id.southampton.ac.uk/org/FP

→ rdf:type → http://www.w3.org/ns/org#Organization

→ rdfs:label → "School of Electronics & Computer Science"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/org/F7

→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization

→ rdfs:label → "Physical Sciences and Engineering"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/org/EH

→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization

→ rdfs:label → "Optoelectronics Research Centre"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/org/F7FP060000

→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization

→ rdfs:label → "Comms, Signal Processing & Control"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/org/F7EH010000

→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization

→ rdfs:label → "ORC Research"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/org/F7EH020000

→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization

→ rdfs:label → "ORC - Enterprise"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/org/F7EH040000

→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization

→ rdfs:label → "Technical Support Staff"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/org/F7FP040000

→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization

→ rdfs:label → "NANO"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/org/F7FP070000

→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization

→ rdfs:label → "Electronic & Software Systems"^^xsd:string

← is http://vocab.deri.ie/rooms#occupant of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/building/53#residential

→ rdf:type → http://id.southampton.ac.uk/ns/PlaceFeature-ResidentialUse

→ rdfs:label → "Building 53 is non-residential"^^xsd:string

← is oo:lacksFeature of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/building/53#architect

→ rdfs:label → "Jestico + Whiles"^^xsd:string

← is http://id.southampton.ac.uk/ns/buildingArchitect of ← http://id.southampton.ac.uk/building/53

http://id.southampton.ac.uk/equipment/E10235

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Caliber Spm System"^^xsd:string

→ dcterms:description → "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."^^xsd:string

→ skos:notation → "E10235"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10235-200778-P1010259.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10235-200778-P1010261.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10235#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/lithography.php

→ dc:description → "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10235#primary_contact

http://id.southampton.ac.uk/equipment/E10235#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "DE GROOT, CORNELIS"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10235

http://id.southampton.ac.uk/facility/F10014

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Facility

→ rdfs:label → "Clean Rooms - Nanofabrication"^^xsd:string

→ dcterms:description → "The Southampton Nanofabrication Centre is a state-of-the-art facility for microfabrication and high-spec nanofabrication, as well as a wide range of characterisation capabilities housed in the new Mountbatten Complex at the University of Southampton. One of the premiere cleanrooms in Europe, the Centre has a uniquely broad range of technologies, combining traditional and novel top down fabrication with state-of-the-art bottom up fabrication. This allows us to develop and produce a wide range of devices in diverse fields such as electronics, nanotechnology and bionanotechnology and incorporate them into an equally comprehensive array of nano and microsystems for analysis and use. The characterisation capability is similarly extensive catalogue of microscopes and test gear, from nanometre resolution scanning microscopes to electrical, magnetic and RF analysis. A detailed equiment list can be found at http://www.southampton-nanofab.com/machineDatabase/"^^xsd:string

→ skos:notation → "F10014"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The Southampton Nanofabrication Centre is a state-of-the-art facility for microfabrication and high-spec nanofabrication, as well as a wide range of characterisation capabilities housed in the new Mountbatten Complex at the University of Southampton. One of the premiere cleanrooms in Europe, the Centre has a uniquely broad range of technologies, combining traditional and novel top down fabrication with state-of-the-art bottom up fabrication. This allows us to develop and produce a wide range of devices in diverse fields such as electronics, nanotechnology and bionanotechnology and incorporate them into an equally comprehensive array of nano and microsystems for analysis and use. The characterisation capability is similarly extensive catalogue of microscopes and test gear, from nanometre resolution scanning microscopes to electrical, magnetic and RF analysis. A detailed equiment list can be found at http://www.southampton-nanofab.com/machineDatabase/"^^xsd:string

→ dc:description → "The Southampton Nanofabrication Centre is a state-of-the-art facility for microfabrication and high-spec nanofabrication, as well as a wide range of characterisation capabilities housed in the new Mountbatten Complex at the University of Southampton. One of the premiere cleanrooms in Europe, the Centre has a uniquely broad range of technologies, combining traditional and novel top down fabrication with state-of-the-art bottom up fabrication. This allows us to develop and produce a wide range of devices in diverse fields such as electronics, nanotechnology and bionanotechnology and incorporate them into an equally comprehensive array of nano and microsystems for analysis and use. The characterisation capability is similarly extensive catalogue of microscopes and test gear, from nanometre resolution scanning microscopes to electrical, magnetic and RF analysis. A detailed equiment list can be found at http://www.southampton-nanofab.com/machineDatabase/"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/facility/F10014#primary_contact

→ http://id.southampton.ac.uk/ns/facilityIsRCUKCosted → "true"^^xsd:boolean

http://id.southampton.ac.uk/facility/F10014#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380599045

→ foaf:name → "ANTENEY, IAIN"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/facility/F10014

http://id.southampton.ac.uk/equipment/E10238

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Cryoview 2000-Low Temperature"^^xsd:string

→ dcterms:description → "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."^^xsd:string

→ skos:notation → "E10238"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10238-200633-P1010268.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10238#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/lithography.php

→ dc:description → "The Nanonics CryoView 2000 is the state-of-the-art low temperature scanning probe microscopy and device characterisation system. To expand its characterisation and analytical capability, the CryoView is integrated to the inVia Raman spectrometer."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10238#primary_contact

http://id.southampton.ac.uk/equipment/E10238#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "CHONG, HAROLD"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10238

http://id.southampton.ac.uk/equipment/E10239

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Opt System 100 Oxide Etcher"^^xsd:string

