Open Data Service, University of Southampton

Open Data Service

Ionfab 300 Plus / Load Locked Ion Beam Etch System

Allows ion-beam milling of materials to produce etched structures following photolithography, for example. May also be used for reactive or chemically-assisted ion-beam etching, and for ion-beam deposition of materials from a target

Facility: Clean Rooms - Integrated Photonics
Part of: Physical Sciences and Engineering
Optoelectronics Research Centre
Location: New Mountbatten



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