Open Data Service, University of Southampton

Open Data Service

MA6 Mask Aligner

Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer

Facility: Clean Rooms - Integrated Photonics
Part of: Physical Sciences and Engineering
Optoelectronics Research Centre
Location: New Mountbatten



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