@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#> .
@prefix oo: <http://purl.org/openorg/> .
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#> .
@prefix ns0: <http://data.ordnancesurvey.co.uk/ontology/spatialrelations/> .
@prefix dcterms: <http://purl.org/dc/terms/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix dc: <http://purl.org/dc/elements/1.1/> .
@prefix foaf: <http://xmlns.com/foaf/0.1/> .
@prefix ns1: <http://vocab.deri.ie/rooms#> .
@prefix ns2: <http://id.southampton.ac.uk/ns/> .
@prefix ns3: <http://www.w3.org/ns/org#> .
@prefix ns4: <http://purl.org/vocab/aiiso/schema#> .

<http://id.southampton.ac.uk/equipment/E10245> rdf:type oo:Equipment ;
                                               rdfs:label "EVG620 Double Side Mask Aligner" ;
                                               oo:contact <http://id.southampton.ac.uk/equipment/E10245#secondary_contact> ;
                                               ns0:within <http://id.southampton.ac.uk/building/53> ;
                                               dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput." ;
                                               skos:notation "E10245"^^<http://id.southampton.ac.uk/ns/equipment-code-scheme> ;
                                               oo:formalOrganization <http://id.southampton.ac.uk/> ;
                                               dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput." ;
                                               rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput." ;
                                               oo:organizationPart <http://id.southampton.ac.uk/org/F7> ,
                                                                   <http://id.southampton.ac.uk/org/FP> ;
                                               oo:primaryContact <http://id.southampton.ac.uk/equipment/E10245#primary_contact> ;
                                               oo:relatedFacility <http://id.southampton.ac.uk/facility/F10014> ;
                                               foaf:page <http://www.southampton-nanofab.com/fabrication/lithography.php> .

<http://id.southampton.ac.uk/equipment/E10245#secondary_contact> rdf:type foaf:Person .

<http://id.southampton.ac.uk/building/53> rdf:type ns1:Building ,
                                                   ns2:UoSBuilding ;
                                          rdfs:label "New Mountbatten" .

<http://id.southampton.ac.uk/> rdf:type ns3:Organization ,
                                        ns4:Institution ,
                                        ns3:FormalOrganization ,
                                        foaf:Organization ;
                               rdfs:label "University of Southampton" .

<http://id.southampton.ac.uk/org/F7> rdf:type ns3:OrganizationalUnit ,
                                              ns3:Organization ;
                                     rdfs:label "Physical Sciences and Engineering" .

<http://id.southampton.ac.uk/org/FP> rdf:type ns3:Organization ;
                                     rdfs:label "School of Electronics & Computer Science" .

<http://id.southampton.ac.uk/equipment/E10245#primary_contact> rdf:type foaf:Agent ;
                                                               foaf:name "LESSEY, MARK" .

<http://id.southampton.ac.uk/facility/F10014> rdf:type oo:Facility ;
                                              rdfs:label "Clean Rooms - Nanofabrication" .