→ rdfs:label → "Clean Rooms - Focused ion beam (FIB)"^^xsd:string
→ dcterms:description → "Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials. [nl]
Specification: 0.9 nm electron beam and 5 nm ion beam resoultion - Gas injection for bea-induced deposition of gold and platinum - Nabity pattern generator - Electron - beam lithography capability - Kleidiek nanomanipulator for TEM sample lift-out (other tool options available inc. microfluidic injection and four-point electrical probe) - 5-axis motorized stage for samples up to 150mm dia. (larger without full rotation) and 20mm thick - Ability to accept complex CAD pattern files."^^xsd:string
→ skos:notation → "F10011"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
→ rdfs:comment → "Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials. [nl]
Specification: 0.9 nm electron beam and 5 nm ion beam resoultion - Gas injection for bea-induced deposition of gold and platinum - Nabity pattern generator - Electron - beam lithography capability - Kleidiek nanomanipulator for TEM sample lift-out (other tool options available inc. microfluidic injection and four-point electrical probe) - 5-axis motorized stage for samples up to 150mm dia. (larger without full rotation) and 20mm thick - Ability to accept complex CAD pattern files."^^xsd:string
→ dc:description → "Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials. [nl]
Specification: 0.9 nm electron beam and 5 nm ion beam resoultion - Gas injection for bea-induced deposition of gold and platinum - Nabity pattern generator - Electron - beam lithography capability - Kleidiek nanomanipulator for TEM sample lift-out (other tool options available inc. microfluidic injection and four-point electrical probe) - 5-axis motorized stage for samples up to 150mm dia. (larger without full rotation) and 20mm thick - Ability to accept complex CAD pattern files."^^xsd:string
→ skos:notation → "53"^^http://id.southampton.ac.uk/ns/building-code-scheme
→ dcterms:spatial → "POLYGON((-1.39913396019065 50.9372142159638,-1.39907008997395 50.9373032056671,-1.39891522041897 50.937259276929,-1.39890569827696 50.9372705987727,-1.39892932396893 50.9372784674524,-1.39859712697686 50.9377277159088,-1.39838674153732 50.93774396259,-1.3984577982763 50.937687410529,-1.39842294364327 50.9376771643524,-1.39822064304129 50.9376180648148,-1.39809892132029 50.937582514482,-1.39802930188577 50.9375621919069,-1.39799786085083 50.9375543798841,-1.3979582451468 50.9375445865492,-1.39795617902165 50.9375199050719,-1.39795384340191 50.9374888833799,-1.39795249592898 50.9374689004178,-1.39794872300479 50.9374351048503,-1.39794863317326 50.9374339726701,-1.39794486024907 50.9373881759563,-1.39794521957518 50.9373882891745,-1.39807691259583 50.93743340658,-1.39810988076676 50.9374439924643,-1.3983446105505 50.9371126021949,-1.39848726301762 50.9371526816356,-1.39856272150148 50.9370497091047,-1.39867465158588 50.9370818632785,-1.3986993552562 50.9370889960675,-1.39913396019065 50.9372142159638))"^^xsd:string
← is
foaf:depicts of
← https://data.southampton.ac.uk/image-archive/buildings/100/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/1000/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/1600/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/1920/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/200/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/220x220/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/240x260/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/300/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/320x198/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/400/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/480x297/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/50/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/600/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/800/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/800x600/53.jpg,
https://data.southampton.ac.uk/image-archive/buildings/raw/53.jpg
→ rdfs:label → "Physical Sciences and Engineering"^^xsd:string
→ rdfs:label → "Optoelectronics Research Centre"^^xsd:string
→ rdfs:label → "XF2 Insulator Enhanced Etch Gas Injector"^^xsd:string
→ dcterms:description → "Gas injection system for chemically-assisted focused ion beam milling of insulating materials"^^xsd:string
→ skos:notation → "E10741"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
→ rdfs:comment → "Gas injection system for chemically-assisted focused ion beam milling of insulating materials"^^xsd:string
→ dc:description → "Gas injection system for chemically-assisted focused ion beam milling of insulating materials"^^xsd:string