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rdf:type oo:Equipment
rdfs:label "Opt System 100 Oxide Etcher"^^xsd:string
dcterms:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor␣␣␣Substrate electrode: 170 or 240 mm␣␣␣Shower head gas inlet optimised for RIE␣␣␣High conductance vacuum layout␣␣␣Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string
skos:notation "E10239"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor␣␣␣Substrate electrode: 170 or 240 mm␣␣␣Shower head gas inlet optimised for RIE␣␣␣High conductance vacuum layout␣␣␣Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10239#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
dc:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor␣␣␣Substrate electrode: 170 or 240 mm␣␣␣Shower head gas inlet optimised for RIE␣␣␣High conductance vacuum layout␣␣␣Gases: CHF3, Ar, O2, SF6, CF4, N2"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10239#primary_contact
 
http://id.southampton.ac.uk/equipment/E10240
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Opt System 100 Metal Etcher"^^xsd:string
dcterms:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string
skos:notation "E10240"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10240#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
dc:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the materiala??s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10240#primary_contact
 
http://id.southampton.ac.uk/equipment/E10241
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Plasmalab 80 Plus Rie Etcher"^^xsd:string
dcterms:description "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string
skos:notation "E10241"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10241#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
dc:description "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10241#primary_contact
 
http://id.southampton.ac.uk/equipment/E10243
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Ionfab 300 Plus"^^xsd:string
dcterms:description "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string
skos:notation "E10243"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10243#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10243#primary_contact
 
http://id.southampton.ac.uk/equipment/E10244
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "EVG620 Top Side Mask Aligner"^^xsd:string
dcterms:description "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.␣␣Exposure can be performed in hard, soft and proximity modes."^^xsd:string
skos:notation "E10244"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.␣␣Exposure can be performed in hard, soft and proximity modes."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10244#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.␣␣Exposure can be performed in hard, soft and proximity modes."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10244#primary_contact
 
http://id.southampton.ac.uk/equipment/E10245
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "EVG620 Double Side Mask Aligner"^^xsd:string
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
skos:notation "E10245"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10245#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10245#primary_contact
 
http://id.southampton.ac.uk/equipment/E10246
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Evg620 Double Side Mask Aligner"^^xsd:string
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
skos:notation "E10246"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10246#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10246#primary_contact
 
http://id.southampton.ac.uk/equipment/E10249
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Nvision 40 Fib"^^xsd:string
dcterms:description "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string
skos:notation "E10249"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10249#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/fib.php
dc:description "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10249#primary_contact
 
http://id.southampton.ac.uk/equipment/E10251
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Atomic layer deposition system"^^xsd:string
dcterms:description "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.␣␣␣␣␣Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.␣␣␣␣␣ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string
skos:notation "E10251"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.␣␣␣␣␣Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.␣␣␣␣␣ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10251#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/ald.php
dc:description "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.␣␣␣␣␣Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.␣␣␣␣␣ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10251#primary_contact
 
http://id.southampton.ac.uk/equipment/E10253
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Opt System 100 Pecvd"^^xsd:string
dcterms:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.␣␣␣␣␣The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.␣␣␣␣␣Amorphous silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.␣␣␣␣␣Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.␣␣␣␣␣Microcrystalline silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.␣␣␣␣␣Amorphous and polycrystalline germanium use GeH4 as a source of␣␣Ge and CF4 & O2 for cleaning."^^xsd:string
skos:notation "E10253"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.␣␣␣␣␣The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.␣␣␣␣␣Amorphous silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.␣␣␣␣␣Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.␣␣␣␣␣Microcrystalline silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.␣␣␣␣␣Amorphous and polycrystalline germanium use GeH4 as a source of␣␣Ge and CF4 & O2 for cleaning."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10253#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.␣␣␣␣␣The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.␣␣␣␣␣Amorphous silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.␣␣␣␣␣Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.␣␣␣␣␣Microcrystalline silicon uses␣␣SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.␣␣␣␣␣Amorphous and polycrystalline germanium use GeH4 as a source of␣␣Ge and CF4 & O2 for cleaning."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10253#primary_contact
 
http://id.southampton.ac.uk/equipment/E10255
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Coolpower 4.2Gm Two Stge Systems (Obsolete/Decommissioned YE 15/16 - per YY 04/08/2016)"^^xsd:string
dcterms:description "BAK600 e-gun/thermal evaporator is configured for non-reactive deposition of metal contact stacks , metal masking layers, some dielectrics, ITO."^^xsd:string
skos:notation "E10255"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/17
rdfs:comment "BAK600 e-gun/thermal evaporator is configured for non-reactive deposition of metal contact stacks , metal masking layers, some dielectrics, ITO."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10255#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "BAK600 e-gun/thermal evaporator is configured for non-reactive deposition of metal contact stacks , metal masking layers, some dielectrics, ITO."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/BX, http://id.southampton.ac.uk/org/F2
oo:primaryContact http://id.southampton.ac.uk/equipment/E10255#primary_contact
 
