→ dcterms:description → "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
→ skos:notation → "E10291"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
→ rdfs:comment → "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
→ dc:description → "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
← is
foaf:depicts of
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→ rdfs:label → "University of Southampton"^^xsd:string
→ rdfs:label → "School of Electronics & Computer Science"^^xsd:string
→ rdfs:label → "Physical Sciences and Engineering"^^xsd:string
→ rdfs:label → "Clean Rooms - Nanofabrication"^^xsd:string