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skos:notation "E10260"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."
rdfs:comment "The HELIOS sputtering tool is a flexible platform for fast, precise and fully automated thin film coatings. It specializes in high quality optical coatings featuring very low absorption and scattering. Optical performance is ensured by the extremely dense, smooth, stoichiometric, and amorphous layers. Precision in layer growth control is facilitated by an optical monitoring system for in-situ on-substrate measurements."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10260#primary_contact
rdfs:label "Helios Sputtering System Type Xl 6""
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10260-200629-P1010245.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10260-200629-P1010244.jpg
 
http://id.southampton.ac.uk/equipment/E10265
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10265#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."
skos:notation "E10265"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."
rdfs:comment "Sub 100nm spatial resolution imagaing of distribution elements in a sample. Spatial location of lements in an alloy, imaging of contacts under metal, semiconductor metal failure analysis, analysis of layered structures."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10265#primary_contact
rdfs:label "Fluoresence System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10265-200781-P1010272.jpg
 
http://id.southampton.ac.uk/equipment/E10407
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10407#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10407"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10407#primary_contact
rdfs:label "XY Stage / 1m␣␣Stage / Frame / Rack"
 
http://id.southampton.ac.uk/equipment/E10436
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10436#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10436"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10436#primary_contact
rdfs:label "Plasma System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10436-200854-P1000886.jpg
 
http://id.southampton.ac.uk/equipment/E10268
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10268#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."
skos:notation "E10268"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."
rdfs:comment "Cleaner/lift-off/stripper module/developer module. 4,6,8 inch wafers, 5.6.7 inch plates."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10268#primary_contact
rdfs:label "Optiwet St30"
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10268-200649-P1000831.jpg
 
http://id.southampton.ac.uk/equipment/E10267
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10267#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."
skos:notation "E10267"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."
rdfs:comment "Resistance evaporation source for filament or boat evaporation. A built-in shield prevents unwanted coating of the vacuum chamber and adjacent deposition accessories. Four position turret evaporation source capable of sequentially depositing up to 4 different materials without breaking vacuum. Sources are selected and rotated into the evaporation position using a simple handwheel control. The sources can be configured to evaporate from the center or the side of the vacuum chamber for optimum film thickness uniformity onto a choice of static or rotating substrate fixtures."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10267#primary_contact
rdfs:label "Auto 306 Resistance Evaporation System"
 
http://id.southampton.ac.uk/equipment/E10270
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10270#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/59
dcterms:description "Rapid prototyping machine, build resolution x-axis 600dpi/42um, y-axis 600dpi/42um, z-axis 1600dpi/16um, build size XxYxZ) 342 x 342 x 200mm, input formats STL, IPT, IAM, SLC and objDF files. Two resin setup VeroWhite (hard) and VeroBlack (soft), capable of producing parts of any hardness level by mixing both resins."
skos:notation "E10270"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Rapid prototyping machine, build resolution x-axis 600dpi/42um, y-axis 600dpi/42um, z-axis 1600dpi/16um, build size XxYxZ) 342 x 342 x 200mm, input formats STL, IPT, IAM, SLC and objDF files. Two resin setup VeroWhite (hard) and VeroBlack (soft), capable of producing parts of any hardness level by mixing both resins."
rdfs:comment "Rapid prototyping machine, build resolution x-axis 600dpi/42um, y-axis 600dpi/42um, z-axis 1600dpi/16um, build size XxYxZ) 342 x 342 x 200mm, input formats STL, IPT, IAM, SLC and objDF files. Two resin setup VeroWhite (hard) and VeroBlack (soft), capable of producing parts of any hardness level by mixing both resins."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10270#primary_contact
rdfs:label "Rapid Prototyping System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10270-200842-P1010212.jpg
 
http://id.southampton.ac.uk/equipment/E10435
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10435#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10435"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10435#primary_contact
rdfs:label "Impedance Analyser"
 
http://id.southampton.ac.uk/equipment/E10258
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10258#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."
skos:notation "E10258"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."
rdfs:comment "The Zeiss Orion helium ion microscope has similar functionality to an electron microscope, but uses a focussed beam of helium ions in place of the electrons. The larger mass and therefore smaller de Broglie wavelength of helium ions compared to electrons means that the scanning helium ions microscope suffers less from diffraction effects than a scanning electron microscope (SEM). Since helium ions can be focused into a smaller probe size and provide a much smaller sample interaction compared to electrons, the Orion generates higher resolution images with better material contrast and 5 times improved depth of focus. The high resolution arises from the use of a finely sharpened needle and a process that strips individual atoms away from the source until an atomic pyramid is created with just three atoms at the very end of the source tip. The Orion achieves a resolution of less than 0.9nm at an energy of 25-30kV and can deliver beam currents between 1fA and 25pA."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10258#primary_contact
rdfs:label "He Ion Microscope: Orion-Bu"
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
 
http://id.southampton.ac.uk/equipment/E10467
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10467#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10467"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10467#primary_contact
rdfs:label "Spectrograph"
 
http://id.southampton.ac.uk/equipment/E10408
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10408#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10408"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10408#primary_contact
rdfs:label "AQ317 Spectrum Analyser (purchased in 1999)"
 
http://id.southampton.ac.uk/equipment/E10712
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10712#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."
skos:notation "E10712"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."
rdfs:comment "The Theta Probe X-ray Photoelectron Spectromer (XPS) allows the collection of angle-resolved spectra without the need to tilt the sample to nondestructively characterize ultra-thin layers."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10712#primary_contact
rdfs:label "Theta Probe Angle-Resolved X-ray Photoelectron Spectrometer (ARXPS) System"
 
http://id.southampton.ac.uk/equipment/E10451
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10451#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10451"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10451#primary_contact
rdfs:label "550 Degree Table"
 
http://id.southampton.ac.uk/equipment/E10261
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10261#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"
skos:notation "E10261"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"
rdfs:comment "High resolution FEG-SEM for sub 100nm imaging. Magnification x100 to x1000000"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10261#primary_contact
rdfs:label "Field Emmission Scanning Electron Microscope (FEG-SEM)"
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10261-200628-P1010270.jpg
 
http://id.southampton.ac.uk/equipment/E10263
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10263#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"
skos:notation "E10263"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"
rdfs:comment " LAB700 e-gun evaporator incorporates 2e-guns each with a 5xcrucible plate. is configured for reactive ion assisted deposition of dielectrics, high precision lift off, variable angle deposition, cryogenic deposition"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10263#primary_contact
rdfs:label "Evaporator Gun"
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
 
