Open Data Service, University of Southampton

Open Data Service

Plasmalab System 400 / Magnetron Sputtering System

Allows RF magnetron sputter deposition of dielectrics and metals in inert or reactive environments. 150mm diameter sputtering targets yield good uniformity over a 100mm wafer. Materials such as silica, germania-doped silica, alumina and tantalum pentoxide are routinely deposited. An additional Kurt Lesker Nano 3 sputterer is available for novel glass films.

Facility: Clean Rooms - Integrated Photonics
Part of: Physical Sciences and Engineering
Optoelectronics Research Centre
Location: New Mountbatten



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