Ionfab 300 Plus / Load Locked Ion Beam Etch System
Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target
| Facility: | Clean Rooms - Integrated Photonics |
| Part of: | Physical Sciences and Engineering Optoelectronics Research Centre |
| Location: | New Mountbatten |
Contact
SESSIONS, NEIL
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