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dcterms:description "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."
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dc:description "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."
rdfs:comment "The Integrated Photonics Cleanroom is a 200m² Class 1000 facility with local areas of Class 100, designed for planar processing of a very wide range of materials. The prime purpose of this facility is to be able to take raw materials, ORC-made materials, or commercial materials and process them to realise photonic devices for use in applications from telecommunications to all-optical data processing and from biochemical sensing to the lab-on-a-chip. Polishing and scanning electron microscopy are available outside the cleanroom. The major equipment items are: Karl-Suss MA6 double-sided mask aligner, OPT Plasmalab 400 Sputtering Machine, Ionafab 300 Plus Reactive Ion Beam Depostit/Etcher, Edwards Auto 306 thermal evaporators, Edwards Auto 306 electron beam evaporator, Materials Research 2300c Furnace, Severn (STS) 1200c Tube Furnace, Instron 600c Ion-Exchange Furnaces, KLA Tencor P-16 Stylus Profiler, Nikon LV100D Optical Microscope and Wet Benches for Chemical Processing."
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dcterms:date "2010"^^xsd:date
 
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foaf:depicts http://id.southampton.ac.uk/building/53
rdf:type foaf:Image
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dcterms:creator http://id.ecs.soton.ac.uk/person/10955
dcterms:isVersionOf https://data.southampton.ac.uk/image-archive/buildings/raw/53.jpg
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dcterms:date "2010"^^xsd:date
 
http://id.southampton.ac.uk/org/F7
rdf:type http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization
skos:notation "F7"^^http://id.southampton.ac.uk/ns/alphaCode
rdfs:label "Physical Sciences and Engineering"
foaf:homepage http://www.fpse.soton.ac.uk/
is http://vocab.deri.ie/rooms#occupant of http://id.southampton.ac.uk/building/53
is oo:organizationPart of http://id.southampton.ac.uk/facility/F10010, http://id.southampton.ac.uk/equipment/E10494, http://id.southampton.ac.uk/equipment/E10373, http://id.southampton.ac.uk/equipment/E10362, http://id.southampton.ac.uk/equipment/E10321, http://id.southampton.ac.uk/equipment/E10332, http://id.southampton.ac.uk/equipment/E10305, http://id.southampton.ac.uk/equipment/E10323, http://id.southampton.ac.uk/equipment/E10329, http://id.southampton.ac.uk/equipment/E10320, http://id.southampton.ac.uk/equipment/E10319, http://id.southampton.ac.uk/equipment/E10324, http://id.southampton.ac.uk/equipment/E10316, http://id.southampton.ac.uk/equipment/E10348, http://id.southampton.ac.uk/equipment/E10322, http://id.southampton.ac.uk/equipment/E10388, http://id.southampton.ac.uk/equipment/E10387, http://id.southampton.ac.uk/equipment/E10840, http://id.southampton.ac.uk/equipment/E11274, http://id.southampton.ac.uk/equipment/E11272, http://id.southampton.ac.uk/equipment/E11273
 
http://id.southampton.ac.uk/org/EH
rdf:type http://www.w3.org/ns/org#OrganizationalUnit, http://www.w3.org/ns/org#Organization
skos:notation "EH"^^http://id.southampton.ac.uk/ns/alphaCode
rdfs:label "Optoelectronics Research Centre"
foaf:homepage http://www.orc.soton.ac.uk/
is http://vocab.deri.ie/rooms#occupant of http://id.southampton.ac.uk/building/53
is oo:organizationPart of http://id.southampton.ac.uk/facility/F10010, http://id.southampton.ac.uk/equipment/E10373, http://id.southampton.ac.uk/equipment/E10362, http://id.southampton.ac.uk/equipment/E10321, http://id.southampton.ac.uk/equipment/E10332, http://id.southampton.ac.uk/equipment/E10305, http://id.southampton.ac.uk/equipment/E10323, http://id.southampton.ac.uk/equipment/E10329, http://id.southampton.ac.uk/equipment/E10320, http://id.southampton.ac.uk/equipment/E10319, http://id.southampton.ac.uk/equipment/E10324, http://id.southampton.ac.uk/equipment/E10316, http://id.southampton.ac.uk/equipment/E10348, http://id.southampton.ac.uk/equipment/E10387, http://id.southampton.ac.uk/equipment/E11274, http://id.southampton.ac.uk/equipment/E11272, http://id.southampton.ac.uk/equipment/E11273
 
http://id.southampton.ac.uk/facility/F10010#primary_contact
rdf:type foaf:Agent
foaf:name "SESSIONS, NEIL"
foaf:phone tel:+442380592960
is oo:primaryContact of http://id.southampton.ac.uk/facility/F10010
 
http://id.southampton.ac.uk/equipment/E10494
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10494#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10494"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10494#primary_contact
rdfs:label "Nano 38 Sputting Machine Lesker Sputter System"
 
http://id.southampton.ac.uk/equipment/E10373
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10373#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10373"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10373#primary_contact
rdfs:label "Three Zone, Bench Top 1700C Tube Furnace"
 
http://id.southampton.ac.uk/equipment/E10362
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10362#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10362"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10362#primary_contact
rdfs:label "MJB4 Mask Aligner"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10362-200571-P1000643.jpg
 
http://id.southampton.ac.uk/equipment/E10321
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10321#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."
skos:notation "E10321"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."
rdfs:comment "This furnace is capabale of reaching 2300C in rough vacuum or 1600C in oxygen."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10321#primary_contact
rdfs:label "MRF High Temperature Vacuum Furnace"
 
http://id.southampton.ac.uk/equipment/E10332
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10332#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"
skos:notation "E10332"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"
rdfs:comment "Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10332#primary_contact
rdfs:label "Ionfab 300 Plus / Load Locked Ion Beam Etch System"
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10332-200545-P1000626.jpg
 
http://id.southampton.ac.uk/equipment/E10305
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10305#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"
skos:notation "E10305"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"
rdfs:comment "BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10305#primary_contact
rdfs:label "Auto 500 Electron Beam Deposition System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10305-200461-P1000632.jpg
 
http://id.southampton.ac.uk/equipment/E10323
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10323#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."
skos:notation "E10323"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."
rdfs:comment "Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10323#primary_contact
rdfs:label "Plasmalab System 400 / Magnetron Sputtering System"
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10323-200480-P1000624.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10323-200480-P1000625.jpg
 
http://id.southampton.ac.uk/equipment/E10329
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10329#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"
skos:notation "E10329"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"
rdfs:comment "Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10329#primary_contact
rdfs:label "MA6 Mask Aligner"
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10329-200488-P1000639.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10329-200488-P1000637.jpg
 
http://id.southampton.ac.uk/equipment/E10320
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10320#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."
skos:notation "E10320"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."
rdfs:comment "The Alpha-Step IQ stylus-based surface profiler combines high measurement precision with versatility and economy. Ideal for semiconductor pilot lines and materials research, this advanced surface profiler enables faster process learning and higher yields. With guaranteed 8Å (1 sigma) or 0.1% step height repeatability and sub-angstrom resolution, the Alpha-Step IQ surface profiler provides excellent repeatability and performance to analyze and monitor processes."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10320#primary_contact
rdfs:label "KLA Tencor Alpha Step IQ Stylus Profier"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10320-200477-P1000646.jpg
 
http://id.southampton.ac.uk/equipment/E10319
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10319#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"
skos:notation "E10319"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"
rdfs:comment "The P-16+ stylus profiler is a surface metrology analysis solution. This surface analysis solution`s precise force control provides excellent vertical resolution, precision, and reliability measurements. This surface analysis solution delivers automated step height analysis, surface contour, waviness and roughness measurements with detailed 2D or 3D analysis of topography for a variety of surfaces and materials"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10319#primary_contact
rdfs:label "P-16+ Stylus Surface Profiler"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10319-200476-P1000636.jpg
 