→ dcterms:description → "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor Substrate electrode: 170 or 240 mm Shower head gas inlet optimised for RIE High conductance vacuum layout Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string

→ skos:notation → "E10239"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor Substrate electrode: 170 or 240 mm Shower head gas inlet optimised for RIE High conductance vacuum layout Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10239-200641-P1000882.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10239#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/dryEtch.php

→ dc:description → "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor Substrate electrode: 170 or 240 mm Shower head gas inlet optimised for RIE High conductance vacuum layout Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10239#primary_contact

http://id.southampton.ac.uk/equipment/E10239#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10239

http://id.southampton.ac.uk/equipment/E10240

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Opt System 100 Metal Etcher"^^xsd:string

→ dcterms:description → "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string

→ skos:notation → "E10240"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10240-200640-P1000881.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10240#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/dryEtch.php

→ dc:description → "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10240#primary_contact

http://id.southampton.ac.uk/equipment/E10240#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10240

http://id.southampton.ac.uk/equipment/E10241

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Plasmalab 80 Plus Rie Etcher"^^xsd:string

→ dcterms:description → "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string

→ skos:notation → "E10241"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10241#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/dryEtch.php

→ dc:description → "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10241#primary_contact

http://id.southampton.ac.uk/equipment/E10241#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10241

http://id.southampton.ac.uk/equipment/E10243

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Ionfab 300 Plus"^^xsd:string

→ dcterms:description → "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string

→ skos:notation → "E10243"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10243-200638-P1000883.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10243#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/lithography.php

→ dc:description → "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10243#primary_contact

http://id.southampton.ac.uk/equipment/E10243#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10243

http://id.southampton.ac.uk/equipment/E10244

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "EVG620 Top Side Mask Aligner"^^xsd:string

→ dcterms:description → "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm. Exposure can be performed in hard, soft and proximity modes."^^xsd:string

→ skos:notation → "E10244"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm. Exposure can be performed in hard, soft and proximity modes."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10244-200660-P1000830.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10244#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/lithography.php

→ dc:description → "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm. Exposure can be performed in hard, soft and proximity modes."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10244#primary_contact

http://id.southampton.ac.uk/equipment/E10244#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10244

http://id.southampton.ac.uk/equipment/E10245

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "EVG620 Double Side Mask Aligner"^^xsd:string

→ dcterms:description → "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string

→ skos:notation → "E10245"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10245#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/lithography.php

→ dc:description → "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10245#primary_contact

http://id.southampton.ac.uk/equipment/E10245#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10245

http://id.southampton.ac.uk/equipment/E10246

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Evg620 Double Side Mask Aligner"^^xsd:string

→ skos:notation → "E10246"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10246-200526-P1000829.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10246#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/lithography.php

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10246#primary_contact

http://id.southampton.ac.uk/equipment/E10246#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10246

http://id.southampton.ac.uk/equipment/E10248

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Zetasizer Nano-Xs"^^xsd:string

→ dcterms:description → "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."^^xsd:string

→ skos:notation → "E10248"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10248-200771-P1000846.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10248#secondary_contact

→ dc:description → "Dynamic light scattering system for the determination of the size and zeta potential of suspended nanoparticles in solution."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10248#primary_contact

http://id.southampton.ac.uk/equipment/E10248#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10248

http://id.southampton.ac.uk/equipment/E10249

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Nvision 40 Fib"^^xsd:string

→ dcterms:description → "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string

→ skos:notation → "E10249"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10249-200622-P1000853.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10249#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/fib.php

→ dc:description → "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10249#primary_contact

http://id.southampton.ac.uk/equipment/E10249#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10249

http://id.southampton.ac.uk/equipment/E10250

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Nanofab 1000 Agile"^^xsd:string

→ dcterms:description → "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires. CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size. Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require germane for growth. SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows. All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"^^xsd:string

→ skos:notation → "E10250"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires. CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size. Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require germane for growth. SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows. All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10250-200639-P1000873.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10250-200639-P1010240.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10250#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/pecvd.php

→ dc:description → "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of carbon nanotubes (CNTs) and Si, SiGe and Ge nanowires. CNT growth temperatures are typically between 600 and 800C. Aligned growth of CNTs can be achieved with a growth rate up to 40 nm/min and random growth can be achieved with growth rates up to hundreds of nm/min. CNT diameters are typically less than 100nm, but depend on catalyst particle size. Silicon nanowires typically require silane for growth at temperatures of 330 - 650C, and vertical growth rates up to 150nm/min can be achieved. Germanium nanowires typically require germane for growth. SiGe nanowires can be grown by mixing silane and germane Heterojunctions can be created in the SiGe nanowires by appropriate control of the flows. All nanowires can be doped p or n type with the addition of diborane or phosphine to a process"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10250#primary_contact

http://id.southampton.ac.uk/equipment/E10250#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10250

http://id.southampton.ac.uk/facility/F10009

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Facility

→ rdfs:label → "Clean Rooms - FHD"^^xsd:string

→ dcterms:description → "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."^^xsd:string

→ skos:notation → "F10009"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."^^xsd:string

