Clean Rooms - Focused ion beam (FIB)
Allows focused ion beam milling, electron-beam lithography and ion/electron beam-induced deposition, with parallel high resolution imaging, for the production of complex nanostructures in a broad range of materials.
Specification: 0.9 nm electron beam and 5 nm ion beam resoultion - Gas injection for bea-induced deposition of gold and platinum - Nabity pattern generator - Electron - beam lithography capability - Kleidiek nanomanipulator for TEM sample lift-out (other tool options available inc. microfluidic injection and four-point electrical probe) - 5-axis motorized stage for samples up to 150mm dia. (larger without full rotation) and 20mm thick - Ability to accept complex CAD pattern files.
If you have additions or corrections to a facility or equipment entry please contact your Faculty Finance Team.
Get the Data
If you're that way inclined, you can get the raw data used to create this page in various formats, as listed below.
|RDF.HTML||HTML visualisation of raw data|
The following open datasets were used to build this page: