Open Data Service

Plasmalab System 400 / Magnetron Sputtering System

Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films.

Facility:: Clean Rooms - Integrated Photonics
Part of:: Physical Sciences and Engineering
Optoelectronics Research Centre
Location:: New Mountbatten

Contact

SESSIONS, NEIL

If you have additions or corrections to a facility or equipment entry please contact your Faculty Finance Team.

Get the Data

You can download the raw data used to create this page:

TTL - RDF/Turtle file
RDF - RDF/XML file
RDF.HTML - HTML visualisation of raw data

Uniform Resource Identifier (URI)

The following open datasets were used to build this page:

Facilities and Equipment
Photographs of University of Southampton Things

Freedom of information
Terms & Conditions
University Contacts
IT Help