→ dc:description → "The ORC at Southampton has a state-of-the-art Flame Hydrolysis Deposition tool for growth of silica-on-silicon waveguide structures. The system allows the incorporation of germanium, phosphorous and boron doping within the silica, and is particularly optimised for high photosensitivity layer growth. The tool can grow films ranging from 2 microns to 20 microns in thickness."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/facility/F10009#primary_contact

→ http://id.southampton.ac.uk/ns/facilityIsRCUKCosted → "true"^^xsd:boolean

http://id.southampton.ac.uk/facility/F10009#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380592809

→ foaf:name → "SMITH, PETER"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/facility/F10009

http://id.southampton.ac.uk/equipment/E10251

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Atomic layer deposition system"^^xsd:string

→ dcterms:description → "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer. Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3. ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string

→ skos:notation → "E10251"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer. Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3. ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10251-200637-P1000872.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10251#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/ald.php

→ dc:description → "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer. Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3. ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10251#primary_contact

http://id.southampton.ac.uk/equipment/E10251#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10251

http://id.southampton.ac.uk/equipment/E10253

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Opt System 100 Pecvd"^^xsd:string

→ dcterms:description → "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers. The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed. Amorphous silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa. Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min. Microcrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min. Amorphous and polycrystalline germanium use GeH4 as a source of Ge and CF4 & O2 for cleaning."^^xsd:string

→ skos:notation → "E10253"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers. The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed. Amorphous silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa. Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min. Microcrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min. Amorphous and polycrystalline germanium use GeH4 as a source of Ge and CF4 & O2 for cleaning."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10253-200642-P1000871.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10253#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php

→ dc:description → "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers. The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed. Amorphous silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa. Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min. Microcrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min. Amorphous and polycrystalline germanium use GeH4 as a source of Ge and CF4 & O2 for cleaning."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10253#primary_contact

http://id.southampton.ac.uk/equipment/E10253#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10253

http://id.southampton.ac.uk/equipment/E10258

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "He Ion Microscope: Orion-Bu"^^xsd:string

→ dcterms:description → "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string

→ skos:notation → "E10258"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10258#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php

→ dc:description → "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10258#primary_contact

http://id.southampton.ac.uk/equipment/E10258#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10258

http://id.southampton.ac.uk/equipment/E10260

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Helios Sputtering System Type Xl 6""^^xsd:string

→ dcterms:description → "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string

→ skos:notation → "E10260"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10260-200629-P1010244.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10260-200629-P1010245.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10260#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php

→ dc:description → "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10260#primary_contact

http://id.southampton.ac.uk/equipment/E10260#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10260

http://id.southampton.ac.uk/equipment/E10261

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Field Emmission Scanning Electron Microscope (FEG-SEM)"^^xsd:string

→ dcterms:description → "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string

→ skos:notation → "E10261"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10261-200628-P1010270.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10261#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/sem.php

→ dc:description → "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10261#primary_contact

http://id.southampton.ac.uk/equipment/E10261#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10261

http://id.southampton.ac.uk/equipment/E10263

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Evaporator Gun"^^xsd:string

→ dcterms:description → " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string

→ skos:notation → "E10263"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10263#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php

→ dc:description → " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10263#primary_contact

http://id.southampton.ac.uk/equipment/E10263#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10263

http://id.southampton.ac.uk/equipment/E10264

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Imoxs Sem"^^xsd:string

→ dcterms:description → "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string

→ skos:notation → "E10264"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10264#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/sem.php

→ dc:description → "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10264#primary_contact

http://id.southampton.ac.uk/equipment/E10264#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10264

http://id.southampton.ac.uk/equipment/E10265

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Fluoresence System"^^xsd:string

→ dcterms:description → "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string

→ skos:notation → "E10265"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10265-200781-P1010272.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10265#secondary_contact

→ dc:description → "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10265#primary_contact

http://id.southampton.ac.uk/equipment/E10265#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10265

http://id.southampton.ac.uk/equipment/E10267

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Auto 306 Resistance Evaporation System"^^xsd:string

→ dcterms:description → "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string

→ skos:notation → "E10267"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10267#secondary_contact

→ dc:description → "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10267#primary_contact

http://id.southampton.ac.uk/equipment/E10267#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10267

http://id.southampton.ac.uk/equipment/E10268

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Optiwet St30"^^xsd:string

→ dcterms:description → "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string

→ skos:notation → "E10268"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10268-200649-P1000831.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10268#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php

→ dc:description → "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10268#primary_contact

http://id.southampton.ac.uk/equipment/E10268#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10268

http://id.southampton.ac.uk/equipment/E10272

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Nikon L200D microscope"^^xsd:string

→ dcterms:description → "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string

→ skos:notation → "E10272"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10272-200636-P1000825.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10272#secondary_contact

→ dc:description → "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10272#primary_contact

http://id.southampton.ac.uk/equipment/E10272#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10272

http://id.southampton.ac.uk/equipment/E10273

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Nikon LV100D Bioelectronics microscope"^^xsd:string

→ dcterms:description → "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string

→ skos:notation → "E10273"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10273-200635-P1010293.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10273-200635-P1010294.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10273#secondary_contact

→ dc:description → "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10273#primary_contact

http://id.southampton.ac.uk/equipment/E10273#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10273

http://id.southampton.ac.uk/equipment/E10274

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "DC Device Multi Probe Station"^^xsd:string