http://id.southampton.ac.uk/equipment/E10404
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10404#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10404"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10404#primary_contact
rdfs:label "Lightwave Polarization Analyser"
 
http://id.southampton.ac.uk/equipment/E10237
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10237#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "The MultiView 4000 is a multi scanning probe system with an open platform for integration with a Raman spectrometer. The system is configured for dual probes set-up that allows multiple probe SNOM measurement and other SPM imaging. The system is also configured for optical waveguide device characterisation."
skos:notation "E10237"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The MultiView 4000 is a multi scanning probe system with an open platform for integration with a Raman spectrometer. The system is configured for dual probes set-up that allows multiple probe SNOM measurement and other SPM imaging. The system is also configured for optical waveguide device characterisation."
rdfs:comment "The MultiView 4000 is a multi scanning probe system with an open platform for integration with a Raman spectrometer. The system is configured for dual probes set-up that allows multiple probe SNOM measurement and other SPM imaging. The system is also configured for optical waveguide device characterisation."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10237#primary_contact
rdfs:label "Nanonics Hydra SPM/SNOM System (Multiprobe System)"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
 
http://id.southampton.ac.uk/equipment/E10393
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10393#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "Lyncée Tec¿s DHM T1000 series is composed of the only transmission configured optical profilers on the market. Based on Digital Holographic Microscopy technology, its contactless full-field 3D optical topography performed at video rate makes it an ideal tool for quantitative dynamic and static measurements."
skos:notation "E10393"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Lyncée Tec¿s DHM T1000 series is composed of the only transmission configured optical profilers on the market. Based on Digital Holographic Microscopy technology, its contactless full-field 3D optical topography performed at video rate makes it an ideal tool for quantitative dynamic and static measurements."
rdfs:comment "Lyncée Tec¿s DHM T1000 series is composed of the only transmission configured optical profilers on the market. Based on Digital Holographic Microscopy technology, its contactless full-field 3D optical topography performed at video rate makes it an ideal tool for quantitative dynamic and static measurements."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10393#primary_contact
rdfs:label "Transmission Microscope (DHM)"
foaf:page http://www.southampton-nanofab.com/characterisation/nanometrology.php
 
http://id.southampton.ac.uk/equipment/E10398
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10398#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10398"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10398#primary_contact
rdfs:label "Nikon Microscope system"
 
http://id.southampton.ac.uk/equipment/E10419
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10419#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "Control box for Coherent RegA, used for optimising cavity injection and ejection timings"
skos:notation "E10419"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Control box for Coherent RegA, used for optimising cavity injection and ejection timings"
rdfs:comment "Control box for Coherent RegA, used for optimising cavity injection and ejection timings"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10419#primary_contact
rdfs:label "Coherent RegA 9000 Controller"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10419-200243-P1000683.jpg
 
http://id.southampton.ac.uk/equipment/E10272
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10272#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"
skos:notation "E10272"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"
rdfs:comment "Upright 8" yellow room microscope, 5M camera, 5x to 150x objectives, Nomarski"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10272#primary_contact
rdfs:label "Nikon L200D microscope"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10272-200636-P1000825.jpg
 
http://id.southampton.ac.uk/equipment/E10255
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10255#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/17
dcterms:description "BAK600 e-gun/thermal evaporator is configured for non-reactive deposition of metal contact stacks , metal masking layers, some dielectrics, ITO."
skos:notation "E10255"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "BAK600 e-gun/thermal evaporator is configured for non-reactive deposition of metal contact stacks , metal masking layers, some dielectrics, ITO."
rdfs:comment "BAK600 e-gun/thermal evaporator is configured for non-reactive deposition of metal contact stacks , metal masking layers, some dielectrics, ITO."
oo:organizationPart http://id.southampton.ac.uk/org/BX, http://id.southampton.ac.uk/org/F2
oo:primaryContact http://id.southampton.ac.uk/equipment/E10255#primary_contact
rdfs:label "Coolpower 4.2Gm Two Stge Systems (Obsolete/Decommissioned YE 15/16 - per YY 04/08/2016)"
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
 
http://id.southampton.ac.uk/equipment/E10434
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10434#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10434"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10434#primary_contact
rdfs:label "Radio Frequency Test Kit"
 
http://id.southampton.ac.uk/equipment/E10241
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10241#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."
skos:notation "E10241"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."
rdfs:comment "The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10241#primary_contact
rdfs:label "Plasmalab 80 Plus Rie Etcher"
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
 
http://id.southampton.ac.uk/equipment/E10240
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10240#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."
skos:notation "E10240"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."
rdfs:comment "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP06 RIE80+ system is configured for multimaterial etching like silica, silicon nitride, polymer, III-V based, semiconductor-metal, polysilicon and amorphous silicon."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10240#primary_contact
rdfs:label "Opt System 100 Metal Etcher"
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10240-200640-P1000881.jpg
 
http://id.southampton.ac.uk/equipment/E10244
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10244#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.  Exposure can be performed in hard, soft and proximity modes."
skos:notation "E10244"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.  Exposure can be performed in hard, soft and proximity modes."
rdfs:comment "The EVG 620 provides high precision manual alignment on wafers. This is the main maks aligner of the cleanroom and can handle wafer sizes up to 150mm.  Exposure can be performed in hard, soft and proximity modes."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10244#primary_contact
rdfs:label "EVG620 Top Side Mask Aligner"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10244-200660-P1000830.jpg
 
http://id.southampton.ac.uk/equipment/E10284
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10284#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."
skos:notation "E10284"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."
rdfs:comment "150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10284#primary_contact
rdfs:label "Tempress Clean Furnace Stack"
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
 
http://id.southampton.ac.uk/equipment/E10276
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10276#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."
skos:notation "E10276"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."
rdfs:comment "Parallel angle-resolved XPS (PARXPS) analysis without sample tilting, ability to collect angle-resolved XPS spectra over a 60 degree angular range, in parallel, without tilting the sample and allows the instrument to characterise ultra-thin films non-destructively, allows composition depth profiling using an integrated etching module, X-ray monochrmator with user-selectable spot size in the range 15um to 400um,. Ability to handle large or multiple samples, CCD sample alignment microscope perpendicular to the sample surface."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10276#primary_contact
rdfs:label "Theta probe PARXPS system"
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
 