http://id.southampton.ac.uk/equipment/E10324
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10324#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/20
dcterms:description "The Frontier¿ IR/NIR system enables you to benefit from faster method development and reduced instrument costs. This single optimized system provides unique mid-IR and near-IR dual range performance. Automated range switching, at the touch of a button, enables you to quickly move onto your next sample without manual reconfiguration, increasing your productivity."
skos:notation "E10324"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Frontier¿ IR/NIR system enables you to benefit from faster method development and reduced instrument costs. This single optimized system provides unique mid-IR and near-IR dual range performance. Automated range switching, at the touch of a button, enables you to quickly move onto your next sample without manual reconfiguration, increasing your productivity."
rdfs:comment "The Frontier¿ IR/NIR system enables you to benefit from faster method development and reduced instrument costs. This single optimized system provides unique mid-IR and near-IR dual range performance. Automated range switching, at the touch of a button, enables you to quickly move onto your next sample without manual reconfiguration, increasing your productivity."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10324#primary_contact
rdfs:label "GX Custom FT-IR Spectrometer (obsolete 1718)"
 
http://id.southampton.ac.uk/equipment/E10316
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10316#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10316"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10316#primary_contact
rdfs:label "600C Environmental Oven"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10316-200472-P1000622.jpg
 
http://id.southampton.ac.uk/equipment/E10348
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10348#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."
skos:notation "E10348"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."
rdfs:comment "Designed to meet the exacting requirements of wafer, flat panel display and optical inspection and fabrication. The ABL/ABLH9000 incorporates an active preload on both vertical and horizontal surfaces. The opposing thin-film pressure maintains the bearing nominal gap tolerance. This design, in addition to the large air-bearing surface that distributes the load over a large surface area, results in a stage with outstanding stiffness that is ideal for heavy or offset loading."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10348#primary_contact
rdfs:label "Planar Air Bearing System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10348-200678-DSC_0104.jpg
 
http://id.southampton.ac.uk/equipment/E10322
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10322#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."
skos:notation "E10322"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."
rdfs:comment "Parallel plate RF etcher for glass etching primarily using SF6 and CHF3. Can also be used for ashing using O2."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10322#primary_contact
rdfs:label "Plasmalab 80 Plus / Compact Modular Plasma System"
foaf:page http://www.orc.soton.ac.uk/integratedcleanroom.html
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10322-200479-P1000628.jpg
 
http://id.southampton.ac.uk/equipment/E10388
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10388#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10388"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/~~
oo:primaryContact http://id.southampton.ac.uk/equipment/E10388#primary_contact
rdfs:label "ZeMetrics ZeScope Optical Profiling System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10388-200875-P1000647.jpg
 
http://id.southampton.ac.uk/equipment/E10387
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10387#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10387"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10387#primary_contact
rdfs:label "Nanolink DPN 5000 System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10387-200808-P1000640.jpg
 
http://id.southampton.ac.uk/equipment/E10840
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E10840#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10840"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10840#primary_contact
rdfs:label "PVA Tepla 300 Plasma System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10840-200575-P1010208.jpg
 
http://id.southampton.ac.uk/equipment/E11274
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E11274#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Vertical Furnace"
skos:notation "E11274"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Vertical Furnace"
rdfs:comment "Vertical Furnace"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11274#primary_contact
rdfs:label "Vertical Furnace"
 
http://id.southampton.ac.uk/equipment/E11272
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E11272#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Flame Hydrolysis Deposition Chamber"
skos:notation "E11272"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Flame Hydrolysis Deposition Chamber"
rdfs:comment "Flame Hydrolysis Deposition Chamber"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11272#primary_contact
rdfs:label "Flame Hydrolysis Deposition Chamber - 1 of 2"
 
http://id.southampton.ac.uk/equipment/E11273
oo:relatedFacility http://id.southampton.ac.uk/facility/F10010
oo:contact http://id.southampton.ac.uk/equipment/E11273#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Flame Hydrolysis Deposition Chamber - 2 of 2"
skos:notation "E11273"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Flame Hydrolysis Deposition Chamber - 2 of 2"
rdfs:comment "Flame Hydrolysis Deposition Chamber - 2 of 2"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E11273#primary_contact
rdfs:label "Flame Hydrolysis Deposition Chamber - 2 of 2"