@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#> .
@prefix oo: <http://purl.org/openorg/> .
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#> .
@prefix ns0: <http://data.ordnancesurvey.co.uk/ontology/spatialrelations/> .
@prefix dcterms: <http://purl.org/dc/terms/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix dc: <http://purl.org/dc/elements/1.1/> .
@prefix foaf: <http://xmlns.com/foaf/0.1/> .
@prefix ns1: <http://vocab.deri.ie/rooms#> .
@prefix ns2: <http://id.southampton.ac.uk/ns/> .
@prefix ns3: <http://www.w3.org/ns/org#> .
@prefix ns4: <http://purl.org/vocab/aiiso/schema#> .

<http://id.southampton.ac.uk/equipment/E10615> rdf:type oo:Equipment ;
                                               rdfs:label "EVG150 Automated Resist Processing System" ;
                                               oo:contact <http://id.southampton.ac.uk/equipment/E10615#secondary_contact> ;
                                               ns0:within <http://id.southampton.ac.uk/building/53> ;
                                               dcterms:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings." ;
                                               skos:notation "E10615"^^<http://id.southampton.ac.uk/ns/equipment-code-scheme> ;
                                               oo:formalOrganization <http://id.southampton.ac.uk/> ;
                                               dc:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings." ;
                                               rdfs:comment "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings." ;
                                               oo:organizationPart <http://id.southampton.ac.uk/org/F7> ,
                                                                   <http://id.southampton.ac.uk/org/FP> ;
                                               oo:primaryContact <http://id.southampton.ac.uk/equipment/E10615#primary_contact> ;
                                               oo:relatedFacility <http://id.southampton.ac.uk/facility/F10014> ;
                                               foaf:page <http://www.southampton-nanofab.com/fabrication/lithography.php> .

<http://id.southampton.ac.uk/equipment/E10615#secondary_contact> rdf:type foaf:Person .

<http://id.southampton.ac.uk/building/53> rdf:type ns1:Building ,
                                                   ns2:UoSBuilding ;
                                          rdfs:label "New Mountbatten" .

<http://id.southampton.ac.uk/> rdf:type ns3:Organization ,
                                        ns4:Institution ,
                                        ns3:FormalOrganization ,
                                        foaf:Organization ;
                               rdfs:label "University of Southampton" .

<http://id.southampton.ac.uk/org/F7> rdf:type ns3:OrganizationalUnit ,
                                              ns3:Organization ;
                                     rdfs:label "Physical Sciences and Engineering" .

<http://id.southampton.ac.uk/org/FP> rdf:type ns3:Organization ;
                                     rdfs:label "School of Electronics & Computer Science" .

<http://id.southampton.ac.uk/equipment/E10615#primary_contact> rdf:type foaf:Agent ;
                                                               foaf:name "ANTENEY, IAIN" .

<http://id.southampton.ac.uk/facility/F10014> rdf:type oo:Facility ;
                                              rdfs:label "Clean Rooms - Nanofabrication" .