http://id.southampton.ac.uk/equipment/E10758
→ rdf:type → oo:Equipment
→ rdfs:label → "Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD)"^^xsd:string
→ dcterms:description → "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."^^xsd:string
→ skos:notation → "E10758"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
→ http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within → http://id.southampton.ac.uk/building/53
→ rdfs:comment → "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."^^xsd:string
→ oo:contact → http://id.southampton.ac.uk/equipment/E10758#secondary_contact
→ dc:description → "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."^^xsd:string
→ oo:formalOrganization → http://id.southampton.ac.uk/
→ oo:organizationPart → http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
→ oo:primaryContact → http://id.southampton.ac.uk/equipment/E10758#primary_contact
→ oo:relatedFacility → http://id.southampton.ac.uk/facility/F10014
 
http://id.southampton.ac.uk/building/53
→ rdf:type → http://vocab.deri.ie/rooms#Building, http://id.southampton.ac.uk/ns/UoSBuilding
→ rdfs:label → "New Mountbatten"^^xsd:string
← is http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within of ← http://id.southampton.ac.uk/equipment/E10758
 
http://id.southampton.ac.uk/equipment/E10758#secondary_contact
→ rdf:type → foaf:Person
← is oo:contact of ← http://id.southampton.ac.uk/equipment/E10758
 
http://id.southampton.ac.uk/
→ rdf:type → http://purl.org/vocab/aiiso/schema#Institution, http://www.w3.org/ns/org#FormalOrganization, http://www.w3.org/ns/org#Organization, foaf:Organization
→ rdfs:label → "University of Southampton"^^xsd:string
← is oo:formalOrganization of ← http://id.southampton.ac.uk/equipment/E10758
 
http://id.southampton.ac.uk/org/FP
→ rdf:type → http://www.w3.org/ns/org#Organization
→ rdfs:label → "School of Electronics & Computer Science"^^xsd:string
← is oo:organizationPart of ← http://id.southampton.ac.uk/equipment/E10758
 
http://id.southampton.ac.uk/org/F7
→ rdf:type → http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization
→ rdfs:label → "Physical Sciences and Engineering"^^xsd:string
← is oo:organizationPart of ← http://id.southampton.ac.uk/equipment/E10758
 
http://id.southampton.ac.uk/equipment/E10758#primary_contact
→ rdf:type → foaf:Agent
→ foaf:name → "BODEN, STUART"^^xsd:string
← is oo:primaryContact of ← http://id.southampton.ac.uk/equipment/E10758
 
http://id.southampton.ac.uk/facility/F10014
→ rdf:type → oo:Facility
→ rdfs:label → "Clean Rooms - Nanofabrication"^^xsd:string
← is oo:relatedFacility of ← http://id.southampton.ac.uk/equipment/E10758