Open Data Service, University of Southampton

Open Data Service

Atomic layer deposition system

The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer. Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3. ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties.

Facility: Clean Rooms - Nanofabrication
Part of: School of Electronics & Computer Science
Physical Sciences and Engineering
Location: New Mountbatten



If you have additions or corrections to a facility or equipment entry please contact your Faculty Finance Team.

Get the Data

If you're that way inclined, you can get the raw data used to create this page in various formats, as listed below.

TTLRDF/Turtle file
RDF.HTMLHTML visualisation of raw data

The following open datasets were used to build this page:

Facilities and Equipment
Photographs of University of Southampton Things