Auto 500 Electron Beam Deposition System

Auto 500 Electron Beam Deposition System Photo

BOC Edwards Auto 500 electron beam evaporation systems can deposit ultra pure films of materials with high melting points, and other materials that are difficult to deposit by resistance evaporation. Very fast deposition rates can be achieved using electron beam evaporation. Electron beam sources can hold more evaporant than resistance sources which allows the deposition of thick films and multiple coatings before the need to refill the electron beam source

Facility:

Clean Rooms - Integrated Photonics

Part of:

Physical Sciences and Engineering
Optoelectronics Research Centre

Location:

New Mountbatten

Contact

SESSIONS, NEIL