Opt System 100 Oxide Etcher
The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materials etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor Substrate electrode: 170 or 240 mm Shower head gas inlet optimised for RIE High conductance vacuum layout Gases: CHF3, Ar, O2, SF6, CF4, N2
E10239
The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materials etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor Substrate electrode: 170 or 240 mm Shower head gas inlet optimised for RIE High conductance vacuum layout Gases: CHF3, Ar, O2, SF6, CF4, N2
The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materials etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor Substrate electrode: 170 or 240 mm Shower head gas inlet optimised for RIE High conductance vacuum layout Gases: CHF3, Ar, O2, SF6, CF4, N2
New Mountbatten
University of Southampton
School of Electronics & Computer Science
Physical Sciences and Engineering
LESSEY, MARK
Clean Rooms - Nanofabrication
133
100
0.75187969924812
4248
1333
1000
0.75018754688672
145294
2133
1600
0.75011720581341
321574
2560
1920
0.75
448830
266
200
0.75187969924812
11631
220
220
1
10651
260
240
0.92307692307692
12903
400
300
0.75
21784
198
320
1.6161616161616
12130
533
400
0.75046904315197
34228
297
480
1.6161616161616
23153
66
50
0.75757575757576
1857
800
600
0.75
64501
1066
800
0.75046904315197
101478
600
800
1.3333333333333
61989
4320
3240
0.75
4979835