@prefix rdf: <http://www.w3.org/1999/02/22-rdf-syntax-ns#> .
@prefix oo: <http://purl.org/openorg/> .
@prefix rdfs: <http://www.w3.org/2000/01/rdf-schema#> .
@prefix ns0: <http://data.ordnancesurvey.co.uk/ontology/spatialrelations/> .
@prefix dcterms: <http://purl.org/dc/terms/> .
@prefix skos: <http://www.w3.org/2004/02/skos/core#> .
@prefix dc: <http://purl.org/dc/elements/1.1/> .
@prefix foaf: <http://xmlns.com/foaf/0.1/> .
@prefix ns1: <http://vocab.deri.ie/rooms#> .
@prefix ns2: <http://id.southampton.ac.uk/ns/> .
@prefix ns3: <http://www.w3.org/ns/org#> .
@prefix ns4: <http://purl.org/vocab/aiiso/schema#> .

<http://id.southampton.ac.uk/equipment/E10758> rdf:type oo:Equipment ;
                                               rdfs:label "Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD)" ;
                                               oo:contact <http://id.southampton.ac.uk/equipment/E10758#secondary_contact> ;
                                               ns0:within <http://id.southampton.ac.uk/building/53> ;
                                               dcterms:description "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm." ;
                                               skos:notation "E10758"^^<http://id.southampton.ac.uk/ns/equipment-code-scheme> ;
                                               oo:formalOrganization <http://id.southampton.ac.uk/> ;
                                               dc:description "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm." ;
                                               rdfs:comment "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm." ;
                                               oo:organizationPart <http://id.southampton.ac.uk/org/F7> ,
                                                                   <http://id.southampton.ac.uk/org/FP> ;
                                               oo:primaryContact <http://id.southampton.ac.uk/equipment/E10758#primary_contact> ;
                                               oo:relatedFacility <http://id.southampton.ac.uk/facility/F10014> .

<http://id.southampton.ac.uk/equipment/E10758#secondary_contact> rdf:type foaf:Person .

<http://id.southampton.ac.uk/building/53> rdf:type ns1:Building ,
                                                   ns2:UoSBuilding ;
                                          rdfs:label "New Mountbatten" .

<http://id.southampton.ac.uk/> rdf:type ns3:Organization ,
                                        ns4:Institution ,
                                        ns3:FormalOrganization ,
                                        foaf:Organization ;
                               rdfs:label "University of Southampton" .

<http://id.southampton.ac.uk/org/F7> rdf:type ns3:OrganizationalUnit ,
                                              ns3:Organization ;
                                     rdfs:label "Physical Sciences and Engineering" .

<http://id.southampton.ac.uk/org/FP> rdf:type ns3:Organization ;
                                     rdfs:label "School of Electronics & Computer Science" .

<http://id.southampton.ac.uk/equipment/E10758#primary_contact> rdf:type foaf:Agent ;
                                                               foaf:name "BODEN, STUART" .

<http://id.southampton.ac.uk/facility/F10014> rdf:type oo:Facility ;
                                              rdfs:label "Clean Rooms - Nanofabrication" .