http://id.southampton.ac.uk/equipment/E10258
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "He Ion Microscope: Orion-Bu"^^xsd:string
dcterms:description "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string
skos:notation "E10258"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10258#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
dc:description "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10258#primary_contact
 
http://id.southampton.ac.uk/equipment/E10260
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Helios Sputtering System Type Xl 6""^^xsd:string
dcterms:description "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string
skos:notation "E10260"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10260#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10260#primary_contact
 
http://id.southampton.ac.uk/equipment/E10261
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Field Emmission Scanning Electron Microscope (FEG-SEM)"^^xsd:string
dcterms:description "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string
skos:notation "E10261"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10261#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
dc:description "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10261#primary_contact
 
http://id.southampton.ac.uk/equipment/E10263
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Evaporator Gun"^^xsd:string
dcterms:description " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string
skos:notation "E10263"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10263#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10263#primary_contact
 
http://id.southampton.ac.uk/equipment/E10264
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Imoxs Sem"^^xsd:string
dcterms:description "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string
skos:notation "E10264"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10264#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
dc:description "X-ray fluorescence (XRF) analysis of glasses & high sensitivity trace analysis, spatial resolution 50um, sensitivity element dependant, down to 50ppm"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10264#primary_contact
 
http://id.southampton.ac.uk/equipment/E10265
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Fluoresence System"^^xsd:string
dcterms:description "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string
skos:notation "E10265"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10265#secondary_contact
dc:description "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10265#primary_contact
 
http://id.southampton.ac.uk/equipment/E10267
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Auto 306 Resistance Evaporation System"^^xsd:string
dcterms:description "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string
skos:notation "E10267"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10267#secondary_contact
dc:description "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10267#primary_contact
 
http://id.southampton.ac.uk/equipment/E10268
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Optiwet St30"^^xsd:string
dcterms:description "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string
skos:notation "E10268"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10268#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10268#primary_contact
 
http://id.southampton.ac.uk/equipment/E10270
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Rapid Prototyping System"^^xsd:string
dcterms:description "Rapid prototyping machine, build resolution x-axis 600dpi/42um, y-axis 600dpi/42um, z-axis 1600dpi/16um, build size XxYxZ) 342 x 342 x 200mm, input formats STL, IPT, IAM, SLC and objDF files. Two resin setup VeroWhite (hard) and VeroBlack (soft), capable of producing parts of any hardness level by mixing both resins."^^xsd:string
skos:notation "E10270"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/59
rdfs:comment "Rapid prototyping machine, build resolution x-axis 600dpi/42um, y-axis 600dpi/42um, z-axis 1600dpi/16um, build size XxYxZ) 342 x 342 x 200mm, input formats STL, IPT, IAM, SLC and objDF files. Two resin setup VeroWhite (hard) and VeroBlack (soft), capable of producing parts of any hardness level by mixing both resins."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10270#secondary_contact
dc:description "Rapid prototyping machine, build resolution x-axis 600dpi/42um, y-axis 600dpi/42um, z-axis 1600dpi/16um, build size XxYxZ) 342 x 342 x 200mm, input formats STL, IPT, IAM, SLC and objDF files. Two resin setup VeroWhite (hard) and VeroBlack (soft), capable of producing parts of any hardness level by mixing both resins."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10270#primary_contact
 
http://id.southampton.ac.uk/equipment/E10272
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Nikon L200D microscope"^^xsd:string
dcterms:description "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string
skos:notation "E10272"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10272#secondary_contact
dc:description "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10272#primary_contact
 
http://id.southampton.ac.uk/equipment/E10273
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Nikon LV100D Bioelectronics microscope"^^xsd:string
dcterms:description "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string
skos:notation "E10273"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10273#secondary_contact
dc:description "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10273#primary_contact
 
http://id.southampton.ac.uk/equipment/E10274
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "DC Device Multi Probe Station"^^xsd:string
dcterms:description "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string
skos:notation "E10274"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10274#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
dc:description "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10274#primary_contact
 
http://id.southampton.ac.uk/equipment/E10275
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Summit 12000B-Ap Probe Station Platform"^^xsd:string
dcterms:description "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string
skos:notation "E10275"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10275#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
dc:description "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10275#primary_contact
 
http://id.southampton.ac.uk/equipment/E10276
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Theta probe PARXPS system"^^xsd:string
dcterms:description "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string
skos:notation "E10276"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10276#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
dc:description "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10276#primary_contact
 
http://id.southampton.ac.uk/equipment/E10277
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Polytec MSA-400 Micro System Analyzer"^^xsd:string
dcterms:description "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string
skos:notation "E10277"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10277#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/memsTester.php
dc:description "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10277#primary_contact
 
http://id.southampton.ac.uk/equipment/E10279
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Cascade Microtech M150 Mulitpurpose Probing System"^^xsd:string
dcterms:description "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string
skos:notation "E10279"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10279#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
dc:description "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10279#primary_contact
 
http://id.southampton.ac.uk/equipment/E10282
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Jetfirst 200 Rta / Jetfirst 200 Rta No Pump"^^xsd:string
dcterms:description "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string
skos:notation "E10282"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10282#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
dc:description "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"^^xsd:string
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oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10282#primary_contact
 
http://id.southampton.ac.uk/equipment/E10283
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Benchtop Furnace"^^xsd:string
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rdfs:comment "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10283#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
dc:description "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
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oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10283#primary_contact
 
http://id.southampton.ac.uk/equipment/E10284
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Tempress Clean Furnace Stack"^^xsd:string
dcterms:description "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
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http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10284#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
dc:description "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10284#primary_contact
 
http://id.southampton.ac.uk/equipment/E10287
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "5430 Fine Wire Bonder SN 30280"^^xsd:string
dcterms:description "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string
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http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10287#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10287#primary_contact
 
http://id.southampton.ac.uk/equipment/E10288
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Precision Scriber"^^xsd:string
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http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10288#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php
dc:description "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10288#primary_contact
 
http://id.southampton.ac.uk/equipment/E10289
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Vanadium Fibre Laser"^^xsd:string
dcterms:description "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string
skos:notation "E10289"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10289#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php
dc:description "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10289#primary_contact
 
http://id.southampton.ac.uk/equipment/E10290
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Woollam Md2000D Ellipsometer"^^xsd:string
dcterms:description "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string
skos:notation "E10290"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10290#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/ellipsometry.php
dc:description "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10290#primary_contact
 
http://id.southampton.ac.uk/equipment/E10291
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Long Scan Profilers"^^xsd:string
dcterms:description "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
skos:notation "E10291"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10291#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/
dc:description "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10291#primary_contact
 
http://id.southampton.ac.uk/equipment/E10293
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Measurement system"^^xsd:string
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skos:notation "E10293"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10293#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/
dc:description "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10293#primary_contact
 
http://id.southampton.ac.uk/equipment/E10294
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Femtosecond Laser System"^^xsd:string
dcterms:description "Femtosecond optical charecterisation system, coherent laser, CCD camera & optics."^^xsd:string
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rdfs:comment "Femtosecond optical charecterisation system, coherent laser, CCD camera & optics."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10294#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/electricalAndRf.php
dc:description "Femtosecond optical charecterisation system, coherent laser, CCD camera & optics."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10294#primary_contact
 
http://id.southampton.ac.uk/equipment/E10304
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Auto 306 Resistance Evaporation System"^^xsd:string
dcterms:description "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others).[nl]
"^^xsd:string
skos:notation "E10304"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others).[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10304#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
dc:description "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others).[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10304#primary_contact
 
http://id.southampton.ac.uk/equipment/E10307
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (AQ6370)"^^xsd:string
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http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10307#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10307#primary_contact
 
http://id.southampton.ac.uk/equipment/E10308
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (AQ6370)"^^xsd:string
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
skos:notation "E10308"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10308#secondary_contact
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10308#primary_contact
 
http://id.southampton.ac.uk/equipment/E10309
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (AQ6370)"^^xsd:string
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
skos:notation "E10309"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10309#secondary_contact
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣- High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10309#primary_contact
 
http://id.southampton.ac.uk/equipment/E10310
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Optical Spectrum Analyser (Yokogawa AQ6315A)"^^xsd:string
dcterms:description "The AQ-6515A/-6315B optical spectrum analyzer brings advanced capabilities to a wide range of applications, from light source evaluation to measurement of loss wavelength characteristics in[nl]
optical devices."^^xsd:string
skos:notation "E10310"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "The AQ-6515A/-6315B optical spectrum analyzer brings advanced capabilities to a wide range of applications, from light source evaluation to measurement of loss wavelength characteristics in[nl]
optical devices."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10310#secondary_contact
dc:description "The AQ-6515A/-6315B optical spectrum analyzer brings advanced capabilities to a wide range of applications, from light source evaluation to measurement of loss wavelength characteristics in[nl]
optical devices."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10310#primary_contact
 
http://id.southampton.ac.uk/equipment/E10314
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Platinum Liner & Buffer Plate"^^xsd:string
skos:notation "E10314"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10314#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10314#primary_contact
 
