http://id.southampton.ac.uk/equipment/E10758

→ rdfs:label → "Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD)"

→ oo:contact → http://id.southampton.ac.uk/equipment/E10758#secondary_contact

→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53

→ dcterms:description → "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."

→ skos:notation → "E10758"^^http://id.southampton.ac.uk/ns/equipment-code-scheme

→ oo:formalOrganization → http://id.southampton.ac.uk/

→ dc:description → "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."

→ rdfs:comment → "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."

→ oo:organizationPart → http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP

→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10758#primary_contact