→ dcterms:description → "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string

→ skos:notation → "E10274"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10274#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php

→ dc:description → "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10274#primary_contact

http://id.southampton.ac.uk/equipment/E10274#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10274

http://id.southampton.ac.uk/equipment/E10275

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Summit 12000B-Ap Probe Station Platform"^^xsd:string

→ dcterms:description → "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string

→ skos:notation → "E10275"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10275#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php

→ dc:description → "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10275#primary_contact

http://id.southampton.ac.uk/equipment/E10275#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "DE GROOT, CORNELIS"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10275

http://id.southampton.ac.uk/equipment/E10276

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Theta probe PARXPS system"^^xsd:string

→ dcterms:description → "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string

→ skos:notation → "E10276"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10276#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php

→ dc:description → "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10276#primary_contact

http://id.southampton.ac.uk/equipment/E10276#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10276

http://id.southampton.ac.uk/equipment/E10277

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Polytec MSA-400 Micro System Analyzer"^^xsd:string

→ dcterms:description → "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string

→ skos:notation → "E10277"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10277#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/memsTester.php

→ dc:description → "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10277#primary_contact

http://id.southampton.ac.uk/equipment/E10277#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "CHONG, HAROLD"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10277

http://id.southampton.ac.uk/equipment/E10278

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "12 Tesla Cryogen Free Magnet System (Q6003A)"^^xsd:string

→ dcterms:description → "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"^^xsd:string

→ skos:notation → "E10278"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10278#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/

→ dc:description → "12 Tesla cryogen-free magnet system with 25mm integrated VTI pulse tube cooler, 1.6K - 325k sample space of 25mm diameter, cooldown <24 hours, 300 degree sample rotation"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10278#primary_contact

http://id.southampton.ac.uk/equipment/E10278#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10278

http://id.southampton.ac.uk/equipment/E10279

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Cascade Microtech M150 Mulitpurpose Probing System"^^xsd:string

→ dcterms:description → "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string

→ skos:notation → "E10279"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10279#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php

→ dc:description → "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10279#primary_contact

http://id.southampton.ac.uk/equipment/E10279#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "DE GROOT, CORNELIS"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10279

http://id.southampton.ac.uk/equipment/E10280

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "ENA Series Network Analyzer"^^xsd:string

→ dcterms:description → "10MHz-67GHz. For use with Cascade probe station."^^xsd:string

→ skos:notation → "E10280"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "10MHz-67GHz. For use with Cascade probe station."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10280-200920-P1010316.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10280#secondary_contact

→ dc:description → "10MHz-67GHz. For use with Cascade probe station."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10280#primary_contact

http://id.southampton.ac.uk/equipment/E10280#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380593085

→ foaf:name → "FEDOTOV, VASSILI"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10280

http://id.southampton.ac.uk/equipment/E10282

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Jetfirst 200 Rta / Jetfirst 200 Rta No Pump"^^xsd:string

→ dcterms:description → "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string

→ skos:notation → "E10282"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10282-200655-P1000893.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10282#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/anneal.php

→ dc:description → "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10282#primary_contact

http://id.southampton.ac.uk/equipment/E10282#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10282

http://id.southampton.ac.uk/equipment/E10283

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Benchtop Furnace"^^xsd:string

→ dcterms:description → "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string

→ skos:notation → "E10283"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10283-200762-P1000823.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10283#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/anneal.php

→ dc:description → "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10283#primary_contact

http://id.southampton.ac.uk/equipment/E10283#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10283

http://id.southampton.ac.uk/equipment/E10284

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Tempress Clean Furnace Stack"^^xsd:string

→ dcterms:description → "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string

→ skos:notation → "E10284"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10284#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/anneal.php

→ dc:description → "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10284#primary_contact

http://id.southampton.ac.uk/equipment/E10284#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "ANTENEY, IAIN"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10284

http://id.southampton.ac.uk/equipment/E10287

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "5430 Fine Wire Bonder SN 30280"^^xsd:string

→ dcterms:description → "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string

→ skos:notation → "E10287"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10287-200857-P1000869.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10287#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/lithography.php

→ dc:description → "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10287#primary_contact

http://id.southampton.ac.uk/equipment/E10287#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10287

http://id.southampton.ac.uk/equipment/E10288

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Precision Scriber"^^xsd:string

→ dcterms:description → "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."^^xsd:string

→ skos:notation → "E10288"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10288#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php

→ dc:description → "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10288#primary_contact

http://id.southampton.ac.uk/equipment/E10288#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380599615

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10288

http://id.southampton.ac.uk/equipment/E10289

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Vanadium Fibre Laser"^^xsd:string

→ dcterms:description → "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string

→ skos:notation → "E10289"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10289-200844-P1000874.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10289#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php

→ dc:description → "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10289#primary_contact

http://id.southampton.ac.uk/equipment/E10289#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10289

http://id.southampton.ac.uk/equipment/E10290

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Woollam Md2000D Ellipsometer"^^xsd:string

→ dcterms:description → "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string

→ skos:notation → "E10290"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10290-200631-P1000842.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10290#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/ellipsometry.php

→ dc:description → "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10290#primary_contact

http://id.southampton.ac.uk/equipment/E10290#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10290

http://id.southampton.ac.uk/equipment/E10291

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Long Scan Profilers"^^xsd:string

→ dcterms:description → "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string