http://id.southampton.ac.uk/equipment/E10318
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Picosecond Laser System"^^xsd:string
dcterms:description "The Laser2000 range of picosecond lasers contains both high and low power lasers to cover a wide range of applications. The picosecond pulsed diode lasers and picosecond LED modules are particularly suitable for biomedical applications. High power picosecond lasers designed for industrial microprocessing offer a new level of precision and versatility.[nl]
[nl]
"^^xsd:string
skos:notation "E10318"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "The Laser2000 range of picosecond lasers contains both high and low power lasers to cover a wide range of applications. The picosecond pulsed diode lasers and picosecond LED modules are particularly suitable for biomedical applications. High power picosecond lasers designed for industrial microprocessing offer a new level of precision and versatility.[nl]
[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10318#secondary_contact
dc:description "The Laser2000 range of picosecond lasers contains both high and low power lasers to cover a wide range of applications. The picosecond pulsed diode lasers and picosecond LED modules are particularly suitable for biomedical applications. High power picosecond lasers designed for industrial microprocessing offer a new level of precision and versatility.[nl]
[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10318#primary_contact
 
http://id.southampton.ac.uk/equipment/E10330
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Modified Material Testing Machine (M500-100CT)"^^xsd:string
dcterms:description "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest? software running under the Windows? operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string
skos:notation "E10330"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest? software running under the Windows? operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10330#secondary_contact
dc:description "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest? software running under the Windows? operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10330#primary_contact
 
http://id.southampton.ac.uk/equipment/E10331
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Fibre Tapering & Bundling System (obsolete 1718)"^^xsd:string
dcterms:description "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss.[nl]
"^^xsd:string
skos:notation "E10331"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss.[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10331#secondary_contact
dc:description "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss.[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10331#primary_contact
 
http://id.southampton.ac.uk/equipment/E10343
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Microspectrometer System (QDI 302 UV)"^^xsd:string
dcterms:description "The QDI 302 Microscope Spectrophotometer is designed to add spectroscopy and imaging to your optical microscope. It can also be used to upgrade a legacy microspectrometer or to add spectroscopic and film thickness capabilities to a probe station. The QDI 302 attaches to the microscope, microspectrometer or probe station and enables you to collect transmission, reflectance, polarization or even fluorescence spectra of microscopic samples. Depending upon the microscope optics and sources, the spectral range is from the deep UV to the near infrared region. With the QDI 302, high quality spectra of even sub-micron samples can be acquired non-destructively and with ease. [nl]
[nl]
"^^xsd:string
skos:notation "E10343"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "The QDI 302 Microscope Spectrophotometer is designed to add spectroscopy and imaging to your optical microscope. It can also be used to upgrade a legacy microspectrometer or to add spectroscopic and film thickness capabilities to a probe station. The QDI 302 attaches to the microscope, microspectrometer or probe station and enables you to collect transmission, reflectance, polarization or even fluorescence spectra of microscopic samples. Depending upon the microscope optics and sources, the spectral range is from the deep UV to the near infrared region. With the QDI 302, high quality spectra of even sub-micron samples can be acquired non-destructively and with ease. [nl]
[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10343#secondary_contact
dc:description "The QDI 302 Microscope Spectrophotometer is designed to add spectroscopy and imaging to your optical microscope. It can also be used to upgrade a legacy microspectrometer or to add spectroscopic and film thickness capabilities to a probe station. The QDI 302 attaches to the microscope, microspectrometer or probe station and enables you to collect transmission, reflectance, polarization or even fluorescence spectra of microscopic samples. Depending upon the microscope optics and sources, the spectral range is from the deep UV to the near infrared region. With the QDI 302, high quality spectra of even sub-micron samples can be acquired non-destructively and with ease. [nl]
[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10343#primary_contact
 
http://id.southampton.ac.uk/equipment/E10344
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Optical Component Characterization System"^^xsd:string
skos:notation "E10344"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10344#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10344#primary_contact
 
http://id.southampton.ac.uk/equipment/E10369
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "AR ION Laser System"^^xsd:string
skos:notation "E10369"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10369#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10369#primary_contact
 
http://id.southampton.ac.uk/equipment/E10392
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Spectrum Analyser"^^xsd:string
skos:notation "E10392"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10392#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10392#primary_contact
 