http://id.southampton.ac.uk/equipment/E10425
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10425#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/85
skos:notation "E10425"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10425#primary_contact
rdfs:label "Alpha-At Analyzer"
 
http://id.southampton.ac.uk/equipment/E10438
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10438#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Gis System For Orion Microscope"
skos:notation "E10438"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Gis System For Orion Microscope"
rdfs:comment "Gis System For Orion Microscope"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10438#primary_contact
rdfs:label "Gis System For Orion Microscope"
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
 
http://id.southampton.ac.uk/equipment/E10418
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10418#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "10W solid state Coherent Verdi-10, continuous wave pump laser, used for pumping Mira 900"
skos:notation "E10418"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "10W solid state Coherent Verdi-10, continuous wave pump laser, used for pumping Mira 900"
rdfs:comment "10W solid state Coherent Verdi-10, continuous wave pump laser, used for pumping Mira 900"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10418#primary_contact
rdfs:label "Verdi 10 W solid state Laser System"
 
http://id.southampton.ac.uk/equipment/E10243
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10243#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."
skos:notation "E10243"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."
rdfs:comment "Ionfab300Plus is a modular System designed for ion beam etching. It is used in a wide variety of processes, particularly in the Semiconductor and Optical Coating Industries."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10243#primary_contact
rdfs:label "Ionfab 300 Plus"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10243-200638-P1000883.jpg
 
http://id.southampton.ac.uk/equipment/E10249
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10249#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."
skos:notation "E10249"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."
rdfs:comment "The focussed ion beam (FIB) is a multi nanofabrication tool system capable of performing sophisticated nanomachining, in-situ metal or insulator deposition, lithography and metrology analysis. This versatile system is based on the dual ion and electron beams column concept, which allows it to perform ionic nanofabrication function while imaging using the scanning electron microscope. The liquid metal ion source (LMIS) for the system is gallium and it is integrated to an ionisation tungsten tip to produce a fine and high resolution ion beam. The additional features in the FIB are ion and electron beam induced deposition using gaseous metal-insulator sources."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10249#primary_contact
rdfs:label "Nvision 40 Fib"
foaf:page http://www.southampton-nanofab.com/characterisation/fib.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10249-200622-P1000853.jpg
 
http://id.southampton.ac.uk/equipment/E10396
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10396#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10396"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10396#primary_contact
rdfs:label "MM_Wave System"
 
http://id.southampton.ac.uk/equipment/E10235
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10235#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."
skos:notation "E10235"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."
rdfs:comment "The Caliber is a versatile and high performance SPM system designed for multifunctional and routine microscopy of surface topology, polymer, biomaterials and semiconductor materials. The compact design and user friendly interface make it a suitable educational tool as well as for research activity."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10235#primary_contact
rdfs:label "Caliber Spm System"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10235-200778-P1010259.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10235-200778-P1010261.jpg
 
http://id.southampton.ac.uk/equipment/E10251
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10251#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.     Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.     ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."
skos:notation "E10251"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.     Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.     ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."
rdfs:comment "The FlexAl system allows the deposition of ultra-thin layers (typically a few nm) of a variety of metal oxides and nitrides from liquid precursors. The deposition process works by providing a short pulse of precursor, followed by purge and exhaust steps. This cycle is then repeated to build up a layer.     Typical growth rates are around 1A/cycle. The system is currently configured for the deposition of ZnO and Al2O3.     ZnO is deposited using a DEZ precursor. The deposition rate is typically 1A/cycle at 150C. The refractive index of ALD ZnO varies from 1.75 at low temperature to 1.83 at high temperaure, compared with 1.985 for bulk ZnO. Annealing at 425C (not optimised) can help improve electrical properties."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10251#primary_contact
rdfs:label "Atomic layer deposition system"
foaf:page http://www.southampton-nanofab.com/fabrication/ald.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10251-200637-P1000872.jpg
 
http://id.southampton.ac.uk/equipment/E10273
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10273#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"
skos:notation "E10273"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"
rdfs:comment "Upright 6" bioMEMS microscope, 5m camera, display & software, 5x to 150x objectives, Nomarski"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10273#primary_contact
rdfs:label "Nikon LV100D Bioelectronics microscope"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10273-200635-P1010293.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10273-200635-P1010294.jpg
 
http://id.southampton.ac.uk/equipment/E10239
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10239#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor   Substrate electrode: 170 or 240 mm   Shower head gas inlet optimised for RIE   High conductance vacuum layout   Gases: CHF3, Ar, O2, SF6, CF4, N2"
skos:notation "E10239"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor   Substrate electrode: 170 or 240 mm   Shower head gas inlet optimised for RIE   High conductance vacuum layout   Gases: CHF3, Ar, O2, SF6, CF4, N2"
rdfs:comment "The etch mechanism of RIE is achieved by using the reactive gas plasma generated by strong RF source (13.56 MHz) to chemically ion etch the material of the samples. Depending on the process recipe, the material⿿s etched profile can achieve high anisotropy. The DP01 RIE80+ system is configured for etching of polysilicon, amorphous silicon, silica, silicon nitride and polymer. 13.56 MHz driven parallel plate reactor   Substrate electrode: 170 or 240 mm   Shower head gas inlet optimised for RIE   High conductance vacuum layout   Gases: CHF3, Ar, O2, SF6, CF4, N2"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10239#primary_contact
rdfs:label "Opt System 100 Oxide Etcher"
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10239-200641-P1000882.jpg
 
http://id.southampton.ac.uk/equipment/E10274
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10274#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"
skos:notation "E10274"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"
rdfs:comment "Cascade Microtech prober, 4 x DCM 210 positioners, Agilent 4155C Semiconductor Parameter Analyser, Agilent 4279A 1MHz CV meter, Agilent E4443A sHz-6.7GHz spectrum analyser, Agilent MXG N5181A analog signal generator 250 KHz-1 GHz"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10274#primary_contact
rdfs:label "DC Device Multi Probe Station"
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
 
http://id.southampton.ac.uk/equipment/E10508
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10508#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10508"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10508#primary_contact
rdfs:label "Mass Spectrometer"
 