→ skos:notation → "E10291"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10291-200838-P1000843.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10291-200838-P1010305.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10291#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/

→ dc:description → "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10291#primary_contact

http://id.southampton.ac.uk/equipment/E10291#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10291

http://id.southampton.ac.uk/equipment/E10292

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Ambios Xp100 Stylus Surface Profiler"^^xsd:string

→ dcterms:description → "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."^^xsd:string

→ skos:notation → "E10292"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10292-200632-P1000847.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10292#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/

→ dc:description → "Vertical range to 400um, zoom optics 88-247x, 5um stylus, 10mm max scan length, manual X-Y stage."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10292#primary_contact

http://id.southampton.ac.uk/equipment/E10292#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10292

http://id.southampton.ac.uk/equipment/E10293

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Measurement system"^^xsd:string

→ dcterms:description → "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."^^xsd:string

→ skos:notation → "E10293"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10293-200901-P1010242.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10293#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/characterisation/

→ dc:description → "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10293#primary_contact

http://id.southampton.ac.uk/equipment/E10293#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10293

http://id.southampton.ac.uk/equipment/E10297

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "All band tunable laser, 1440nm to 1640nm"^^xsd:string

→ dcterms:description → "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range. ¿Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
¿Variable sweep speed up to 80nm/s[nl]
¿Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
¿Built-in high performance 60dB attenuator[nl]
¿Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm"^^xsd:string

→ skos:notation → "E10297"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range. ¿Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
¿Variable sweep speed up to 80nm/s[nl]
¿Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
¿Built-in high performance 60dB attenuator[nl]
¿Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10297#secondary_contact

→ foaf:page → http://www.home.agilent.com/agilent/product.jspx?nid=-536900355.536883260.00&cc=GB&lc=eng

→ dc:description → "Enable precise characterization of advanced optical components. Signal output with low spontaneous emission (SSE) permits measurement of filters with highest dynamic range. ¿Highest measurement range through low spontaneous source emission (low SSE), Signal to SSE Ratio >70 dB/nm[nl]
¿Variable sweep speed up to 80nm/s[nl]
¿Wide tuning range units cover all transmission bands: 1260nm-1640nm[nl]
¿Built-in high performance 60dB attenuator[nl]
¿Built-in wavemeter with excellent wavelength-accuracy +/-3.6pm"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10297#primary_contact

http://id.southampton.ac.uk/equipment/E10297#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380597811

→ foaf:name → "GANAPATHY, SENTHIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10297

http://id.southampton.ac.uk/equipment/E10298

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "CW Tunable Laser System, comprising verdi- V6 WTR Riser Chiller etc"^^xsd:string

→ skos:notation → "E10298"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10298#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10298#primary_contact

http://id.southampton.ac.uk/equipment/E10298#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380597811

→ foaf:name → "GANAPATHY, SENTHIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10298

http://id.southampton.ac.uk/equipment/E10299

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Optical Spectrum Analyser (AQ6315A)"^^xsd:string

→ dcterms:description → "¿Optical fiber loss wavelength characteristics.[nl]
¿Optical filter loss evaluation.[nl]
¿Fiber grating characteristics evaluation.[nl]
¿Color analysis.[nl]
¿Parameter evaluation for LED, FP-LD and FB-LD.[nl]
¿WDM device characteristics.[nl]
¿evaluation."^^xsd:string

→ skos:notation → "E10299"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "¿Optical fiber loss wavelength characteristics.[nl]
¿Optical filter loss evaluation.[nl]
¿Fiber grating characteristics evaluation.[nl]
¿Color analysis.[nl]
¿Parameter evaluation for LED, FP-LD and FB-LD.[nl]
¿WDM device characteristics.[nl]
¿evaluation."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10299#secondary_contact

→ dc:description → "¿Optical fiber loss wavelength characteristics.[nl]
¿Optical filter loss evaluation.[nl]
¿Fiber grating characteristics evaluation.[nl]
¿Color analysis.[nl]
¿Parameter evaluation for LED, FP-LD and FB-LD.[nl]
¿WDM device characteristics.[nl]
¿evaluation."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10299#primary_contact

http://id.southampton.ac.uk/equipment/E10299#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SAHU, JAYANTA"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10299

http://id.southampton.ac.uk/facility/F10005

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Facility

→ rdfs:label → "Clean Rooms - Silica"^^xsd:string

→ dcterms:description → "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."^^xsd:string

→ skos:notation → "F10005"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."^^xsd:string

→ dc:description → "The Silica Fibre facilities occupy over 160 sq.m of class 10,000 cleanroom space and comprise state-of-the-art fabrication equipment. This includes modified chemical vapour deposition (MCVD) lathes, a glassworking lathe, a 6 metre high dual-sided fibre drawing tower, and dedicated chemical preparation areas for glass etching and machining. The facility is capable of producing standard preforms and optical fibre to a high quality as well as retaining the versatility to fabricate the huge variety of speciality fibres, including microstructured fibres required for research."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/facility/F10005#primary_contact

→ http://id.southampton.ac.uk/ns/facilityIsRCUKCosted → "true"^^xsd:boolean

http://id.southampton.ac.uk/facility/F10005#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380593162

→ foaf:name → "SAHU, JAYANTA"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/facility/F10005

http://id.southampton.ac.uk/equipment/E10300

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Optical Spectrum Analyser (AQ6370)"^^xsd:string

