MA6 Mask Aligner
Allows printing of structures on flat substrates by replication of a mask using photoresist exposure and development followed by etching, for example. Feature sizes below 1 micron may be replicated over wafers up to 100mm diameter. Double-sided aligning allows alignment of features on both sides of a silicon wafer
| Facility: | Clean Rooms - Integrated Photonics |
| Part of: | Physical Sciences and Engineering Optoelectronics Research Centre |
| Location: | New Mountbatten |
Contact
SESSIONS, NEIL
If you have additions or corrections to a facility or equipment entry please contact your Faculty Finance Team.
Get the Data
If you're that way inclined, you can get the raw data used to create this page in various formats, as listed below.
| TTL | RDF/Turtle file |
| RDF | RDF/XML file |
| RDF.HTML | HTML visualisation of raw data |
The following open datasets were used to build this page:
| Facilities and Equipment |
| Photographs of University of Southampton Things |