http://id.southampton.ac.uk/equipment/E10253
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10253#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning."
skos:notation "E10253"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning."
rdfs:comment "Plasma Enhanced Chemical Vapour Deposition (PECVD) system for the growth of amorphous and polycrystalline Si, SiGe and Ge layers.     The layers can be doped during growth either n-type (using PH3) or p-type (using B2H6), thereby allowing p-n junctions to be formed.     Amorphous silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically 250C, giving a growth rate of around 25 nm/min. Stress in the deposited layer is typically <200Mpa.     Polycrystalline silicon uses SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically >=610C. The growth rate at 610C is ~2 nm/min and at 650C ~ 20nm/min.     Microcrystalline silicon uses  SiH4 for the source of silicon and CF4 & O2 for cleaning. The growth temperature is typically in the range 585 - 610C, giving growth rates in the range 1 - 2 nm/min.     Amorphous and polycrystalline germanium use GeH4 as a source of  Ge and CF4 & O2 for cleaning."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10253#primary_contact
rdfs:label "Opt System 100 Pecvd"
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10253-200642-P1000871.jpg
 
http://id.southampton.ac.uk/equipment/E10510
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10510#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/NA
skos:notation "E10510"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10510#primary_contact
rdfs:label "Sapphire Laser Upgrade"
 
http://id.southampton.ac.uk/equipment/E10245
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10245#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
skos:notation "E10245"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10245#primary_contact
rdfs:label "EVG620 Double Side Mask Aligner"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
 
http://id.southampton.ac.uk/equipment/E10246
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10246#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
skos:notation "E10246"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers. The EVG620 superior alignment stage design achieves highly accurate alignment and exposure results while maintaining high throughput."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10246#primary_contact
rdfs:label "Evg620 Double Side Mask Aligner"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10246-200526-P1000829.jpg
 
http://id.southampton.ac.uk/equipment/E10417
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10417#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "Control box for Mira 900F, used for mode locking and monitoring of output power"
skos:notation "E10417"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Control box for Mira 900F, used for mode locking and monitoring of output power"
rdfs:comment "Control box for Mira 900F, used for mode locking and monitoring of output power"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10417#primary_contact
rdfs:label "Mira 900F V10 XW Opt 220 Control Box"
 
http://id.southampton.ac.uk/equipment/E10509
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10509#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10509"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10509#primary_contact
rdfs:label "Mbr System Laser"
 
http://id.southampton.ac.uk/equipment/E10275
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10275#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"
skos:notation "E10275"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"
rdfs:comment "Semi-automatic 200mm probe station with micro-chamber, temperature control -65-200C. 4x67GHz infinity probes, eVue digital imaging system"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10275#primary_contact
rdfs:label "Summit 12000B-Ap Probe Station Platform"
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
 
http://id.southampton.ac.uk/equipment/E10506
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10506#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10506"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10506#primary_contact
rdfs:label "Streak Camera System"
 
http://id.southampton.ac.uk/equipment/E10613
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10613#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10613"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10613#primary_contact
rdfs:label "EVG501 Semi-Automated Lamination Machine"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10613-200662-P1010308.jpg
 
http://id.southampton.ac.uk/equipment/E10421
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10421#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10421"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10421#primary_contact
rdfs:label "1000x Direct Diode Laser Serial No. 330739 (purchased in 2003)"
 
http://id.southampton.ac.uk/equipment/E10344
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10344#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10344"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10344#primary_contact
rdfs:label "Optical Component Characterization System"
foaf:page http://www.southampton-nanofab.com/characterisation/
 
http://id.southampton.ac.uk/equipment/E10343
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10343#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "The QDI 302 Microscope Spectrophotometer is designed to add spectroscopy and imaging to your optical microscope. It can also be used to upgrade a legacy microspectrometer or to add spectroscopic and film thickness capabilities to a probe station. The QDI 302 attaches to the microscope, microspectrometer or probe station and enables you to collect transmission, reflectance, polarization or even fluorescence spectra of microscopic samples. Depending upon the microscope optics and sources, the spectral range is from the deep UV to the near infrared region. With the QDI 302, high quality spectra of even sub-micron samples can be acquired non-destructively and with ease."
skos:notation "E10343"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The QDI 302 Microscope Spectrophotometer is designed to add spectroscopy and imaging to your optical microscope. It can also be used to upgrade a legacy microspectrometer or to add spectroscopic and film thickness capabilities to a probe station. The QDI 302 attaches to the microscope, microspectrometer or probe station and enables you to collect transmission, reflectance, polarization or even fluorescence spectra of microscopic samples. Depending upon the microscope optics and sources, the spectral range is from the deep UV to the near infrared region. With the QDI 302, high quality spectra of even sub-micron samples can be acquired non-destructively and with ease."
rdfs:comment "The QDI 302 Microscope Spectrophotometer is designed to add spectroscopy and imaging to your optical microscope. It can also be used to upgrade a legacy microspectrometer or to add spectroscopic and film thickness capabilities to a probe station. The QDI 302 attaches to the microscope, microspectrometer or probe station and enables you to collect transmission, reflectance, polarization or even fluorescence spectra of microscopic samples. Depending upon the microscope optics and sources, the spectral range is from the deep UV to the near infrared region. With the QDI 302, high quality spectra of even sub-micron samples can be acquired non-destructively and with ease."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10343#primary_contact
rdfs:label "Microspectrometer System (QDI 302 UV)"
 
http://id.southampton.ac.uk/equipment/E10304
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10304#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."
skos:notation "E10304"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."
rdfs:comment "Desposition vaporator system. Evaporates commonly used metals (such as aluminum, chromium, silver, gold and many others)."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/GN
oo:primaryContact http://id.southampton.ac.uk/equipment/E10304#primary_contact
rdfs:label "Auto 306 Resistance Evaporation System"
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10304-200460-P1010202.jpg
 
http://id.southampton.ac.uk/equipment/E10294
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10294#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "Femtosecond optical charecterisation system, coherent laser, CCD camera & optics."
skos:notation "E10294"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Femtosecond optical charecterisation system, coherent laser, CCD camera & optics."
rdfs:comment "Femtosecond optical charecterisation system, coherent laser, CCD camera & optics."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10294#primary_contact
rdfs:label "Femtosecond Laser System"
foaf:page http://www.southampton-nanofab.com/characterisation/electricalAndRf.php
 
http://id.southampton.ac.uk/equipment/E10289
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10289#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"
skos:notation "E10289"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"
rdfs:comment "Wafer scribing tool, Vanadium Fibre Laser (1064nm wavelength, 0.25mJ pulse energy, 25um spot size), up to 5000 mm/s scanning speed, programmable z-axis, 245 lens upgrade allowing 220mm diameter field size, vision system for lase focusiing"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10289#primary_contact
rdfs:label "Vanadium Fibre Laser"
foaf:page http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10289-200844-P1000874.jpg
 