→ dcterms:description → "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components. - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string

→ skos:notation → "E10300"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components. - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10300#secondary_contact

→ dc:description → "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components. - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10300#primary_contact

http://id.southampton.ac.uk/equipment/E10300#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "GANAPATHY, SENTHIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10300

http://id.southampton.ac.uk/equipment/E10304

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Auto 306 Resistance Evaporation System"^^xsd:string

→ dcterms:description → "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."^^xsd:string

→ skos:notation → "E10304"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10304-200460-P1010202.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10304#secondary_contact

→ foaf:page → http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php

→ dc:description → "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10304#primary_contact

http://id.southampton.ac.uk/equipment/E10304#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10304

http://id.southampton.ac.uk/equipment/E10305

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Auto 500 Electron Beam Deposition System"^^xsd:string

→ dcterms:description → "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"^^xsd:string

→ skos:notation → "E10305"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10305-200461-P1000632.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10305#secondary_contact

→ dc:description → "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10305#primary_contact

http://id.southampton.ac.uk/equipment/E10305#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10305

http://id.southampton.ac.uk/facility/F10010

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Facility

→ rdfs:label → "Clean Rooms - Integrated Photonics"^^xsd:string

→ dcterms:description → "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."^^xsd:string

→ skos:notation → "F10010"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."^^xsd:string

→ dc:description → "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/facility/F10010#primary_contact

→ http://id.southampton.ac.uk/ns/facilityIsRCUKCosted → "true"^^xsd:boolean

http://id.southampton.ac.uk/facility/F10010#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380592960

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/facility/F10010

http://id.southampton.ac.uk/equipment/E10306

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Optical Spectrum Analyser (AQ6370)"^^xsd:string

→ skos:notation → "E10306"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10306#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10306#primary_contact

http://id.southampton.ac.uk/equipment/E10306#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SAHU, JAYANTA"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10306

http://id.southampton.ac.uk/equipment/E10307

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Optical Spectrum Analyser (AQ6370)"^^xsd:string

→ skos:notation → "E10307"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10307#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10307#primary_contact

http://id.southampton.ac.uk/equipment/E10307#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10307

http://id.southampton.ac.uk/equipment/E10308

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Optical Spectrum Analyser (AQ6370)"^^xsd:string

→ skos:notation → "E10308"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10308#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10308#primary_contact

http://id.southampton.ac.uk/equipment/E10308#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "BRAMBILLA, GILBERTO"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10308

http://id.southampton.ac.uk/equipment/E10314

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Platinum Liner & Buffer Plate"^^xsd:string

→ skos:notation → "E10314"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10314#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10314#primary_contact

http://id.southampton.ac.uk/equipment/E10314#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "POLETTI, FRANCESCO"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10314

http://id.southampton.ac.uk/equipment/E10315

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Glove Box 1: 2-Port Box / Glove Box 2: 4-Port Box"^^xsd:string

→ skos:notation → "E10315"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10315-200471-P1000701.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10315-200471-P1000703.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10315#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10315#primary_contact

http://id.southampton.ac.uk/equipment/E10315#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10315

http://id.southampton.ac.uk/facility/F10007

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Facility

→ rdfs:label → "Clean Rooms - Novel Glass"^^xsd:string

→ dcterms:description → "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."^^xsd:string

→ skos:notation → "F10007"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."^^xsd:string

→ dc:description → "Our Novel glass facilties offer a wide range of specialized glass making and fibre drawing equipment including: a variety of horizontal and vertical tube furnaces, chamber furnaces, high and low temperature ovens, vacuum processing, L-shaped glove box system for batching, melting, annealing and casting of glass under dry nitrogen atmosphere (10ppm), testometric extrusion equipment, hydraulic extrusion equipment, thermogravimetric and thermomechanical analyzers."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/facility/F10007#primary_contact

→ http://id.southampton.ac.uk/ns/facilityIsRCUKCosted → "true"^^xsd:boolean

http://id.southampton.ac.uk/facility/F10007#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380593164

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/facility/F10007

http://id.southampton.ac.uk/equipment/E10316

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "600C Environmental Oven"^^xsd:string

→ skos:notation → "E10316"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10316-200472-P1000622.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10316#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10316#primary_contact

http://id.southampton.ac.uk/equipment/E10316#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10316

http://id.southampton.ac.uk/equipment/E10319

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "P-16+ Stylus Surface Profiler"^^xsd:string

→ dcterms:description → "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"^^xsd:string

→ skos:notation → "E10319"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10319-200476-P1000636.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10319#secondary_contact

→ dc:description → "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10319#primary_contact

http://id.southampton.ac.uk/equipment/E10319#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10319

http://id.southampton.ac.uk/equipment/E10320

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "KLA Tencor Alpha Step IQ Stylus Profier"^^xsd:string

→ dcterms:description → "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."^^xsd:string

→ skos:notation → "E10320"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10320-200477-P1000646.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10320#secondary_contact

→ dc:description → "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10320#primary_contact

http://id.southampton.ac.uk/equipment/E10320#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10320

http://id.southampton.ac.uk/equipment/E10321

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "MRF High Temperature Vacuum Furnace"^^xsd:string

→ dcterms:description → "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."^^xsd:string

→ skos:notation → "E10321"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10321#secondary_contact