http://id.southampton.ac.uk/equipment/E10393
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Transmission Microscope (DHM)"^^xsd:string
dcterms:description "Lyncee Tec?s DHM T1000 series is composed of the only transmission configured optical profilers on the market. Based on Digital Holographic Microscopy technology, its contactless full-field 3D optical topography performed at video rate makes it an ideal tool for quantitative dynamic and static measurements. [nl]
[nl]
"^^xsd:string
skos:notation "E10393"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "Lyncee Tec?s DHM T1000 series is composed of the only transmission configured optical profilers on the market. Based on Digital Holographic Microscopy technology, its contactless full-field 3D optical topography performed at video rate makes it an ideal tool for quantitative dynamic and static measurements. [nl]
[nl]
"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10393#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/nanometrology.php
dc:description "Lyncee Tec?s DHM T1000 series is composed of the only transmission configured optical profilers on the market. Based on Digital Holographic Microscopy technology, its contactless full-field 3D optical topography performed at video rate makes it an ideal tool for quantitative dynamic and static measurements. [nl]
[nl]
"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10393#primary_contact
 
http://id.southampton.ac.uk/equipment/E10396
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "MM_Wave System"^^xsd:string
skos:notation "E10396"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10396#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10396#primary_contact
 
http://id.southampton.ac.uk/equipment/E10398
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Nikon Microscope system"^^xsd:string
skos:notation "E10398"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10398#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10398#primary_contact
 
http://id.southampton.ac.uk/equipment/E10404
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Lightwave Polarization Analyser"^^xsd:string
skos:notation "E10404"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10404#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10404#primary_contact
 
http://id.southampton.ac.uk/equipment/E10407
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "XY Stage / 1m␣␣Stage / Frame / Rack"^^xsd:string
skos:notation "E10407"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10407#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10407#primary_contact
 
http://id.southampton.ac.uk/equipment/E10408
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "AQ317 Spectrum Analyser (purchased in 1999)"^^xsd:string
skos:notation "E10408"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10408#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10408#primary_contact
 
http://id.southampton.ac.uk/equipment/E10417
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Mira 900F V10 XW Opt 220 Control Box"^^xsd:string
dcterms:description "Control box for Mira 900F, used for mode locking and monitoring of output power"^^xsd:string
skos:notation "E10417"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "Control box for Mira 900F, used for mode locking and monitoring of output power"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10417#secondary_contact
dc:description "Control box for Mira 900F, used for mode locking and monitoring of output power"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10417#primary_contact
 
http://id.southampton.ac.uk/equipment/E10418
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Verdi 10 W solid state Laser System"^^xsd:string
dcterms:description "10W solid state Coherent Verdi-10, continuous wave pump laser, used for pumping Mira 900"^^xsd:string
skos:notation "E10418"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "10W solid state Coherent Verdi-10, continuous wave pump laser, used for pumping Mira 900"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10418#secondary_contact
dc:description "10W solid state Coherent Verdi-10, continuous wave pump laser, used for pumping Mira 900"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10418#primary_contact
 
http://id.southampton.ac.uk/equipment/E10419
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Coherent RegA 9000 Controller"^^xsd:string
dcterms:description "Control box for Coherent RegA, used for optimising cavity injection and ejection timings"^^xsd:string
skos:notation "E10419"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "Control box for Coherent RegA, used for optimising cavity injection and ejection timings"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10419#secondary_contact
dc:description "Control box for Coherent RegA, used for optimising cavity injection and ejection timings"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10419#primary_contact
 
http://id.southampton.ac.uk/equipment/E10421
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "1000x Direct Diode Laser Serial No. 330739 (purchased in 2003)"^^xsd:string
skos:notation "E10421"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10421#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10421#primary_contact
 
http://id.southampton.ac.uk/equipment/E10425
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Alpha-At Analyzer"^^xsd:string
skos:notation "E10425"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/85
oo:contact http://id.southampton.ac.uk/equipment/E10425#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10425#primary_contact
 
http://id.southampton.ac.uk/equipment/E10434
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Radio Frequency Test Kit"^^xsd:string
skos:notation "E10434"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10434#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10434#primary_contact
 
http://id.southampton.ac.uk/equipment/E10435
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Impedance Analyser"^^xsd:string
skos:notation "E10435"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10435#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10435#primary_contact
 
http://id.southampton.ac.uk/equipment/E10436
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Plasma System"^^xsd:string
skos:notation "E10436"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10436#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10436#primary_contact
 
http://id.southampton.ac.uk/equipment/E10438
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Gis System For Orion Microscope"^^xsd:string
dcterms:description "Gis System For Orion Microscope"^^xsd:string
skos:notation "E10438"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Gis System For Orion Microscope"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10438#secondary_contact
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
dc:description "Gis System For Orion Microscope"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10438#primary_contact
 
http://id.southampton.ac.uk/equipment/E10442
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Tube Furnace Pumps"^^xsd:string
skos:notation "E10442"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10442#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10442#primary_contact
 
