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Tempress Clean Furnace Stack

150mm wafers, automated loading, dru oxidation 600-1150C, wet oxidation 600-1150C, anneal 600-1150C, temperature accuracy +/- 1C, 25 wafer boats.

Facility:
Clean Rooms - Nanofabrication
Part of:
School of Electronics & Computer Science
Physical Sciences and Engineering
Location:
New Mountbatten

Contact

ANTENEY, IAIN

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