→ rdfs:label → "Plasmalab System 400 / Magnetron Sputtering System"^^xsd:string
→ dcterms:description → "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."^^xsd:string
→ skos:notation → "E10323"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
→ rdfs:comment → "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."^^xsd:string
→ dc:description → "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."^^xsd:string
← is
foaf:depicts of
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→ rdfs:label → "University of Southampton"^^xsd:string
→ rdfs:label → "Physical Sciences and Engineering"^^xsd:string
→ rdfs:label → "Optoelectronics Research Centre"^^xsd:string
→ rdfs:label → "Clean Rooms - Integrated Photonics"^^xsd:string