http://id.southampton.ac.uk/equipment/E10443
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "4 Tube Furnace"^^xsd:string
skos:notation "E10443"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10443#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10443#primary_contact
 
http://id.southampton.ac.uk/equipment/E10446
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Quantum Efficiency System"^^xsd:string
skos:notation "E10446"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10446#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10446#primary_contact
 
http://id.southampton.ac.uk/equipment/E10448
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Quartz System"^^xsd:string
skos:notation "E10448"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10448#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10448#primary_contact
 
http://id.southampton.ac.uk/equipment/E10449
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Software Expansion Pack For E-Beam"^^xsd:string
skos:notation "E10449"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10449#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/ebeamLithography.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10449#primary_contact
 
http://id.southampton.ac.uk/equipment/E10450
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Solar Simulator"^^xsd:string
dcterms:description "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m?) depends on the size of the desired output beam, the lamp?s power input and the layout of the simulator?s optic. The spectral characteristics are always the same."^^xsd:string
skos:notation "E10450"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m?) depends on the size of the desired output beam, the lamp?s power input and the layout of the simulator?s optic. The spectral characteristics are always the same."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10450#secondary_contact
dc:description "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m?) depends on the size of the desired output beam, the lamp?s power input and the layout of the simulator?s optic. The spectral characteristics are always the same."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10450#primary_contact
 
http://id.southampton.ac.uk/equipment/E10451
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "550 Degree Table"^^xsd:string
skos:notation "E10451"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10451#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10451#primary_contact
 
http://id.southampton.ac.uk/equipment/E10452
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Etching System"^^xsd:string
skos:notation "E10452"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10452#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10452#primary_contact
 
http://id.southampton.ac.uk/equipment/E10453
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Orion Performance Upgrade Package"^^xsd:string
skos:notation "E10453"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10453#secondary_contact
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10453#primary_contact
 
http://id.southampton.ac.uk/equipment/E10454
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Orion Variable Accelerating Voltage Package"^^xsd:string
skos:notation "E10454"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10454#secondary_contact
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10454#primary_contact
 
http://id.southampton.ac.uk/equipment/E10455
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Orion Liquid Nitrogen Cooling Dewar System"^^xsd:string
skos:notation "E10455"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10455#secondary_contact
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10455#primary_contact
 
http://id.southampton.ac.uk/equipment/E10456
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Gas Cabinet"^^xsd:string
skos:notation "E10456"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10456#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10456#primary_contact
 
http://id.southampton.ac.uk/equipment/E10458
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Ccd Camera"^^xsd:string
skos:notation "E10458"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10458#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10458#primary_contact
 
http://id.southampton.ac.uk/equipment/E10459
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Semiconductor Analyser"^^xsd:string
skos:notation "E10459"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10459#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10459#primary_contact
 
http://id.southampton.ac.uk/equipment/E10464
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Laser Lithography System"^^xsd:string
skos:notation "E10464"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10464#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/ebeamLithography.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10464#primary_contact
 
http://id.southampton.ac.uk/equipment/E10465
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Cryogenic Probe Station"^^xsd:string
skos:notation "E10465"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10465#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/magnetoResistance.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10465#primary_contact
 
http://id.southampton.ac.uk/equipment/E10466
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Spin Coater"^^xsd:string
skos:notation "E10466"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10466#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10466#primary_contact
 
http://id.southampton.ac.uk/equipment/E10467
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Spectrograph"^^xsd:string
skos:notation "E10467"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10467#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10467#primary_contact
 
http://id.southampton.ac.uk/equipment/E10468
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "2 Sawatec Hotplates"^^xsd:string
skos:notation "E10468"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10468#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10468#primary_contact
 
http://id.southampton.ac.uk/equipment/E10469
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Vitesse Duo"^^xsd:string
dcterms:description "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."^^xsd:string
skos:notation "E10469"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10469#secondary_contact
dc:description "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10469#primary_contact
 
http://id.southampton.ac.uk/equipment/E10471
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Dry Bed Absorber System"^^xsd:string
skos:notation "E10471"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10471#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10471#primary_contact
 
http://id.southampton.ac.uk/equipment/E10472
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Zeiss EVO Scanning Electron Microscope"^^xsd:string
dcterms:description "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."^^xsd:string
skos:notation "E10472"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10472#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
dc:description "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10472#primary_contact
 
http://id.southampton.ac.uk/equipment/E10473
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Elemental Analysis: O-Orion-Rbs"^^xsd:string
skos:notation "E10473"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10473#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10473#primary_contact
 
http://id.southampton.ac.uk/equipment/E10474
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Clear View: O-Orion-Clearview"^^xsd:string
skos:notation "E10474"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10474#secondary_contact
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10474#primary_contact
 