→ dc:description → "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10321#primary_contact

http://id.southampton.ac.uk/equipment/E10321#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10321

http://id.southampton.ac.uk/equipment/E10322

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Plasmalab 80 Plus / Compact Modular Plasma System"^^xsd:string

→ dcterms:description → "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."^^xsd:string

→ skos:notation → "E10322"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10322-200479-P1000628.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10322#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/integratedcleanroom.html

→ dc:description → "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10322#primary_contact

http://id.southampton.ac.uk/equipment/E10322#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "LESSEY, MARK"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10322

http://id.southampton.ac.uk/equipment/E10323

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Plasmalab System 400 / Magnetron Sputtering System"^^xsd:string

→ dcterms:description → "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."^^xsd:string

→ skos:notation → "E10323"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10323-200480-P1000624.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10323-200480-P1000625.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10323#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/integratedcleanroom.html

→ dc:description → "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10323#primary_contact

http://id.southampton.ac.uk/equipment/E10323#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10323

http://id.southampton.ac.uk/equipment/E10329

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "MA6 Mask Aligner"^^xsd:string

→ dcterms:description → "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"^^xsd:string

→ skos:notation → "E10329"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10329-200488-P1000637.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10329-200488-P1000639.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10329#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/integratedcleanroom.html

→ dc:description → "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10329#primary_contact

http://id.southampton.ac.uk/equipment/E10329#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10329

http://id.southampton.ac.uk/equipment/E10330

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Modified Material Testing Machine (M500-100CT)"^^xsd:string

→ dcterms:description → "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string

→ skos:notation → "E10330"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10330#secondary_contact

→ dc:description → "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10330#primary_contact

http://id.southampton.ac.uk/equipment/E10330#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "RICHARDSON, DAVID"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10330

http://id.southampton.ac.uk/equipment/E10331

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Fibre Tapering & Bundling System (obsolete 1718)"^^xsd:string

→ dcterms:description → "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."^^xsd:string

→ skos:notation → "E10331"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10331#secondary_contact

→ dc:description → "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10331#primary_contact

http://id.southampton.ac.uk/equipment/E10331#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "BRAMBILLA, GILBERTO"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10331

http://id.southampton.ac.uk/equipment/E10332

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Ionfab 300 Plus / Load Locked Ion Beam Etch System"^^xsd:string

→ dcterms:description → "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"^^xsd:string

→ skos:notation → "E10332"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10332-200545-P1000626.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10332#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/integratedcleanroom.html

→ dc:description → "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10332#primary_contact

http://id.southampton.ac.uk/equipment/E10332#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10332

http://id.southampton.ac.uk/equipment/E10333

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Evo 50 HV SEM"^^xsd:string

→ dcterms:description → " The EVO®50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP® or EP, the EVO®50 series is able to image to perfection."^^xsd:string

→ skos:notation → "E10333"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → " The EVO®50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP® or EP, the EVO®50 series is able to image to perfection."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10333-200548-P1000614.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10333#secondary_contact

→ dc:description → " The EVO®50 series provides quality results from a versatile analytical microscope with a very large specimen chamber. Whether the specimen requires imaging in high vacuum, XVP® or EP, the EVO®50 series is able to image to perfection."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10333#primary_contact

http://id.southampton.ac.uk/equipment/E10333#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10333

http://id.southampton.ac.uk/facility/F10012

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Facility

→ rdfs:label → "Scanning Electron Microscope (SEM)"^^xsd:string

→ dcterms:description → "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."^^xsd:string

→ skos:notation → "F10012"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."^^xsd:string

→ dc:description → "The ORC SEM Facility comprises of a Zeiss Evo50 SEM fitted with an Oxford Instruments INCA 250 x-ray analysis system. In addition to dedicated Gold and Carbon deposition equipment, the SEM features variable pressure operation allowing analysis of both conductive and non-conductive sample. The INCA 250 x-ray analysis system provides elemental analysis capabilities."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/facility/F10012#primary_contact

→ http://id.southampton.ac.uk/ns/facilityIsRCUKCosted → "true"^^xsd:boolean

http://id.southampton.ac.uk/facility/F10012#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380592960

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/facility/F10012

http://id.southampton.ac.uk/equipment/E10335

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Soft Glass Fiber Drawing Tower"^^xsd:string

→ skos:notation → "E10335"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10335-200567-P1000711.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10335#secondary_contact

→ foaf:page → http://www.cimp.soton.ac.uk/silica.html

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10335#primary_contact

http://id.southampton.ac.uk/equipment/E10335#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10335

http://id.southampton.ac.uk/equipment/E10336

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Dual Sided Drawing Tower"^^xsd:string

→ dcterms:description → " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"^^xsd:string

→ skos:notation → "E10336"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10336-200671-P1010151.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10336-200671-P1010152.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10336#secondary_contact

→ foaf:page → http://www.cimp.soton.ac.uk/silica.html

→ dc:description → " 6 metre high dual-sided fibre drawing tower which is suitable for a range of silica-based optical fibres. Preforms up to 60 mm in diameter can be drawn into fibre utilising a unique furnace design. The drawing tower is also designed to accommodate the fabrication and coating of large diameter fibres, up to 1 mm in diameter, as well as ribbon geometries, and forms part of our research into high power (kW) fibre lasers"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10336#primary_contact

http://id.southampton.ac.uk/equipment/E10336#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SAHU, JAYANTA"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10336

http://id.southampton.ac.uk/equipment/E10348

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Planar Air Bearing System"^^xsd:string