http://id.southampton.ac.uk/equipment/E10293
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10293#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."
skos:notation "E10293"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."
rdfs:comment "Particle measurement tool, 150mm substrates, sub micron particles down to 0.2um, measurement time 30 sec on 6" wafers, particles sensitivity 0.2um diameter latex spheres, haze sensitivity 0.4ppm, spatial resolution 50um spacing minimum, measurement range 0.004um and 102um in twelve ranges and 256 gradations."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10293#primary_contact
rdfs:label "Measurement system"
foaf:page http://www.southampton-nanofab.com/characterisation/
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10293-200901-P1010242.jpg
 
http://id.southampton.ac.uk/equipment/E10330
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10330#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."
skos:notation "E10330"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."
rdfs:comment "The CT 500 range of twin column, computer controlled universal materials testing machine using Testometric's feature-rich winTest¿ software running under the Windows¿ operating system. Test setups are fully configurable and simple or more complex multi-stage test routines are controlled using the standard PC serial interface."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10330#primary_contact
rdfs:label "Modified Material Testing Machine (M500-100CT)"
 
http://id.southampton.ac.uk/equipment/E10309
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10309#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                            - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
skos:notation "E10309"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                            - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                            - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10309#primary_contact
rdfs:label "Optical Spectrum Analyser (AQ6370)"
 
http://id.southampton.ac.uk/equipment/E10310
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10310#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "The AQ-6515A/-6315B optical spectrum analyzer brings advanced capabilities to a wide range of applications, from light source evaluation to measurement of loss wavelength characteristics in[nl]
optical devices."
skos:notation "E10310"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The AQ-6515A/-6315B optical spectrum analyzer brings advanced capabilities to a wide range of applications, from light source evaluation to measurement of loss wavelength characteristics in[nl]
optical devices."
rdfs:comment "The AQ-6515A/-6315B optical spectrum analyzer brings advanced capabilities to a wide range of applications, from light source evaluation to measurement of loss wavelength characteristics in[nl]
optical devices."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10310#primary_contact
rdfs:label "Optical Spectrum Analyser (Yokogawa AQ6315A)"
 
http://id.southampton.ac.uk/equipment/E10314
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10314#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10314"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10314#primary_contact
rdfs:label "Platinum Liner & Buffer Plate"
 
http://id.southampton.ac.uk/equipment/E10283
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10283#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."
skos:notation "E10283"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."
rdfs:comment "150mm wafers, manual loading, general furnace, temperature accuracy +/- 1C, 25 wafer boats."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10283#primary_contact
rdfs:label "Benchtop Furnace"
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10283-200762-P1000823.jpg
 
http://id.southampton.ac.uk/equipment/E10277
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10277#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"
skos:notation "E10277"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"
rdfs:comment "3D MEMS dynamics and topography tester. Scanning laser vibrometry for out of plane vibrations up to 20MHz, stroboscopic video microscopy for in-plane motion & vibrations, white light interferometry for surface topography␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣␣http://data.southampton.ac.uk/equipment/E10277.html"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10277#primary_contact
rdfs:label "Polytec MSA-400 Micro System Analyzer"
foaf:page http://www.southampton-nanofab.com/characterisation/memsTester.php
 
http://id.southampton.ac.uk/equipment/E10288
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10288#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."
skos:notation "E10288"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."
rdfs:comment "Scribing of Si, glass & brittle materials. Scribing of glass in all directions with auto alignment function, handles up 300mm substrates with a thickness up to 2mm."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10288#primary_contact
rdfs:label "Precision Scriber"
foaf:page http://www.southampton-nanofab.com/fabrication/diceBondPackaging.php
 
http://id.southampton.ac.uk/equipment/E10466
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10466#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10466"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10466#primary_contact
rdfs:label "Spin Coater"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10466-200767-P1010234.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10466-200767-P1000832.jpg
 
http://id.southampton.ac.uk/equipment/E10282
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10282#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"
skos:notation "E10282"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"
rdfs:comment "150mm wafers, temepratures from 400-1000/1200C (pyrometer), 400-1000C (thermocouple), times from 5s to 10mins, temperature accuracy +5c, temperature reproducibility"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10282#primary_contact
rdfs:label "Jetfirst 200 Rta / Jetfirst 200 Rta No Pump"
foaf:page http://www.southampton-nanofab.com/fabrication/anneal.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10282-200655-P1000893.jpg
 
http://id.southampton.ac.uk/equipment/E10291
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10291#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."
skos:notation "E10291"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."
rdfs:comment "Measures roughness, waviness, step height and wafer stress, 2D and 3D fully autiomated data scans, sequencing capable, up to 8" substrates, vertical features from 100A-300um with a vertical resolution down to 0.5A."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10291#primary_contact
rdfs:label "Long Scan Profilers"
foaf:page http://www.southampton-nanofab.com/characterisation/
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10291-200838-P1000843.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10291-200838-P1010305.jpg
 
http://id.southampton.ac.uk/equipment/E10290
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10290#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"
skos:notation "E10290"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"
rdfs:comment "Spectral range 190nm-1999nm, 200mm computer controlled sample positioning, auto angle of incidence"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10290#primary_contact
rdfs:label "Woollam Md2000D Ellipsometer"
foaf:page http://www.southampton-nanofab.com/characterisation/ellipsometry.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10290-200631-P1000842.jpg
 
http://id.southampton.ac.uk/equipment/E10307
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10307#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10307"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10307#primary_contact
rdfs:label "Optical Spectrum Analyser (AQ6370)"
 
http://id.southampton.ac.uk/equipment/E10308
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10308#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                             - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
skos:notation "E10308"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                             - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
rdfs:comment "The AQ6370 is Yokogawa`s high speed and high performance Optical Spectrum Analyzer for characterization of optical communications system and optical components.                                                                             - High wavelength resolution: 0.02 nm[nl]
- Wide close-in dynamic range[nl]
- Single Mode and Multimode fiber test capability, via the same optical input:up to GI 62.5/125nm.[nl]
- Pulsed light measurement capability"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10308#primary_contact
rdfs:label "Optical Spectrum Analyser (AQ6370)"
 
