Ionfab 300 Plus / Load Locked Ion Beam Etch System Photo
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Ionfab 300 Plus / Load Locked Ion Beam Etch System
Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target
- Facility:
- Clean Rooms - Integrated Photonics
- Part of:
- Physical Sciences and Engineering
Optoelectronics Research Centre - Location:
- New Mountbatten
Contact
SESSIONS, NEIL
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