http://id.southampton.ac.uk/equipment/E10475
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Gatan X-ray Ultramicroscope (XuM) (accessory for the EVO SEM LS25 microscope)"^^xsd:string
dcterms:description "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."^^xsd:string
skos:notation "E10475"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10475#secondary_contact
dc:description "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10475#primary_contact
 
http://id.southampton.ac.uk/equipment/E10476
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Monocl3"^^xsd:string
skos:notation "E10476"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10476#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10476#primary_contact
 
http://id.southampton.ac.uk/equipment/E10477
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Pattern Generator"^^xsd:string
skos:notation "E10477"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10477#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/nanofabrication.php
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10477#primary_contact
 
http://id.southampton.ac.uk/equipment/E10478
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Analysers/Generator - 3 Items Each Over #25K"^^xsd:string
skos:notation "E10478"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10478#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10478#primary_contact
 
http://id.southampton.ac.uk/equipment/E10486
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Electronic Magnet (De Groot)"^^xsd:string
skos:notation "E10486"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10486#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10486#primary_contact
 
http://id.southampton.ac.uk/equipment/E10488
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Biolight 1000"^^xsd:string
skos:notation "E10488"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10488#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10488#primary_contact
 
http://id.southampton.ac.uk/equipment/E10489
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Ex Demo V-570Pc Spectrophotometer System"^^xsd:string
dcterms:description "UV/VIS/Near IR spectrophotometer used for Absorption, Transmission and Reflectance measurments from 190 - 2500nm"^^xsd:string
skos:notation "E10489"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "UV/VIS/Near IR spectrophotometer used for Absorption, Transmission and Reflectance measurments from 190 - 2500nm"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10489#secondary_contact
dc:description "UV/VIS/Near IR spectrophotometer used for Absorption, Transmission and Reflectance measurments from 190 - 2500nm"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10489#primary_contact
 
http://id.southampton.ac.uk/equipment/E10491
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Bridgeport Model Vmc 800X Vertical Machining Centre"^^xsd:string
skos:notation "E10491"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10491#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10491#primary_contact
 
http://id.southampton.ac.uk/equipment/E10492
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Coherent Enterprise II 653 Ar Ion Laser"^^xsd:string
dcterms:description "Ar Ion laser (352nm and 364nm). 80mW laser power class 3B. Mounted to direct write lithography system. Local ID: PH/1895"^^xsd:string
skos:notation "E10492"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "Ar Ion laser (352nm and 364nm). 80mW laser power class 3B. Mounted to direct write lithography system. Local ID: PH/1895"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10492#secondary_contact
dc:description "Ar Ion laser (352nm and 364nm). 80mW laser power class 3B. Mounted to direct write lithography system. Local ID: PH/1895"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10492#primary_contact
 
http://id.southampton.ac.uk/equipment/E10495
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "CCD Sensor (S/N 01412-01-01)?Part of the FRODOSpec for the Liverpool Telescope in the Canary Islands"^^xsd:string
dcterms:description "off campus"^^xsd:string
skos:notation "E10495"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/NA
rdfs:comment "off campus"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10495#secondary_contact
dc:description "off campus"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10495#primary_contact
 
http://id.southampton.ac.uk/equipment/E10496
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Red Optics And Lens Mounts ? Part of the FRODOSpec for the Liverpool Telescope in the Canary Islands"^^xsd:string
dcterms:description "off campus"^^xsd:string
skos:notation "E10496"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/NA
rdfs:comment "off campus"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10496#secondary_contact
dc:description "off campus"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10496#primary_contact
 
http://id.southampton.ac.uk/equipment/E10500
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Beamlock 7W VIS/ UV Argon System Etc"^^xsd:string
dcterms:description "Build into a confocal optical microscope"^^xsd:string
skos:notation "E10500"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "Build into a confocal optical microscope"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10500#secondary_contact
dc:description "Build into a confocal optical microscope"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10500#primary_contact
 
http://id.southampton.ac.uk/equipment/E10501
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Lasers - Verdi V10␣␣/ OPA 9400"^^xsd:string
skos:notation "E10501"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10501#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10501#primary_contact
 
http://id.southampton.ac.uk/equipment/E10502
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Lasers - Verdi V5 / Mira 900F"^^xsd:string
skos:notation "E10502"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10502#secondary_contact
foaf:page http://www.orc.soton.ac.uk/xray.html
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10502#primary_contact
 
http://id.southampton.ac.uk/equipment/E10505
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Recirculating Water Chiller for Beamlock 7W UV Argon System (E10500)"^^xsd:string
dcterms:description "Provides cooling water for Beamlock 7W Argon Laser E10500"^^xsd:string
skos:notation "E10505"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "Provides cooling water for Beamlock 7W Argon Laser E10500"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10505#secondary_contact
dc:description "Provides cooling water for Beamlock 7W Argon Laser E10500"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10505#primary_contact
 