http://id.southampton.ac.uk/equipment/E10279
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10279#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"
skos:notation "E10279"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"
rdfs:comment "150mm manual probe station, 6 probes, Leica S6 stereo zoom microscope, 0.6-4xzoom, 30 x eyepieces"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10279#primary_contact
rdfs:label "Cascade Microtech M150 Mulitpurpose Probing System"
foaf:page http://www.southampton-nanofab.com/characterisation/dcivProbeStation.php
 
http://id.southampton.ac.uk/equipment/E10448
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10448#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10448"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10448#primary_contact
rdfs:label "Quartz System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010304.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010306.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010184.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010206.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010297.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010198.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010222.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010197.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010204.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10448-200841-P1010303.jpg
 
http://id.southampton.ac.uk/equipment/E10287
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10287#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."
skos:notation "E10287"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."
rdfs:comment "Ultrasonic wedge bonder, AI and Au wires (25um), minimum bond pads 50x50um2, bare silicon bonding, programmable individual bonding parameters."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10287#primary_contact
rdfs:label "5430 Fine Wire Bonder SN 30280"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10287-200857-P1000869.jpg
 
http://id.southampton.ac.uk/equipment/E10369
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10369#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10369"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10369#primary_contact
rdfs:label "AR ION Laser System"
foaf:page http://www.southampton-nanofab.com/characterisation/
 
http://id.southampton.ac.uk/equipment/E10511
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10511#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10511"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10511#primary_contact
rdfs:label "Grazing Incidence Vuv Spectrometer / Interface For Reading Images"
 
http://id.southampton.ac.uk/equipment/E10507
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10507#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10507"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10507#primary_contact
rdfs:label "Femtotrain & Compressor"
 
http://id.southampton.ac.uk/equipment/E10331
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10331#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."
skos:notation "E10331"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."
rdfs:comment "Offers precision fusion splicing and fused fiber components critical to high-power fiber laser performance. This includes creating combiners and tapers, large mode area (LMA) fiber splicing, photonic crystal fiber (PCF) splicing, and large diameter fiber splicing with low loss."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10331#primary_contact
rdfs:label "Fibre Tapering & Bundling System (obsolete 1718)"
 
http://id.southampton.ac.uk/equipment/E10318
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10318#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "The Laser2000 range of picosecond lasers contains both high and low power lasers to cover a wide range of applications. The picosecond pulsed diode lasers and picosecond LED modules are particularly suitable for biomedical applications. High power picosecond lasers designed for industrial microprocessing offer a new level of precision and versatility."
skos:notation "E10318"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Laser2000 range of picosecond lasers contains both high and low power lasers to cover a wide range of applications. The picosecond pulsed diode lasers and picosecond LED modules are particularly suitable for biomedical applications. High power picosecond lasers designed for industrial microprocessing offer a new level of precision and versatility."
rdfs:comment "The Laser2000 range of picosecond lasers contains both high and low power lasers to cover a wide range of applications. The picosecond pulsed diode lasers and picosecond LED modules are particularly suitable for biomedical applications. High power picosecond lasers designed for industrial microprocessing offer a new level of precision and versatility."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10318#primary_contact
rdfs:label "Picosecond Laser System"
 
http://id.southampton.ac.uk/equipment/E10489
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10489#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "UV/VIS/Near IR spectrophotometer used for Absorption, Transmission and Reflectance measurments from 190 - 2500nm"
skos:notation "E10489"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "UV/VIS/Near IR spectrophotometer used for Absorption, Transmission and Reflectance measurments from 190 - 2500nm"
rdfs:comment "UV/VIS/Near IR spectrophotometer used for Absorption, Transmission and Reflectance measurments from 190 - 2500nm"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10489#primary_contact
rdfs:label "Ex Demo V-570Pc Spectrophotometer System"
 
http://id.southampton.ac.uk/equipment/E10512
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10512#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "A 30KV, LaB6(or tungsten filament) scanning electron microscope equipped with an Everhart-Thornley secondary electron detector and a cambridge four quadrant backscatter detector.␣␣Maximum resolution is 10nm depending on column conditions."
skos:notation "E10512"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "A 30KV, LaB6(or tungsten filament) scanning electron microscope equipped with an Everhart-Thornley secondary electron detector and a cambridge four quadrant backscatter detector.␣␣Maximum resolution is 10nm depending on column conditions."
rdfs:comment "A 30KV, LaB6(or tungsten filament) scanning electron microscope equipped with an Everhart-Thornley secondary electron detector and a cambridge four quadrant backscatter detector.␣␣Maximum resolution is 10nm depending on column conditions."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10512#primary_contact
rdfs:label "Leo 1455VP Scanning Electron Microscope (SEM)"
 
http://id.southampton.ac.uk/equipment/E10496
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10496#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/NA
dcterms:description "off campus"
skos:notation "E10496"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "off campus"
rdfs:comment "off campus"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10496#primary_contact
rdfs:label "Red Optics And Lens Mounts – Part of the FRODOSpec for the Liverpool Telescope in the Canary Islands"
 
http://id.southampton.ac.uk/equipment/E10478
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10478#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10478"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10478#primary_contact
rdfs:label "Analysers/Generator - 3 Items Each Over £25K"
 
http://id.southampton.ac.uk/equipment/E10475
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10475#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."
skos:notation "E10475"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."
rdfs:comment "The Gatan XuM utilises the electron beam in an scanning electron microscope to generate X-rays which are projected through a sample and onto an X-ray camera to form an image. This provides non-destructive imaging of the internal structure of suitable samples. The sample can be rotated and re-imaged multiple times to build up a tomographic dataset from which a 3D reconstruction of the sample can be generated. The resolution limit of this technique is ~400 nm."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10475#primary_contact
rdfs:label "Gatan X-ray Ultramicroscope (XuM) (accessory for the EVO SEM LS25 microscope)"
 
http://id.southampton.ac.uk/equipment/E10446
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10446#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10446"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10446#primary_contact
rdfs:label "Quantum Efficiency System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10446-200834-P1010313.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10446-200834-P1010312.jpg
 
http://id.southampton.ac.uk/equipment/E10458
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10458#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10458"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10458#primary_contact
rdfs:label "Ccd Camera"
 
http://id.southampton.ac.uk/equipment/E10459
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10459#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10459"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10459#primary_contact
rdfs:label "Semiconductor Analyser"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10459-200869-P1010315.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10459-200869-P1010314.jpg
 
