@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#> .
@prefix oo: <http://purl.org/openorg/> .
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#> .
@prefix ns0: <http://data.ordnancesurvey.co.uk/ontology/spatialrelations/> .
@prefix dcterms: <http://purl.org/dc/terms/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix dc: <http://purl.org/dc/elements/1.1/> .
@prefix foaf: <http://xmlns.com/foaf/0.1/> .
@prefix ns1: <http://vocab.deri.ie/rooms#> .
@prefix ns2: <http://id.southampton.ac.uk/ns/> .
@prefix ns3: <http://www.w3.org/ns/org#> .
@prefix ns4: <http://purl.org/vocab/aiiso/schema#> .
@prefix ns5: <http://www.semanticdesktop.org/ontologies/2007/03/22/nfo#> .

<http://id.southampton.ac.uk/equipment/E10253> rdf:type oo:Equipment ;
                                               rdfs:label "Opt System 100 Pecvd" ;
                                               oo:contact <http://id.southampton.ac.uk/equipment/E10253#secondary_contact> ;
                                               ns0:within <http://id.southampton.ac.uk/building/53> ;
                                               dcterms:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning." ;
                                               skos:notation "E10253"^^<http://id.southampton.ac.uk/ns/equipment-code-scheme> ;
                                               oo:formalOrganization <http://id.southampton.ac.uk/> ;
                                               dc:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning." ;
                                               rdfs:comment "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning." ;
                                               oo:organizationPart <http://id.southampton.ac.uk/org/F7> ,
                                                                   <http://id.southampton.ac.uk/org/FP> ;
                                               oo:primaryContact <http://id.southampton.ac.uk/equipment/E10253#primary_contact> ;
                                               oo:relatedFacility <http://id.southampton.ac.uk/facility/F10014> ;
                                               foaf:page <http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php> ;
                                               foaf:depiction <http://data.southampton.ac.uk/image-archive/equipment/raw/E10253-200642-P1000871.jpg> .

<http://id.southampton.ac.uk/equipment/E10253#secondary_contact> rdf:type foaf:Person .

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                                          rdfs:label "New Mountbatten" .

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                                        ns3:FormalOrganization ,
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                               rdfs:label "University of Southampton" .

<http://id.southampton.ac.uk/org/F7> rdf:type ns3:OrganizationalUnit ,
                                              ns3:Organization ;
                                     rdfs:label "Physical Sciences and Engineering" .

<http://id.southampton.ac.uk/org/FP> rdf:type ns3:Organization ;
                                     rdfs:label "School of Electronics & Computer Science" .

<http://id.southampton.ac.uk/equipment/E10253#primary_contact> rdf:type foaf:Agent ;
                                                               foaf:name "LESSEY, MARK" .

<http://id.southampton.ac.uk/facility/F10014> rdf:type oo:Facility ;
                                              rdfs:label "Clean Rooms - Nanofabrication" .

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<https://data.southampton.ac.uk/image-archive/equipment/300/E10253-200642-P1000871.JPG> foaf:depicts <http://id.southampton.ac.uk/equipment/E10253> ;
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<https://data.southampton.ac.uk/image-archive/equipment/100/E10253-200642-P1000871.JPG> foaf:depicts <http://id.southampton.ac.uk/equipment/E10253> ;
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<https://data.southampton.ac.uk/image-archive/equipment/50/E10253-200642-P1000871.JPG> foaf:depicts <http://id.southampton.ac.uk/equipment/E10253> ;
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<https://data.southampton.ac.uk/image-archive/equipment/1920/E10253-200642-P1000871.JPG> foaf:depicts <http://id.southampton.ac.uk/equipment/E10253> ;
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