http://id.southampton.ac.uk/equipment/E10506
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Streak Camera System"^^xsd:string
skos:notation "E10506"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10506#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10506#primary_contact
 
http://id.southampton.ac.uk/equipment/E10507
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Femtotrain & Compressor"^^xsd:string
skos:notation "E10507"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10507#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10507#primary_contact
 
http://id.southampton.ac.uk/equipment/E10508
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Mass Spectrometer"^^xsd:string
skos:notation "E10508"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10508#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10508#primary_contact
 
http://id.southampton.ac.uk/equipment/E10509
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Mbr System Laser"^^xsd:string
skos:notation "E10509"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10509#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10509#primary_contact
 
http://id.southampton.ac.uk/equipment/E10510
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Sapphire Laser Upgrade"^^xsd:string
skos:notation "E10510"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/NA
oo:contact http://id.southampton.ac.uk/equipment/E10510#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10510#primary_contact
 
http://id.southampton.ac.uk/equipment/E10511
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Grazing Incidence Vuv Spectrometer / Interface For Reading Images"^^xsd:string
skos:notation "E10511"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
oo:contact http://id.southampton.ac.uk/equipment/E10511#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10511#primary_contact
 
http://id.southampton.ac.uk/equipment/E10512
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Leo 1455VP Scanning Electron Microscope (SEM)"^^xsd:string
dcterms:description "A 30KV, LaB6(or tungsten filament) scanning electron microscope equipped with an Everhart-Thornley secondary electron detector and a cambridge four quadrant backscatter detector.␣␣Maximum resolution is 10nm depending on column conditions."^^xsd:string
skos:notation "E10512"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
rdfs:comment "A 30KV, LaB6(or tungsten filament) scanning electron microscope equipped with an Everhart-Thornley secondary electron detector and a cambridge four quadrant backscatter detector.␣␣Maximum resolution is 10nm depending on column conditions."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10512#secondary_contact
dc:description "A 30KV, LaB6(or tungsten filament) scanning electron microscope equipped with an Everhart-Thornley secondary electron detector and a cambridge four quadrant backscatter detector.␣␣Maximum resolution is 10nm depending on column conditions."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10512#primary_contact
 
http://id.southampton.ac.uk/equipment/E10613
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "EVG501 Semi-Automated Lamination Machine"^^xsd:string
skos:notation "E10613"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
oo:contact http://id.southampton.ac.uk/equipment/E10613#secondary_contact
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10613#primary_contact
 
http://id.southampton.ac.uk/equipment/E10614
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "EVG620 Double Side Mask Aligner"^^xsd:string
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."^^xsd:string
skos:notation "E10614"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10614#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10614#primary_contact
 
http://id.southampton.ac.uk/equipment/E10615
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "EVG150 Automated Resist Processing System"^^xsd:string
dcterms:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."^^xsd:string
skos:notation "E10615"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10615#secondary_contact
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
dc:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10615#primary_contact
 
http://id.southampton.ac.uk/equipment/E10617
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "3 Stacis "Quiet Island" Support Systems"^^xsd:string
dcterms:description "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."^^xsd:string
skos:notation "E10617"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10617#secondary_contact
dc:description "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10617#primary_contact
 
http://id.southampton.ac.uk/equipment/E10712
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Theta Probe Angle-Resolved X-ray Photoelectron Spectrometer (ARXPS) System"^^xsd:string
dcterms:description "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."^^xsd:string
skos:notation "E10712"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10712#secondary_contact
dc:description "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10712#primary_contact
 
http://id.southampton.ac.uk/equipment/E10758
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD)"^^xsd:string
dcterms:description "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."^^xsd:string
skos:notation "E10758"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
rdfs:comment "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10758#secondary_contact
dc:description "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/FP, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10758#primary_contact
 
http://id.southampton.ac.uk/equipment/E10865
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
rdf:type oo:Equipment
rdfs:label "CCD Sensor (S/N 01502-22-02)?Part of the FRODOSpec for the Liverpool Telescope in the Canary Islands"^^xsd:string
dcterms:description "off campus"^^xsd:string
skos:notation "E10865"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/NA
rdfs:comment "off campus"^^xsd:string
oo:contact http://id.southampton.ac.uk/equipment/E10865#secondary_contact
dc:description "off campus"^^xsd:string
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/WF, http://id.southampton.ac.uk/org/F7
oo:primaryContact http://id.southampton.ac.uk/equipment/E10865#primary_contact