http://id.southampton.ac.uk/equipment/E10449
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10449#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10449"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10449#primary_contact
rdfs:label "Software Expansion Pack For E-Beam"
foaf:page http://www.southampton-nanofab.com/fabrication/ebeamLithography.php
 
http://id.southampton.ac.uk/equipment/E10454
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10454#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10454"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10454#primary_contact
rdfs:label "Orion Variable Accelerating Voltage Package"
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
 
http://id.southampton.ac.uk/equipment/E10465
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10465#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10465"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10465#primary_contact
rdfs:label "Cryogenic Probe Station"
foaf:page http://www.southampton-nanofab.com/characterisation/magnetoResistance.php
 
http://id.southampton.ac.uk/equipment/E10500
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10500#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "Build into a confocal optical microscope"
skos:notation "E10500"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Build into a confocal optical microscope"
rdfs:comment "Build into a confocal optical microscope"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10500#primary_contact
rdfs:label "Beamlock 7W VIS/ UV Argon System Etc"
 
http://id.southampton.ac.uk/equipment/E10474
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10474#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10474"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10474#primary_contact
rdfs:label "Clear View: O-Orion-Clearview"
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
 
http://id.southampton.ac.uk/equipment/E10488
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10488#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10488"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10488#primary_contact
rdfs:label "Biolight 1000"
 
http://id.southampton.ac.uk/equipment/E10456
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10456#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10456"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10456#primary_contact
rdfs:label "Gas Cabinet"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10456-200848-P1010250.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10456-200848-P1010251.jpg
 
http://id.southampton.ac.uk/equipment/E10492
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10492#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "Ar Ion laser (352nm and 364nm). 80mW laser power class 3B. Mounted to direct write lithography system. Local ID: PH/1895"
skos:notation "E10492"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Ar Ion laser (352nm and 364nm). 80mW laser power class 3B. Mounted to direct write lithography system. Local ID: PH/1895"
rdfs:comment "Ar Ion laser (352nm and 364nm). 80mW laser power class 3B. Mounted to direct write lithography system. Local ID: PH/1895"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10492#primary_contact
rdfs:label "Coherent Enterprise II 653 Ar Ion Laser"
 
http://id.southampton.ac.uk/equipment/E10450
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10450#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m²) depends on the size of the desired output beam, the lamp¿s power input and the layout of the simulator¿s optic. The spectral characteristics are always the same."
skos:notation "E10450"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m²) depends on the size of the desired output beam, the lamp¿s power input and the layout of the simulator¿s optic. The spectral characteristics are always the same."
rdfs:comment "Solar simulators provide a broadband spectrum close to that of the sun from the UV to the IR. The main part of the solar simulator is a xenon arc lamp that reaches a color temperature of almost 6000K which is very close to sun light. We provide solar simulators with a wide range of luminous fields for different sample sizes and budgets, varying in size from 25 mm to 260 mm x 260 mm in diameter. The irradiance (W/m²) depends on the size of the desired output beam, the lamp¿s power input and the layout of the simulator¿s optic. The spectral characteristics are always the same."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10450#primary_contact
rdfs:label "Solar Simulator"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10450-200849-P1010257.jpg
 
http://id.southampton.ac.uk/equipment/E10471
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10471#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10471"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10471#primary_contact
rdfs:label "Dry Bed Absorber System"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10471-200758-P1010229.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10471-200758-P1010227.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10471-200758-P1010228.jpg
 
http://id.southampton.ac.uk/equipment/E10502
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10502#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10502"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10502#primary_contact
rdfs:label "Lasers - Verdi V5 / Mira 900F"
foaf:page http://www.orc.soton.ac.uk/xray.html
 
http://id.southampton.ac.uk/equipment/E10476
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10476#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10476"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10476#primary_contact
rdfs:label "Monocl3"
 
http://id.southampton.ac.uk/equipment/E10495
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10495#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/NA
dcterms:description "off campus"
skos:notation "E10495"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "off campus"
rdfs:comment "off campus"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10495#primary_contact
rdfs:label "CCD Sensor (S/N 01412-01-01)–Part of the FRODOSpec for the Liverpool Telescope in the Canary Islands"
 
http://id.southampton.ac.uk/equipment/E10442
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10442#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10442"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10442#primary_contact
rdfs:label "Tube Furnace Pumps"
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10442-200798-P1010235.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10442-200798-P1000821.jpg
 
http://id.southampton.ac.uk/equipment/E10501
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10501#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10501"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10501#primary_contact
rdfs:label "Lasers - Verdi V10  / OPA 9400"
 
http://id.southampton.ac.uk/equipment/E10491
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10491#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10491"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10491#primary_contact
rdfs:label "Bridgeport Model Vmc 800X Vertical Machining Centre"
 
http://id.southampton.ac.uk/equipment/E10464
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10464#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10464"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10464#primary_contact
rdfs:label "Laser Lithography System"
foaf:page http://www.southampton-nanofab.com/fabrication/ebeamLithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10464-200850-P1010301.jpg
 
http://id.southampton.ac.uk/equipment/E10468
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10468#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10468"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10468#primary_contact
rdfs:label "2 Sawatec Hotplates"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10468-200780-P1000835.jpg
 
http://id.southampton.ac.uk/equipment/E10473
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10473#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10473"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10473#primary_contact
rdfs:label "Elemental Analysis: O-Orion-Rbs"
foaf:page http://www.southampton-nanofab.com/characterisation/heIonMicroscope.php
 
http://id.southampton.ac.uk/equipment/E10505
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10505#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
dcterms:description "Provides cooling water for Beamlock 7W Argon Laser E10500"
skos:notation "E10505"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Provides cooling water for Beamlock 7W Argon Laser E10500"
rdfs:comment "Provides cooling water for Beamlock 7W Argon Laser E10500"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10505#primary_contact
rdfs:label "Recirculating Water Chiller for Beamlock 7W UV Argon System (E10500)"
 
http://id.southampton.ac.uk/equipment/E10486
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10486#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10486"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10486#primary_contact
rdfs:label "Electronic Magnet (De Groot)"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10486-200009-P1010334.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10486-200009-P1010335.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10486-200009-P1010333.jpg
 
http://id.southampton.ac.uk/equipment/E10477
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10477#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10477"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10477#primary_contact
rdfs:label "Pattern Generator"
foaf:page http://www.southampton-nanofab.com/fabrication/nanofabrication.php
 
