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E-Beam Lithography Conversion Kit

E-Beam Lithography Conversion Kit. Raith nanolithography system capable of writing sub 100nm dimensions with up to 16bit resolution. Local ID: PH/02287

Facility:: Nanomaterials Rapid Prototyping Facility
Part of:: School of Physics & Astronomy
Physical Sciences and Engineering
Location:: Physics

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LEBLANC, KATHLEEN

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