→ dcterms:description → "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."^^xsd:string

→ skos:notation → "E10348"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."^^xsd:string

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10348-200678-DSC_0104.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10348#secondary_contact

→ dc:description → "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10348#primary_contact

http://id.southampton.ac.uk/equipment/E10348#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "GATES, JAMES"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10348

http://id.southampton.ac.uk/equipment/E10350

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Laser Guages For Tower"^^xsd:string

→ skos:notation → "E10350"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10350#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10350#primary_contact

http://id.southampton.ac.uk/equipment/E10350#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10350

http://id.southampton.ac.uk/equipment/E10351

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Soft Glass Drawing Tower"^^xsd:string

→ skos:notation → "E10351"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10351-200676-P1000712.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10351#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/novelglasscleanrooms.html

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10351#primary_contact

http://id.southampton.ac.uk/equipment/E10351#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10351

http://id.southampton.ac.uk/equipment/E10352

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Special Furnace System"^^xsd:string

→ skos:notation → "E10352"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10352#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/novelglasscleanrooms.html

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10352#primary_contact

http://id.southampton.ac.uk/equipment/E10352#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10352

http://id.southampton.ac.uk/equipment/E10353

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Quartz Tube Washer - Model 6600"^^xsd:string

→ skos:notation → "E10353"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10353-200681-P1000698.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10353#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/novelglasscleanrooms.html

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10353#primary_contact

http://id.southampton.ac.uk/equipment/E10353#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10353

http://id.southampton.ac.uk/equipment/E10355

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Glassworking Lathe"^^xsd:string

→ skos:notation → "E10355"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10355-200686-P1000705.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10355#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/novelglasscleanrooms.html

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10355#primary_contact

http://id.southampton.ac.uk/equipment/E10355#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10355

http://id.southampton.ac.uk/equipment/E10359

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Pressurization system"^^xsd:string

→ skos:notation → "E10359"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10359-200885-P1010175.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10359#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10359#primary_contact

http://id.southampton.ac.uk/equipment/E10359#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "PETROVICH, MARCO"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10359

http://id.southampton.ac.uk/equipment/E10362

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "MJB4 Mask Aligner"^^xsd:string

→ skos:notation → "E10362"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10362-200571-P1000643.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10362#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10362#primary_contact

http://id.southampton.ac.uk/equipment/E10362#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10362

http://id.southampton.ac.uk/equipment/E10363

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Elevator Hearth Furnace (EHF 1818)"^^xsd:string

→ skos:notation → "E10363"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10363#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/novelglasscleanrooms.html

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10363#primary_contact

http://id.southampton.ac.uk/equipment/E10363#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "HEWAK, DANIEL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10363

http://id.southampton.ac.uk/equipment/E10365

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Fibre Rewinder & Proof Tester"^^xsd:string

→ skos:notation → "E10365"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10365-200557-P1000895.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10365#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/silicafibrefacilities.html

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10365#primary_contact

http://id.southampton.ac.uk/equipment/E10365#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SAHU, JAYANTA"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10365

http://id.southampton.ac.uk/equipment/E10368

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Gantry Platform For 6M Silca Tower"^^xsd:string

→ skos:notation → "E10368"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ foaf:depiction → http://data.southampton.ac.uk/image-archive/equipment/raw/E10368-200570-P1010120.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10368-200570-P1010121.jpg

→ oo:contact → http://id.southampton.ac.uk/equipment/E10368#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/silicafibrefacilities.html

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10368#primary_contact

http://id.southampton.ac.uk/equipment/E10368#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SAHU, JAYANTA"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10368

http://id.southampton.ac.uk/equipment/E10373

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Three Zone, Bench Top 1700C Tube Furnace"^^xsd:string

→ skos:notation → "E10373"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:contact → http://id.southampton.ac.uk/equipment/E10373#secondary_contact

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10373#primary_contact

http://id.southampton.ac.uk/equipment/E10373#primary_contact

→ rdf:type → foaf:Agent

→ foaf:name → "SESSIONS, NEIL"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10373

http://id.southampton.ac.uk/equipment/E10382

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Newport Spectra Physics Mai Tai HP Ti:Sapphire Laser"^^xsd:string

→ dcterms:description → "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"^^xsd:string

→ skos:notation → "E10382"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ rdfs:comment → "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"^^xsd:string

→ oo:contact → http://id.southampton.ac.uk/equipment/E10382#secondary_contact

→ foaf:page → http://www.orc.soton.ac.uk/pld.html

→ dc:description → "Fully-automated mode-locked Ti:Sapphire laser: Spectral range 690-1040 nm; < 100 fs pulsewidth; > 2500 mW power at 800 nm"^^xsd:string

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10382#primary_contact

http://id.southampton.ac.uk/equipment/E10382#primary_contact

→ rdf:type → foaf:Agent

→ foaf:phone → tel:+442380593085

→ foaf:name → "MACDONALD, KEVIN"^^xsd:string

← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10382

http://id.southampton.ac.uk/equipment/E10383

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ rdf:type → oo:Equipment

→ rdfs:label → "Newport Spectra Physics Inspire HF100 Tuneable OPO"^^xsd:string