http://id.southampton.ac.uk/equipment/E10452
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10452#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10452"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10452#primary_contact
rdfs:label "Etching System"
foaf:page http://www.southampton-nanofab.com/fabrication/dryEtch.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10452-200858-P1000889.jpg
 
http://id.southampton.ac.uk/equipment/E10443
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10443#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10443"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10443#primary_contact
rdfs:label "4 Tube Furnace"
foaf:page http://www.southampton-nanofab.com/fabrication/cleanroomEquipment.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10443-200799-P1010239.jpg
 
http://id.southampton.ac.uk/equipment/E10453
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10453#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10453"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10453#primary_contact
rdfs:label "Orion Performance Upgrade Package"
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
 
http://id.southampton.ac.uk/equipment/E10455
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10455#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
skos:notation "E10455"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10455#primary_contact
rdfs:label "Orion Liquid Nitrogen Cooling Dewar System"
foaf:page http://www.southampton-nanofab.com/research/Zeiss.php
 
http://id.southampton.ac.uk/equipment/E10392
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10392#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/46
skos:notation "E10392"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/EH
oo:primaryContact http://id.southampton.ac.uk/equipment/E10392#primary_contact
rdfs:label "Spectrum Analyser"
 
http://id.southampton.ac.uk/equipment/E10469
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10469#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."
skos:notation "E10469"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."
rdfs:comment "Vitesse Duo are diode-pumped solid-state lasers using a 10W Verdi CW laser to both seed the Vitesse ultrafast oscillator and pump the RegA. The result is a compact and economical, 2-box, all-solid-state solution for high repetition rate, ultrafast amplification."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10469#primary_contact
rdfs:label "Vitesse Duo"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10469-200757-P1010320.jpg
 
http://id.southampton.ac.uk/equipment/E10614
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10614#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."
skos:notation "E10614"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."
rdfs:comment "The EVG620 is a dual-use tool designed for optical double-side lithography and precision alignment up to 150 mm wafer sizes. Volume production types and manual R&D systems are available. An ultra-soft wedge compensation together with a computer controlled contact force between the mask and wafer ensures that both yield and mask lifetime are dramatically increased while production costs are lowered. The fully-automated EVG620 utilizes a cassette-to-cassette handling system to efficiently process wafers from 50 mm to 150 mm in diameter, regardless of their shape or thickness. The system safely handles thick, bowed or small diameter wafers."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10614#primary_contact
rdfs:label "EVG620 Double Side Mask Aligner"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10614-200788-P1010290.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10614-200788-P1010291.jpg
 
http://id.southampton.ac.uk/equipment/E10615
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10615#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."
skos:notation "E10615"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."
rdfs:comment "Designed to provide the widest range of process variations, the EVG100 series` modularity accepts spin and spray coating, developing, bake and chill modules to suit your individual production requirements. These systems accommodate the processing of an extensive range of materials such as positive and negative resists, polyimides, double-sided coating of thin resist layers, high viscosity resists, and edge protection coatings."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10615#primary_contact
rdfs:label "EVG150 Automated Resist Processing System"
foaf:page http://www.southampton-nanofab.com/fabrication/lithography.php
 
http://id.southampton.ac.uk/equipment/E10865
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10865#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/NA
dcterms:description "off campus"
skos:notation "E10865"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "off campus"
rdfs:comment "off campus"
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/WF
oo:primaryContact http://id.southampton.ac.uk/equipment/E10865#primary_contact
rdfs:label "CCD Sensor (S/N 01502-22-02)–Part of the FRODOSpec for the Liverpool Telescope in the Canary Islands"
 
http://id.southampton.ac.uk/equipment/E10617
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10617#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."
skos:notation "E10617"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."
rdfs:comment "These systems are actively-damped tables onto which senstive pieces of equipment can be mounted to isolate them from vibrational interference. These are current employed underneath the Zeiss Orion Helium Ion Microscope, the Zeiss Nvision40 Focused Ion Beam and the Zeiss EVO Scanning Electron Microscope."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10617#primary_contact
rdfs:label "3 Stacis "Quiet Island" Support Systems"
foaf:depiction http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010289.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010274.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010276.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010288.jpg, http://data.southampton.ac.uk/image-archive/equipment/raw/E10617-200770-P1010275.jpg
 
http://id.southampton.ac.uk/equipment/E10472
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10472#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."
skos:notation "E10472"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."
rdfs:comment "The scanning electron microscope (SEM) is used to examine microscopic topographical or compositional detail of solid specimens. The image is produced by scanning an extremely small focused beam of electrons (adjustable down to a few nm in diameter) across the surface of a specimen in an array of picture points; high-energy electron bombardment of the specimen causes signals to be emitted at each position of the beam. These are collected and their intensities are used to produce images of the specimen by modulating the brightness of equivalent pixels on a computer screen. An SEM has three distinct advantages compared to a light microscope - better resolution, greater depth of field and the ability to carry out X-ray microanalysis. The Zeiss EVO scanning electon microscope (SEM) is able to image the surfaces of a wide variety of non-conducting materials due to its variable pressure (VP) mode."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10472#primary_contact
rdfs:label "Zeiss EVO Scanning Electron Microscope"
foaf:page http://www.southampton-nanofab.com/characterisation/sem.php
 
http://id.southampton.ac.uk/equipment/E10758
oo:relatedFacility http://id.southampton.ac.uk/facility/F10014
oo:contact http://id.southampton.ac.uk/equipment/E10758#secondary_contact
rdf:type oo:Equipment
http://data.ordnancesurvey.co.uk/ontology/spatialrelations/within http://id.southampton.ac.uk/building/53
dcterms:description "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."
skos:notation "E10758"^^http://id.southampton.ac.uk/ns/equipment-code-scheme
oo:formalOrganization http://id.southampton.ac.uk/
dc:description "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."
rdfs:comment "The Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD), also known as Hot Wire Chemical Vapour Deposition (HWCVD), is used for deposition of intrinsic and doped amorphous and crystalline silicon films. It uses a proprietary hot filament array on a deposition area of up to 300 x 300 mm."
oo:organizationPart http://id.southampton.ac.uk/org/F7, http://id.southampton.ac.uk/org/FP
oo:primaryContact http://id.southampton.ac.uk/equipment/E10758#primary_contact
rdfs:label "Nitor 301 Hot Filament Chemical Vapour Deposition (HFCVD)"