Open Data Service, University of Southampton

Open Data Service

Plasmalab 80 Plus Rie Etcher

The etching plasma is created by an RIE RF source and RF induction magnetic coil to produce high plasma densities. The results are high etch rate, high aspect ratio, and anisotropic etching of material of the samples. The system can also operate in ICP or RIE mode separately. This system is configured for fluorine-based chemistry etching. Ideal for deep oxide etching, silicon nitride, polymer, poly-silicon, amorphous silicon and crystalline silicon.

Facility: Clean Rooms - Nanofabrication
Part of: School of Electronics & Computer Science
Physical Sciences and Engineering
Location: New Mountbatten

Contact

LESSEY, MARK

If you have additions or corrections to a facility or equipment entry please contact your Faculty Finance Team.

Get the Data

If you're that way inclined, you can get the raw data used to create this page in various formats, as listed below.

TTLRDF/Turtle file
RDFRDF/XML file
RDF.HTMLHTML visualisation of raw data

The following open datasets were used to build this page:

Facilities and Equipment